公开(公告)号：JP2009094510A

公开(公告)日：2009-04-30

申请号：JP2008258797

申请日：2008-10-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  JANSEN HANS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To detect damage to a board or a component of an immersion system or to prevent its occurrence, in immersion lithography. SOLUTION: This immersion lithography device including a detector measuring a distance between a board support structure and/or a board and a fluid handling system, and/or detecting an item when the item is present between the fluid handling system and the board and/or the upper surface of the board support structure, is disclosed. The detector uses information of an electric characteristic of a fluid provided by the fluid handling system in order to measure the distance. The detector measures the change of resistance and/or capacitance between an electrode of the fluid handling system and the board and/or an electrode of the board support structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：在浸没式光刻中检测对浸没系统的板或部件的损坏或防止其发生。 解决方案：该浸渍光刻设备包括测量板支撑结构和/或板与流体处理系统之间的距离的检测器和/或当物品存在于流体处理系统和板之间时检测物品 和/或板支撑结构的上表面。 检测器使用由流体处理系统提供的流体的电特性的信息，以便测量距离。 检测器测量流体处理系统的电极与板和/或板支撑结构的电极之间的电阻和/或电容的变化。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009055062A

公开(公告)日：2009-03-12

申请号：JP2008279191

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2009055061A

公开(公告)日：2009-03-12

申请号：JP2008279190

申请日：2008-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供平版印刷设备，其中液体供应系统通过液体密封系统将液体保持在投影系统的最终部件和基板之间的空间中。 解决方案：液体供应系统100还配备有去矿化单元130，蒸馏单元120和UV辐射源145以净化浸没液体。 可以将化学品加入到浸液中以抑制生物体的生长。 液体供应系统100的部件可以由对可见光不透明的材料制成，以防止生物体的生长。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008300824A

公开(公告)日：2008-12-11

申请号：JP2008120654

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304 ,  H01L21/68

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus. SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008288619A

公开(公告)日：2008-11-27

申请号：JP2008219416

申请日：2008-08-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008263221A

公开(公告)日：2008-10-30

申请号：JP2008161719

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: Particularly, cleaning fluid can be supplied to a space between the projection system of a lithographic apparatus and a substrate table by the liquid supply system of the lithographic apparatus. Additionally or as an alternative plan, a cleaning device can be arranged on the substrate table, or an ultrasonic emitter can be arranged in order to produce ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸光刻设备内部的方法和设备。 特别地，清洁液可通过光刻设备的液体供应系统供应到光刻设备的投影系统和基片台之间的空间。 另外或作为替代方案，可以在衬底台上布置清洁装置，或者可以布置超声发射器以产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007053377A

公开(公告)日：2007-03-01

申请号：JP2006221569

申请日：2006-08-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  SENGERS TIMOTHEUS FRANCISCUS ,  KUIJPER ANTHONIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To adjust a conventional lithography equipment to an environment of immersion. SOLUTION: In the lithography projection equipment, a liquid supply system and an object W on a substrate table WT are arranged to prevent a high-speed immersion liquid from flowing onto a sensor S. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：将常规光刻设备调整到浸没环境。 解决方案：在光刻投影设备中，布置液体供应系统和衬底台WT上的物体W，以防止高速浸没液体流入传感器S.版权所有（C）2007 ，JPO＆INPIT

公开(公告)号：JP2006276005A

公开(公告)日：2006-10-12

申请号：JP2006043245

申请日：2006-02-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  GRAAF ROELOF FREDERICK DE ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS

IPC: G01N33/18 ,  C02F1/00 ,  H01L21/027

CPC classification number: B01D37/04 ,  Y10S210/90

Abstract: PROBLEM TO BE SOLVED: To provide a fluid filtration method for obtaining the liquid with known purity.
SOLUTION: The fluid is filtered by the filtering system, and on the upstream of the final filtering stage, the purity of the liquid is measured. The purity of the fluid, filtered by the filtering system, can be obtained by correcting the filtration characteristics of the final filtration stage. The fluid includes super pure water for use as an immersion liquid for the lithographic system.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供用于获得已知纯度的液体的流体过滤方法。

解决方案：流体由过滤系统过滤，并且在最终过滤阶段的上游，测量液体的纯度。 通过过滤系统过滤的流体的纯度可以通过校正最终过滤阶段的过滤特性来获得。 流体包括用作平版印刷系统的浸液的超纯水。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006179909A

公开(公告)日：2006-07-06

申请号：JP2005364310

申请日：2005-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: In particular, the liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，光刻设备的液体供应系统可用于将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006165562A

公开(公告)日：2006-06-22

申请号：JP2005351544

申请日：2005-12-06

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS L H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method. SOLUTION: A lithography device is disclosed, wherein a liquid-supplying system supplies liquid to a region between a substrate W and a projection system PL of the lithography device, having a liquid containment structure which is fixed to a surface almost vertical to the optical axis of the projection system PL to hold the substrate W so as to limit the liquid to the region the upper surface of a substrate table WT so that the side of the substrate W to be exposed is covered with liquid during exposure. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 解决方案：公开了一种光刻设备，其中液体供应系统向基板W和光刻设备的投影系统PL之间的区域供应液体，该区域具有液体容纳结构，该液体容纳结构固定在几乎垂直于 投影系统PL的光轴以保持基板W，以将液体限制在基板台WT的上表面的区域，使得在曝光期间被暴露的基板W的一侧被液体覆盖。 版权所有（C）2006，JPO＆NCIPI