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    Lithographic apparatus and device manufacturing method
    81.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012182498A

    公开(公告)日：2012-09-20

    申请号：JP2012135571

    申请日：2012-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and projection assembly
    82.
    发明专利
    Lithographic apparatus and projection assembly 有权
    地平线装置和投影装置

    公开(公告)号：JP2012104862A

    公开(公告)日：2012-05-31

    申请号：JP2012031504

    申请日：2012-02-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS MARIA ,  LOOPSTRA ERIK ROELOF ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  F16F7/1005

    Abstract: PROBLEM TO BE SOLVED: To increase a stable operating range of active damping.SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to damp a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency on a signal provided by the sensor. The active damping system is connected to a damping mass, which is connected to the projection system.

    Abstract translation: 要解决的问题：增加主动阻尼的稳定工作范围。 解决方案：光刻设备包括被配置为调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 光刻设备还包括被构造成保持衬底的衬底台和配置成将图案化的光束投影到衬底的目标部分上的投影系统。 提供了一种主动阻尼系统来减轻至少部分投影系统的振动。 主动阻尼系统包括传感器的组合，该传感器用于测量投影系统的位置量，以及致动器，其依赖于由传感器提供的信号在投影系统上施加力。 主动阻尼系统连接到连接到投影系统的阻尼块。 版权所有（C）2012，JPO＆INPIT

    Method for cooling optical element, lithography apparatus and method for manufacturing device
    83.
    发明专利
    Method for cooling optical element, lithography apparatus and method for manufacturing device 有权
    用于冷却光学元件的方法，光刻装置和制造装置的方法

    公开(公告)号：JP2011222992A

    公开(公告)日：2011-11-04

    申请号：JP2011077418

    申请日：2011-03-31

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027 ,  G02B7/198

    CPC classification number: G03B27/52 ,  F28D15/00 ,  G02B7/181 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide an improved cooling arrangement for an optical element in a vacuum optical system such as a projection system of an extreme ultraviolet (EUV) lithography apparatus.SOLUTION: Disclosed is a heat adjustment method for an optical element that operates in a vacuum environment. The optical element includes a first main body having at least one optical face and at least one heat transfer surface. The position and/or direction of the first main body 1 is controlled dynamically. The method comprises: a step of controlling the temperature of a second main body having a second heat transfer surface to a desired temperature; a step of positioning the second main body adjacently to the first main body and dynamically controlling the position and/or direction of the second main body so that the first and second heat transfer surfaces are maintained in a substantially fixed arrangement without the contact between the main bodies; and a step of delivering gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces while controlling a gas pressure in the heat transfer space to be at a predetermined value between approximately 30 Pa and approximately 300 Pa.

    Abstract translation: 要解决的问题：为真空光学系统（例如极紫外（EUV）光刻设备的投影系统）中的光学元件提供改进的冷却装置。 解决方案：公开了一种在真空环境中工作的光学元件的热调节方法。 光学元件包括具有至少一个光学面和至少一个传热表面的第一主体。 动态地控制第一主体1的位置和/或方向。 该方法包括：将具有第二传热表面的第二主体的温度控制到所需温度的步骤; 将第二主体相对于第一主体定位并动态地控制第二主体的位置和/或方向的步骤，使得第一和第二传热表面保持基本上固定的布置，而不会在主体 身体; 以及将作为传热介质的气体输送到由第一和第二传热表面限定的传热空间，同时将传热空间中的气体压力控制在约30Pa至约300Pa之间的预定值。 版权所有（C）2012，JPO＆INPIT

    Euv radiation generation apparatus
    85.
    发明专利
    Euv radiation generation apparatus 有权
    EUV辐射发生装置

    公开(公告)号：JP2011018901A

    公开(公告)日：2011-01-27

    申请号：JP2010148418

    申请日：2010-06-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  STAMM UWE ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA

    IPC: H01L21/027

    CPC classification number: G03F7/70941 ,  G03F7/70033 ,  G03F7/70575 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for effectively carrying and focusing the laser beam to the selected place within the EUV light source.SOLUTION: The EUV radiation generator includes a structure for defining an optical gain medium formed to generate laser radiation for interaction with a target material to generate the EUV radiation releasing plasma and an aperture through which the laser radiation can be guided. The structure also includes a radiation guide having the external surface that is constituted to guide the laser radiation to be separated from the optical gain medium.

