公开(公告)号：WO2008048215A2

公开(公告)日：2008-04-24

申请号：PCT/US2006/028299

申请日：2006-07-21

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  STEWART, Duncan ,  WU, Wei

Inventor： STEWART, Duncan ,  WU, Wei

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/7035 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: A contact lithography apparatus 100, 220, system 200 and method 300 use a deformation 320 to facilitate pattern transfer 300. The apparatus 100, 220, system 200 and method 300 include a spacer 120, 226 that provides a spaced apart parallel and proximal orientation 310 of lithographic elements, such as a mask 110, 228a, 222 and a substrate 130, 228b, 224, when in mutual contact with the spacer 120, 226. One or more of the mask 110, 228a, 222, the substrate 130, 228b, 224 and the spacer 120, 226 is deformable, such that deformation 320 thereof facilitates the pattern transfer 300.

Abstract translation: 接触式光刻设备100,220，系统200和方法300使用变形320以便于图案转移300.设备100,220，系统200和方法300包括间隔物120,226，其间隔开的平行和近端取向310 当与间隔物120,226相互接触时，诸如掩模110,228a，222和衬底130,228b，224之间的光刻元件的一个或多个掩模110,228a，222，衬底130,228b ，224和间隔件120,226是可变形的，使得其变形320有利于图案转移300。

公开(公告)号：WO2008045545A2

公开(公告)日：2008-04-17

申请号：PCT/US2007/021850

申请日：2007-10-12

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  STEWART, Duncan ,  WALMSLEY, Robert, G. ,  HARTWELL, Peter ,  WU, Wei

Inventor： STEWART, Duncan ,  WALMSLEY, Robert, G. ,  HARTWELL, Peter ,  WU, Wei

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/38 ,  G03F1/50

Abstract: A pattern tool (200 or 200a) and/or substrate (300 or 300a) including one or more strain control regions (208 or 308) to prevent deformation-related misalignment.

Abstract translation: 包括一个或多个应变控制区域（208或308）的图形工具（200或200a）和/或基板（300或300a），以防止变形相关的未对准。

公开(公告)号：WO2007089802A2

公开(公告)日：2007-08-09

申请号：PCT/US2007002577

申请日：2007-01-30

Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  ROBINETT WARREN ,  SNIDER GREGORY S ,  STEWART DUNCAN ,  STRAZNICKY JOSEPH

Inventor： ROBINETT WARREN ,  SNIDER GREGORY S ,  STEWART DUNCAN ,  STRAZNICKY JOSEPH

CPC classification number: G11C8/10 ,  G11C13/0023 ,  H03M13/51

Abstract: Various embodiments of the present invention are directed to demultiplexers that include tunneling resistor nanowire junctions, and to nanowire addressing methods for reliably addressing nanowire signal lines in nanoscale and mixed-scale demultiplexers. In one embodimentof the present invention, an encoder-demulriplexer comprises a number of input signal lines and an encoder (1304) that generates an n-bit-constant-weight-code code-word internal address (1320, 1506, 1704) for each different input address (1318, 1702) received on the input signal lines. The encoder-demultiplexer also includes n microscale signal lines (1306-1311) on which an n-bit-constant-weight-code code word internal address is out put by the encoder and a number of encoder-demultiplexer-addressed nanowire signal lines interconnected with then microscale signal lines (1306-1311) via tunneling resistor junctions, the encoder-demultiplexer-addressed nanowire signal lines each associated with an n-bit-constant-weight-code code-word internal adress (1320, 1506, 1704).

