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    EUV RADIATION SOURCE
    84.
    发明公开
    EUV RADIATION SOURCE 审中-公开

    公开(公告)号：EP3911126A1

    公开(公告)日：2021-11-17

    申请号：EP20174949.6

    申请日：2020-05-15

    Applicant: Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  Stichting VU ,  ASML Netherlands B.V.

    Inventor： BEHNKE, Lars Peter

    IPC: H05G2/00 ,  G03F7/20 ,  G02F1/39

    Abstract: An EUV radiation source comprising a fuel emitter configured to produce fuel droplets; a laser system configured to illuminate a fuel droplet at a plasma formation region, the laser system comprising: a first laser configured to produce radiation of a first wavelength in a first radiation beam, a second laser configured to produce radiation of a second wavelength in a second radiation beam, and a first parametric amplifier arranged to receive the radiation of the first wavelength and radiation of the second wavelength and generate an amplified radiation beam; and a beam delivery system for delivering the amplified radiation beam to the plasma formation region.

    MICROSCOPIC IMAGING APPARATUS AND METHOD TO DETECT A MICROSCOPIC IMAGE
    90.
    发明公开
    MICROSCOPIC IMAGING APPARATUS AND METHOD TO DETECT A MICROSCOPIC IMAGE 审中-公开
    密克罗尼西亚国立维也纳维也纳国家民主共和国伊朗伊斯兰堡MIKROSKOPBILDES

    公开(公告)号：EP2888621A1

    公开(公告)日：2015-07-01

    申请号：EP13759869.4

    申请日：2013-08-27

    Applicant: Stichting VU-VUmc

    Inventor： WITTE, Stefan Michiel ,  EIKEMA, Kjeld Sijbrand Eduard

    IPC: G02B21/36 ,  G06F17/14 ,  H01J37/26

    CPC classification number: G02B21/365 ,  G02B21/367 ,  G03F7/70616

    Abstract: The invention relates to amicroscopic imaging apparatus to provide an image of a sample. The apparatus having an illumination system to provide an illumination beam with radiation;and a sensor constructed and arranged to receive: a first image of a first diffraction pattern created by diffraction of the illumination beam on the sample; a second image of a second diffraction pattern created by diffraction of the illumination beam on the sample. The sensor may be connected with a processor running a program to retrieve phase information from the sample from the first and second image received by the sensor. The illumination system may have a first illumination device to provide the illumination beam with radiation of substantially a first wavelength; and a second illumination device to provide the illumination beam with radiation of substantially a second wavelength different than the first wavelength. The sensor may receive a first image of a first diffraction pattern created by diffraction of the illumination beam with radiation of substantially the first wavelength on the sample; and,a second image of a second diffraction pattern created by diffraction of the illumination beam with radiation of substantially the second wavelength on the sample.

    Abstract translation: 一种用于提供样品图像的显微成像装置。 该装置包括用于向辐射提供照明光束的照明系统; 以及传感器，其被构造和布置成接收：通过所述样品上的所述照射光束的衍射而产生的第一衍射图案的第一图像; 以及由样品上的照明光束衍射产生的第二衍射图案的第二图像。

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