公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007221101A

公开(公告)日：2007-08-30

申请号：JP2006337682

申请日：2006-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN MIERLO HUBERT ADRIANN ,  HAM ERIK LEONARDUS ,  MEIJER HENDRICUS JOHANNES MARI ,  JOSEPHINA MOORS JOHANNES HUBER ,  HENDRIK ANTONY JOHANNES NEERHO ,  OTTENS JOOST JEROEN ,  JOHANNES ADRIANUS PETRUS LEIJT ,  MARCO LE KLUSE ,  JAN HOPMAN

IPC: H01L21/027 ,  H01L21/683 ,  H02N13/00

CPC classification number: H01L21/6831 ,  G03F7/70708 ,  Y10T29/49117

Abstract: PROBLEM TO BE SOLVED: To provide an electrostatic clamp for a lithography system which does not contain contaminant and does not cause damages to layers and to provide a method for manufacturing it. SOLUTION: A first layer and a second layer are formed of dielectric material. Electrodes 7, 9a and 9b are formed of conventional material such as aluminum or silicon. One or several spaces 15 and 17 are filled with first or second dielectric material and the contaminant is prevented from penetrating the volumes between the first part 7 and the second parts 9a and 9b. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种不含污染物的光刻系统的静电夹具，并且不会对层造成损害并提供其制造方法。 解决方案：第一层和第二层由电介质材料形成。 电极7,9a和9b由常规材料如铝或硅形成。 一个或几个空间15和17填充有第一或第二电介质材料，并且防止污染物渗透第一​​部分7和第二部分9a和9b之间的体积。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007194618A

公开(公告)日：2007-08-02

申请号：JP2006345103

申请日：2006-12-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for improving degradation in positioning precision caused by distortion due to temperature change of a substrate table caused by an immersion liquid or the like, relating to an immersion lithography device. SOLUTION: The lithography device comprises a cover plate formed separately from a substrate table, and a means for stabilizing temperature of the substrate table by controlling temperature of the cover plate. A heat insulating material is provided between the cover plate and the substrate table so that the cover plate acts as a heat shielding material of the substrate table. A means is provided which improves position control of the substrate by measuring distortion of the substrate table and referencing it. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于改善由浸没式光刻装置所涉及的由浸没液体等引起的基板台的温度变化引起的变形引起的定位精度的劣化的系统。 解决方案：光刻设备包括与基板台分开形成的盖板，以及通过控制盖板的温度来稳定基板台的温度的装置。 在盖板和基板台之间设置绝热材料，使得盖板用作基板台的隔热材料。 提供了一种通过测量衬底台的变形并参考衬底来提高衬底的位置控制的装置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007180555A

公开(公告)日：2007-07-12

申请号：JP2006349601

申请日：2006-12-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  JACOBS JOHANNES HENRICUS WILHE ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method of preventing immersion exposure liquid from relatively deeply entering under a substrate. SOLUTION: There are provided a projection system for projecting radiation beam, to which a pattern is given, on a target portion of a substrate W; a substrate holding part WH for holding the substrate W; a discharge port 24 for reducing a pressure of a space between the substrate W and the substrate holding part WH; a liquid supply system for supplying liquid 11 to the space between the projection system and the substrate holding part WH; and a gas supply port 22 provided so as to be positioned in the vicinity of the lower surface of a substrate edge when the substrate W is held by the substrate holding part WH, wherein the gas supply port 22 supplies gas to the space between the substrate W and the substrate holding part WH so that the supplied liquid 11 does not substantially enter under the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止浸没曝光液体相对深入基底的方法。 解决方案：提供了一种投影系统，用于在衬底W的目标部分上投射有图案的辐射束; 用于保持基板W的基板保持部WH; 用于减小基板W和基板保持部WH之间的空间的压力的排出口24; 用于将液体11供应到投影系统和基板保持部分WH之间的空间的液体供应系统; 以及气体供给口22，其被设置为当基板W被基板保持部WH保持时位于基板边缘的下表面附近，其中，气体供给口22将气体供给到基板 W和基板保持部WH，使得供给的液体11基本上不进入基板W的下方。（C）2007，JPO＆INPIT

公开(公告)号：JP2007150288A

公开(公告)日：2007-06-14

申请号：JP2006298498

申请日：2006-11-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

Abstract: PROBLEM TO BE SOLVED: To provide an article support which allows every kind of deformation induced by a heat load or the like of an article supported by itself during a lithography process. SOLUTION: The article support which is constructed for supporting a reticle (a first article) or a wafer (a second article) includes several protrusions for support on each of which the article is set when in use and which is constructed in such a way as to demarcate a support region for providing a flat surface on which they support the article, to enable the expansion and contraction of at least a part of the article by the support region when the article is subjected to the heat load in this way and to reduce the accumulation of mechanical stress in the article and a position sensor which is constructed in such a way as to determine a displacement position offset in one direction of the article on a flat surface of its support region for a certain period. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制品支撑件，其允许在光刻工艺期间由其自身支撑的物品的热负载等引起的各种变形。 解决方案：构造用于支撑掩模版（第一制品）或晶片（第二制品）的物品支撑件包括用于在使用时在每个构件上设置制品的几个突起，并且其构造为 用于划定支撑区域以提供它们支撑制品的平坦表面的方式，以便在制品以这种方式承受热负荷时能够通过支撑区域使制品的至少一部分膨胀和收缩 并且减少制品中的机械应力累积和位置传感器，其以这样的方式构造，以便确定在其支撑区域的平坦表面上的物品的一个方向上的位移偏移一段时间。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007005795A