Abstract translation: 本发明的各种实施例涉及包括隧道电阻器纳米线结的解复用器，并且涉及用于在纳米级和混合尺度解复用器中可靠地寻址纳米线信号线的纳米线寻址方法。 在本发明的一个实施例中，编码器 - 解复用器包括多个输入信号线和编码器（1304），编码器（1304）为每个输入信号线生成n位恒定加权码字内部地址（1320,1506,1704） 在输入信号线上接收不同的输入地址（1318,1702）。 编码器 - 解复用器还包括n个微型信号线（1306-1311），编码器输出n位恒定加权码字内部地址，并且编码器 - 解复用器寻址的纳米线信号线互连 与经由隧道电阻器结的微米级信号线（1306-1311）相连，所述编码器 - 解复用器寻址的纳米线信号线均与n位恒定重量码码字内部地址（1320,1506,1704）相关联。

公开(公告)号：WO2005062079A3

公开(公告)日：2005-08-25

申请号：PCT/GB2004005452

申请日：2004-12-24

Applicant: INTENSE LTD ,  YANSON DAN ANDREYEVITCH ,  BACCHIN GIANLUCA ,  KOWALSKI OLEK PETER ,  MCDOUGALL STEWART DUNCAN

Inventor： YANSON DAN ANDREYEVITCH ,  BACCHIN GIANLUCA ,  KOWALSKI OLEK PETER ,  MCDOUGALL STEWART DUNCAN

IPC: H01L21/18 ,  H01S5/026

CPC classification number: H01L21/182

Abstract: A quantum well intermixing (QWI) technique for modifying an energy bandgap during the formation of optical semiconductor devices enables spatial control of the QWI process so as to achieve differing bandgap shifts across a wafer, device or substrate surface. The method includes: forming a substrate comprising one or more core layers defining at least one quantum well; depositing a succession of intermixing barrier layers over the quantum well, each successive intermixing barrier layer being formed of a semiconductor material and having a different etch characteristic than an immediately preceding barrier layer; etching away different numbers of the successive barrier layers in different regions of the substrate so as to provide different total thicknesses of barrier layer in different regions of the substrate; and applying an intermixing agent to the surface of the substrate such that the degree of intermixing in the quantum well region varies as a function of the total thickness of barrier layer, thereby forming different bandgaps in the quantum well in each of the respective regions.

Abstract translation: 用于在光半导体器件形成期间修改能带隙的量子阱混合（QWI）技术能够对QWI工艺进行空间控制，以便在晶片，器件或衬底表面上实现不同的带隙偏移。 该方法包括：形成包含限定至少一个量子阱的一个或多个核心层的衬底; 在量子阱上沉积一系列相互混合的阻挡层，每个连续的混合阻挡层由半导体材料形成并且具有比紧接在前的阻挡层不同的蚀刻特性; 在衬底的不同区域中蚀刻掉不同数量的连续势垒层，以便在衬底的不同区域中提供阻挡层的不同总厚度; 以及将混合剂施加到所述衬底的表面，使得所述量子阱区中的混合程度随阻挡层的总厚度而变化，由此在各个区域中的量子阱中形成不同的带隙。

公开(公告)号：WO2005057638A1

公开(公告)日：2005-06-23

申请号：PCT/GB2004/004944

申请日：2004-11-24

Applicant: INTENSE LIMITED ,  MARSH, John, Haig ,  YANSON, Dan Andreyevitch ,  McDOUGALL, Stewart, Duncan

Inventor： MARSH, John, Haig ,  YANSON, Dan Andreyevitch ,  McDOUGALL, Stewart, Duncan

IPC: H01L21/18

CPC classification number: H01L21/182 ,  B82Y20/00 ,  H01S5/2068 ,  H01S5/343

Abstract: A quantum well intermixing (QWI) technique for modifying an energy bandgap during the formation of optical semiconductor devices enables spatial control of the QWI process so as to achieve differing bandgap shifts across a wafer, device or substrate surface. The method includes: patterning the surface of a semiconductor substrate with QW1-initiating material in first regions of the surface; conducting a first thermal processing cycle on the substrate to generate a first bandgap shift in the first regions; patterning the surface of the substrate with QWI-initiating material in second regions of the surface, distinct from said first regions; and conducting a second thermal processing cycle on the substrate to generate a second bandgap shift in the second regions, and to generate a cumulative bandgap shift in the first regions, the cumulative bandgap shift being the cumulative result of said first and second thermal processing cycles. Further steps can produce additional cumulative bandgap shifts.