    Abstract translation: 要解决的问题：提供一种用于有效地将激光束携带并聚焦到EUV光源内的所选位置的系统和方法。解决方案：EUV辐射发生器包括用于限定形成以产生激光辐射的光学增益介质的结构 用于与目标材料的相互作用以产生EUV辐射释放等离子体和可以引导激光辐射的孔。 该结构还包括具有外表面的辐射引导件，该外表面被构造成引导要从光学增益介质分离的激光辐射。

    Lithography system, lithography apparatus, and method of manufacturing device
    88.
    发明专利
    Lithography system, lithography apparatus, and method of manufacturing device 审中-公开
    平版印刷系统，光刻设备及其制造方法

    公开(公告)号：JP2009105385A

    公开(公告)日：2009-05-14

    申请号：JP2008240100

    申请日：2008-09-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  FLAGELLO DONIS GEORGE

    IPC: H01L21/027

    CPC classification number: G03F7/70408

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography system incorporating interference lithography apparatuses, which makes it possible to scan over a substrate so as to expose continuous parts of a pattern on respective regions of the substrate and can be used for generating the densest portion of the pattern on the substrate.
    SOLUTION: The lithography system includes two lithography apparatuses. The first lithography apparatus projects a radiation beam with a pattern on a first target portion of the substrate, and the second lithography apparatus includes an interference arrange which splits the radiation beam and recombines the split beams to generate an interference pattern. A masking arrange selectively transmits a part of the interference pattern, and a projection system transfers the selectively transmitted part of the interference pattern on a second target portion of the substrate.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种包含干涉光刻设备的光刻系统，其使得可以在基板上扫描以暴露基板的各个区域上的图案的连续部分，并且可以用于产生最密集的 部分图案在基板上。 光刻系统包括两个光刻设备。 第一光刻设备在衬底的第一目标部分上投射具有图案的辐射束，并且第二光刻设备包括干涉布置，其分裂辐射束并重新组合分裂光束以产生干涉图案。 掩蔽布置选择性地发送干涉图案的一部分，并且投影系统将干涉图案的选择性透射部分传送到基板的第二目标部分上。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus, alignment apparatus, device manufacturing method, aligning method, and method of converting apparatus
    90.
    发明专利
    Lithographic apparatus, alignment apparatus, device manufacturing method, aligning method, and method of converting apparatus 有权
    平面设备，对准装置，装置制造方法，转换方法和转换装置的方法

    公开(公告)号：JP2008219017A

    公开(公告)日：2008-09-18

    申请号：JP2008053523

    申请日：2008-03-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULKENS JOHANNES CATHARINUS HU ,  VAN DEN BRINK MARINUS A ,  LOOPSTRA ERIK ROELOF

    IPC: G03F7/20 ,  H01L21/027 ,  B41C1/10 ,  B41N3/00 ,  G03F9/00

    CPC classification number: G03F7/70341 ,  B41C1/1075 ,  B41C1/1083 ,  G03F7/70258 ,  G03F9/7026

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, an alignment apparatus, a device manufacturing method, an aligning method, and a method of converting an apparatus. SOLUTION: An amount of liquid in an optical path of projection beams PB or alignment beams is detected by a detector 22, and then an optical element 10 required for focusing the projection beams or the alignment beams onto a surface of a substrate W is determined among a plurality of compensating optical elements by a controller 21. The appropriate optical element 10 is directly arranged in the optical path of the projection beams or the alignment beams as a final element for a projection system PL or a projection alignment system, respectively. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供光刻设备，对准设备，设备制造方法，对准方法和转换设备的方法。 解决方案：通过检测器22检测投影光束PB或对准光束的光路中的液体量，然后将投影光束或对准光束聚焦到基板W的表面上所需的光学元件10 由控制器21在多个补偿光学元件中确定。适当的光学元件10直接布置在投影光束或对准光束的光路中，作为投影系统PL或投影对准系统的最终元件 。 版权所有（C）2008，JPO＆INPIT

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