公开(公告)号：US20130240351A1

公开(公告)日：2013-09-19

申请号：US13799611

申请日：2013-03-13

Applicant: Corning Incorporated

Inventor： Bruce Gardiner Aitken ,  Shari Elizabeth Koval ,  Mark Alejandro Quesada

IPC: C23C14/10

CPC classification number: C23C14/10 ,  C23C14/087 ,  C23C14/3414 ,  H01J37/3426

Abstract: A sputtering target comprises a low Tg glass or an oxide of copper or tin. Such target materials can be used to form mechanically-stable thin films that exhibit a self-passivating phenomenon and which can be used to seal sensitive workpieces from exposure to air or moisture. Low Tg glass materials may include phosphate glasses such as tin phosphates and tin fluorophosphates, borate glasses, tellurite glasses and chalcogenide glasses, as well as combinations thereof.

Abstract translation: 溅射靶包括低Tg玻璃或铜或锡的氧化物。 这种目标材料可用于形成机械稳定的薄膜，其表现出自钝化现象，并可用于将敏感工件暴露于空气或湿气中。 低Tg玻璃材料可以包括磷酸盐玻璃，例如磷酸锡和磷酸二氢锡，硼酸盐玻璃，碲酸盐玻璃和硫族化物玻璃，以及它们的组合。