Abstract translation: 用于在光半导体器件形成期间修改能带隙的量子阱混合（QWI）技术能够对QWI工艺进行空间控制，以便在晶片，器件或衬底表面上实现不同的带隙偏移。 该方法包括：利用QW1引发材料在表面的第一区域中图案化半导体衬底的表面; 在所述基板上进行第一热处理循环，以在所述第一区域中产生第一带隙位移; 在与所述第一区域不同的表面的第二区域中用QWI引发材料对衬底的表面进行图案化; 以及在所述衬底上进行第二热处理循环以在所述第二区域中产生第二带隙偏移，并且在所述第一区域中产生累积带隙偏移，所述累积带隙位移是所述第一和第二热处理循环的累积结果。 进一步的步骤可以产生额外的累积带隙位移。

公开(公告)号：WO2004058305A2

公开(公告)日：2004-07-15

申请号：PCT/CA0302008

申请日：2003-12-24

Applicant: AN GO GEN INC ,  STEWART DUNCAN J ,  COURTMAN DAVID ,  KAROUBI GOLNAZ

Inventor： STEWART DUNCAN J ,  COURTMAN DAVID ,  KAROUBI GOLNAZ

IPC: A61K9/50 ,  A61K35/12 ,  C12N5/077 ,  C12N5/0775 ,  C12N11/04 ,  A61K48/00

CPC classification number: A61K9/5036 ,  A61K35/12 ,  C12N5/0656 ,  C12N5/0663 ,  C12N11/04 ,  C12N2533/52 ,  C12N2533/56 ,  C12N2533/76

Abstract: Cell therapy comprises encapsulating a cell with an integrin or other cell interaction factor, for administration to a mammal. The cells may express a therapeutic transgene or the cells may be regenerative.

Abstract translation: 细胞疗法包括用整联蛋白或其它细胞相互作用因子包封细胞，用于给予哺乳动物。 细胞可以表达治疗性转基因，或细胞可以是再生的。

公开(公告)号：WO2004058293A1

公开(公告)日：2004-07-15

申请号：PCT/CA2003/002007

申请日：2003-12-24

Applicant: NORTHERN THERAPEUTICS INC. ,  STEWART, Duncan, J. ,  BABAEI, Saeid ,  COURTMAN, David

Inventor： STEWART, Duncan, J. ,  BABAEI, Saeid ,  COURTMAN, David

IPC: A61K38/18

CPC classification number: A61K31/216 ,  A61K31/198 ,  A61K38/06 ,  A61K38/1866 ,  A61K38/1891 ,  A61K38/44 ,  A61K48/005 ,  C12Y114/13039

Abstract: Early onset of pulmonary disorders such as pulmonary hypertension are treated or prevented by administration of an apoptosis inhibitor or a survival factor. Early onset of such disorders may be diagnosed by assessing apoptosis in lung tissue.

Abstract translation: 通过施用凋亡抑制剂或存活因子来治疗或预防肺部疾病如肺动脉高压的早期发作。 可以通过评估肺组织中的细胞凋亡来诊断此类疾病的早期发作。

公开(公告)号：US20160264386A1

公开(公告)日：2016-09-15

申请号：US14657037

申请日：2015-03-13

Applicant: Stewart Duncan ,  Richard Fongeallaz

Inventor： Stewart Duncan ,  Richard Fongeallaz

IPC: B66F15/00 ,  B25B27/02 ,  B25G1/06

CPC classification number: B25B27/02 ,  B25B27/04 ,  B25G1/06 ,  B25G3/36

Abstract: An apparatus is disclosed for dismantling a pallet comprising an elongated handle having a free end and an attachment end, wherein the attachment end is coupled with a crossbar having a horizontal axis extending perpendicular to the plane of the handle. The apparatus also has one or a plurality of blades extending rigidly forward in adjustable communication with the crossbar via a notched aperture in each blade for receiving the crossbar, wherein each blade further comprises a lower curved portion, and an upper portion for engaging a board of a pallet, at least one wheel rotatably coupled with said lower curved portion, and means for clamping the blades to the crossbar.