公开(公告)日：2007-01-11

申请号：JP2006168236

申请日：2006-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的 用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。 解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。 通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006165576A

公开(公告)日：2006-06-22

申请号：JP2005353307

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERICK E ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70516 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for a lithographic projection apparatus that is not substantially affected by temperature variations thereof, and a calibration substrate used for the calibration. SOLUTION: The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate is made of a material having a small thermal expansion coefficient of, for example less than about 1.0×10 -6 K -1 , to reduce deformation thereof due to temperature variations of the substrate. The method for the calibration includes imaging a marker provided on a patterning device onto a target position of the calibration substrate with a beam of radiation, measuring a property of the image of the marker on the calibration substrate, determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus, and adjusting at least one of the operating parameters of the apparatus to correct the error. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种基本上不受其温度变化影响的光刻投影设备的校准方法和用于校准的校准基板。 解决方案：校准基板包括第一基本上平坦的表面，基本平行于第一表面的第二基本上平坦的表面，以及将第一表面连接到第二表面的边缘。 校准基板由热膨胀系数小，例如小于约1.0×10 -6 / SP> K -1 的材料制成，以减少由于 基板的温度变化。 用于校准的方法包括使用辐射束将设置在图案形成装置上的标记物设置在校准基板的目标位置上，测量校准基板上的标记的图像的性质，确定测量的属性和 基于装置的标记和操作参数的预期属性，以及调整装置的操作参数中的至少一个以校正误差。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006148111A

公开(公告)日：2006-06-08

申请号：JP2005331476

申请日：2005-11-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  GILISSEN NOUD J ,  LEENDERS MARTINUS HENDRIKUS AN ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To improve the production yield of lithographic equipment and to provide a device manufacturing method. SOLUTION: The lithographic equipment includes optical elements such as an immersion fluid reservoir at least partially supported by a gas support section etc. A surrounding structure that encloses a substrate is provided in order to enable illumination at the end part of the substrate by the lithography equipment. Level parameters such as the thickness of the substrate are measured by a thickness sensor etc. The substrate table is located with respect to the surrounding structure by an actuator and the substrate surface is made be at the substantially the same level with the surface of the surrounding structure. The optical elements are enabled to move between the substrate surface and the surface of the surrounding structure. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提高平版印刷设备的生产成本并提供装置制造方法。 解决方案：光刻设备包括诸如至少部分地被气体支撑部分支撑的浸没流体储存器的光学元件。提供包围基板的周围结构，以便能够在基板的端部处照明 光刻设备。 通过厚度传感器等来测量衬底的厚度等级参数。衬底台通过致动器相对于周围结构定位，并且衬底表面被制成与周围表面基本相同的高度 结构体。 光学元件能够在基板表面和周围结构的表面之间移动。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006128677A

公开(公告)日：2006-05-18

申请号：JP2005306586

申请日：2005-10-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a device provided with a support table for supporting a substrate. SOLUTION: The support table WT includes a plurality of support protrusions 2 that contact the substrate W when used to support the substrate W, and includes a plurality of heat transmission protrusions 3 that never contact the substrate W and are extended towards the substrate W when the substrate W is supported by the protrusions 2 in use. A heat exchange gap containing gas for exchanging the heat with the substrate W is extended between the protrusions 3 and the substrate W. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有用于支撑基板的支撑台的装置。 解决方案：支撑台WT包括多个支撑突起2，其在用于支撑基板W时与基板W接触，并且包括多个不接触基板W并且朝基板延伸的传热突起3 当基板W在使用中由突起2支撑时，W是W。 包含用于与衬底W交换热量的气体的热交换间隙在突起3和衬底W之间延伸。版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005184016A

公开(公告)日：2005-07-07

申请号：JP2004382666

申请日：2004-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  COX HENRIKUS HERMAN MARIE ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection device reducing the number of supporting projections for an item supporter and making an item level by a controllable method. SOLUTION: The device contains an illumination system providing the beams of a radiation, the item supporter supporting the item to be arranged in the beam path of the beams of the radiation, and a clamp clamping the item to the item supporter. A plurality of zones arranged around the item are formed to the clamp for generating a partially adjusted pressure so as to provide a partial bending moment for partially bending the item. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，通过可控制的方法减少用于物品支持者的支撑突起的数量并使物品水准。 解决方案：该装置包括提供辐射束的照明系统，支撑待布置在辐射束的光束路径中的物品的物品支撑件和将物品夹紧到物品支撑件的夹具。 围绕物品布置的多个区域形成为夹具，用于产生部分调节的压力，以便提供用于部分弯曲物品的部分弯矩。 版权所有（C）2005，JPO＆NCIPI