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公开(公告)号：JP2009060127A
公开(公告)日：2009-03-19
申请号：JP2008274725
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus, which is so configured as to prevent contamination with immersion liquid. SOLUTION: A substrate table WT is provided with a drainage ditch, namely, a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding another object 20 like a sensor existing on practically the same plane as an upper face of the substrate W. Since the barriers 40 and 100 can collect any liquid spilt from a liquid supply system during exposure of the substrate W, the risk of contamination of delicate components of a lithographic projection apparatus is reduced. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被设置为防止浸没液体的污染。 解决方案：衬底台WT设置有排水沟，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡物100，像传感器存在于与实际上相同的平面上的传感器 由于障碍物40和100可以收集在衬底W暴露期间从液体供应系统溢出的任何液体，所以降低了光刻投影设备的微妙部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009044186A
公开(公告)日：2009-02-26
申请号：JP2008274721
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或屏障40，以及围绕基本上位于衬底W的上表面的同一平面中的诸如传感器的其它物体20的阻挡层100 挡板40和100被配置为在基板W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影装置中的细小部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009033200A
公开(公告)日：2009-02-12
申请号：JP2008274726
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号：JP2008160155A
公开(公告)日：2008-07-10
申请号：JP2008073704
申请日：2008-03-21
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , JOHANNES JACOBUS MATHEUS BASEL , COX HENRIKUS HERMAN MARIE , ANTONIUS THEODORUS ANNA MARIA , SJOERD NICOLAAS LAMBERTUS DOND , CHRISTIAAN ALEXANDER HOOGENDAM , JOERI LOF , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , VAN DER MEULEN FRITS , MULKENS JOHANNES CATHARINUS HU , GERARDUS PETRUS MATTHIJS VAN N , SIMON KLAUS , SLAGHEKKE BERNARDUS ANTONIUS , STRAAIJER ALEXANDER , VAN DER TOORN JAN-GERARD CORNE , HOUKES MARTIJN
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008085370A
公开(公告)日：2008-04-10
申请号：JP2007324518
申请日：2007-12-17
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBER , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , LEENDERS MARTINUS HENDRIKUS AN , MERTENS JEROEN JOHANNES SOPHIA , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is configured to project a desired pattern image on a substrate W held on a substrate table WT through liquid; in the surface of the substrate table, a gap 22 exists between the substrate table and the outer edge of the substrate, or between the substrate table and other component which comes in contact with the liquid during normal use; and a bubble holding device configured to hold bubbles 24 possibly generated in the gap is provided in the gap. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被配置为通过液体在保持在衬底台WT上的衬底W上投影所需图案图像; 在基板台的表面上，在正常使用之间，在基板台与基板的外边缘之间，或基板台与与液体接触的其它部件之间存在间隙22; 并且在所述间隙中设置气泡保持装置，所述气泡保持装置构造成保持可能在间隙中产生的气泡24。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2007208279A
公开(公告)日：2007-08-16
申请号：JP2007065471
申请日：2007-03-14
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006313904A
公开(公告)日：2006-11-16
申请号：JP2006123549
申请日：2006-04-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , LAMBERTUS DONDERS SJOERD NICOL , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , MARTINUS HENDRIKUS ANTONIUS LE , LIEBREGTS PAULUS MARTINUS MARI , MERTENS JEROEN JOHANNES SOPHIA , VAN DER TOORN JAN-GERARD CORNE , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006165550A
公开(公告)日：2006-06-22
申请号：JP2005347652
申请日：2005-12-01
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS H , STREEFKERK BOB
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种光刻设备，其能够在不改变在光刻设备的投影系统和基板之间流动的液体的方向的方向上移动基板，而在具有液体供应的光刻设备中 系统。 解决方案：该光刻设备具有用于将液体供应到光刻设备的投影系统与基板之间的空间的输入端口和用于去除至少一部分液体的输出端口。 光刻设备具有一个液体供应系统，用于围绕基本上垂直于衬底的曝光平面的轴线旋转输入端口和输出端口中的任何一个或两个。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2005333134A
公开(公告)日：2005-12-02
申请号：JP2005143396
申请日：2005-05-17
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBER , LOOPSTRA ERIK ROELOF , MULKENS JOHANNES CATHARINUS HU
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70875 , B05C9/12 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method.
SOLUTION: The lithography projection apparatus, whose liquid supplying system supplies a dipping liquid between the last element of the projection apparatus and a substrate, is disclosed. An active dry station is located to remove the dipping liquid from the substrate W or the other object actively after dipping the substrate.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 公开了一种光刻投影装置，其液体供给系统在投影装置的最后一个元件和基板之间提供浸渍液体。 位于主动干燥站以在浸渍基底之后主动地从基底W或其他物体上移除浸渍液。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2005175433A
公开(公告)日：2005-06-30
申请号：JP2004281188
申请日：2004-09-28
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a method for manufacturing a device capable of applying a proper exposure quantity to a resist.
SOLUTION: An immersion exposure device is provided with a means for operating an exposure device so as to have the immersion liquid on all target parts of a substrate during a time of substantially the same length or for controlling the exposure quantity to a specific target part based on the length of the time having the immersion liquid on it. A means for considering the dissolution of a photoresist component such as a photo-acid or a photo-acid generator in the liquid covered with the immersion liquid is taken and the proper exposure quantity is given to the photoresist.
COPYRIGHT: (C)2005,JPO&NCIPIAbstract translation: 要解决的问题：提供一种光刻设备和一种能够对抗蚀剂施加适当曝光量的器件的制造方法。 解决方案：浸没曝光装置设置有用于操作曝光装置的装置，以便在基本上相同长度的时间内将浸没液体浸入基板的所有目标部分上，或者将曝光量控制到特定的 基于在其上具有浸没液体的时间长度的目标部分。 考虑在被浸渍液体覆盖的液体中溶解光致抗蚀剂成分（如光酸或光酸产生剂）的方法，并赋予光致抗蚀剂适当的曝光量。 版权所有（C）2005，JPO＆NCIPI
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