Abstract translation: 公开了一种用于拆卸托盘的装置，该托盘包括具有自由端和附接端的细长手柄，其中附接端与具有垂直于手柄平面延伸的水平轴线的横杆联接。 该装置还具有一个或多个叶片，其通过每个叶片中的切口孔与横杆可调节地连通地刚性向前延伸，用于接收横杆，其中每个叶片还包括下弯曲部分，以及用于接合 托盘，与所述下弯曲部分可旋转地联接的至少一个轮和用于将叶片夹紧到横杆的装置。

公开(公告)号：US20110222571A1

公开(公告)日：2011-09-15

申请号：US13063101

申请日：2009-09-11

Applicant: John Haig Marsh ,  Stewart Duncan McDougall ,  Gianluca Bacchin ,  Bocang Qiu

Inventor： John Haig Marsh ,  Stewart Duncan McDougall ,  Gianluca Bacchin ,  Bocang Qiu

IPC: H01S5/40 ,  F21V5/00 ,  B41J2/45

CPC classification number: B41J2/451 ,  B41J2/473

Abstract: An imaging device comprising a linear array of laser diodes that are adapted to provide an optical output comprising a plurality of spaced-apart optical beams. Focusing optics are configured to form a plurality of image points from said spaced-apart optical beams, the image points being spaced apart along a first axis. The image points have a non-uniform spacing along the first axis. By scanning the linear array along a photosensitive plate, and timing the firing of lasers accordingly, every pixel point on the photosensitive plate can be imaged by one of the image points from the laser array. Non-uniform spacing of the image points can provide advantages in heat dissipation from the laser elements, and reduction of some printing artifacts on the photosensitive plate.

Abstract translation: 一种成像装置，包括激光二极管的线性阵列，其适于提供包括多个间隔开的光束的光输出。 聚焦光学器件被配置成从所述间隔开的光束形成多个图像点，图像点沿着第一轴线间隔开。 图像点沿着第一轴具有不均匀的间距。 通过沿着感光板扫描线性阵列，并相应地激发激光的定时，感光板上的每个像素点可以通过激光阵列中的一个图像点成像。 图像点的不均匀间隔可以提供来自激光元件的散热的优点，以及减少感光板上的一些印刷伪影。

公开(公告)号：US07288794B2

公开(公告)日：2007-10-30

申请号：US10203241

申请日：2001-01-31

Applicant: John Haig Marsh ,  Simon Eric Hicks ,  James Stewart Aitchison ,  Stewart Duncan McDougall ,  Bo Cang Qiu

Inventor： John Haig Marsh ,  Simon Eric Hicks ,  James Stewart Aitchison ,  Stewart Duncan McDougall ,  Bo Cang Qiu

IPC: H01L27/15 ,  H01L31/12 ,  H01L33/00

CPC classification number: B82Y20/00 ,  G02B6/12004 ,  G02B6/42 ,  G02B2006/12119 ,  G02B2006/12121 ,  G02B2006/12123 ,  G02B2006/12128 ,  H01S5/026 ,  H01S5/1014 ,  H01S5/1064 ,  H01S5/3414

Abstract: An improved integrated optical device (5a-5g) is disclosed containing first and second devices (10a-10g; 15a, 15e), optically coupled to each other and formed in first and second different material systems. One of the first or second devices (10a-10g, 15a, 15e) has a Quantum Well Intermixed (QWI) region (20a, 20g) at or adjacent a coupling region between the first and second devices (10a-10g; 15a, 15e). The first material system may be a III-V semiconductor based on Gallium Arsenide (GaAs) or Indium Phosphide (InP), while the second material may be Silica (SiO2), Silicon (Si), Lithium Niobate (LiNbO3), a polymer, or glass.

Abstract translation: 公开了一种改进的集成光学器件（5A-5g），其包含彼此光学耦合并形成在第一和第二不同材料系统中的第一和第二器件（10a-10g; 15a，15e）。 第一或第二装置（10a-10g，15a，15e）中的一个在第一和第二装置（10）之间的耦合区域处或相邻处具有量子阱混合（QWI）区域（20a，20g） a-10g; 15a，15e）。 第一材料系统可以是基于砷化镓（GaAs）或磷化铟（InP）的III-V半导体，而第二材料可以是二氧化硅（SiO 2），硅（Si），锂 铌酸盐（LiNbO 3 N），聚合物或玻璃。