公开(公告)号：JP2011203698A

公开(公告)日：2011-10-13

申请号：JP2010073662

申请日：2010-03-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO KEITA ,  IWATO KAORU ,  TARUYA SHINJI ,  KATAOKA SHOHEI ,  KAMIMURA SATOSHI ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  MIZUTANI KAZUYOSHI ,  DOBASHI TORU

IPC: G03F7/038 ,  C08F20/12 ,  C08F34/00 ,  G03F7/32 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is excellent in stability with time, a development defect performance and a roughness characteristic, and also to provide a pattern forming method using the composition.SOLUTION: This active ray-sensitive or radiation-sensitive resin composition contains: a resin containing a repeated unit including a group generating an alcoholic hydroxy group by being decomposed by action of an acid, whose solubility to a developing solution containing an organic solvent is reduced by action of the acid; a compound generating an acid by irradiation of an active ray or a radiation; and a solvent. The moisture content rate measured by the Karl Fischer's method is ≤1.0 mass%.

Abstract translation: 要解决的问题：提供一种稳定性随时间优异，显影缺陷性能和粗糙度特性优异的活性射线敏感性或辐射敏感性树脂组合物，并且还提供使用该组合物的图案形成方法。 主动射线敏感性或辐射敏感性树脂组合物含有：含有通过酸作用分解产生醇羟基的基团的重复单元的树脂，其对含有有机溶剂的显影溶液的溶解度通过 酸; 通过活性射线或辐射的照射产生酸的化合物; 和溶剂。 通过卡尔费休法测定的含水率≤1.0质量％。

公开(公告)号：JP2011100105A

公开(公告)日：2011-05-19

申请号：JP2010192545

申请日：2010-08-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATAOKA SHOHEI ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  TOMEBA TSUNEMITSU

IPC: G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic-ray or radiation-sensitive resin composition with an improved pattern profile and improved line edge roughness, which is excellent in storage stability, and a pattern forming method using it.
SOLUTION: The actinic-ray or radiation-sensitive resin composition includes a compound represented by general formula (I), a compound that when exposed to actinic rays or radiation, generates an acid, and a hydrophobic resin. In general formula (I), R
N is a monovalent basic compound residue containing at least one nitrogen atom, and the pKa of R
N H
+ which is its conjugate acid is 8 or lower. A
- represents -SO
3
- , -CO
2
- , or -X
1 -N
- -X
2 -R
1 ; X
1 and X
2 independently represent -CO- or -SO
2 - respectively; and R
1 represents a monovalent organic group. X
+ represents a counter cation.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供具有优异的储存稳定性的改进的图案轮廓和改善的线边缘粗糙度的光化射线或辐射敏感性树脂组合物以及使用它的图案形成方法。 光解射线或辐射敏感性树脂组合物包括由通式（I）表示的化合物，当暴露于光化射线或辐射时产生酸和疏水性树脂的化合物。 在通式（I）中，R SB是含有至少一个氮原子的单价碱性化合物残基，R“N”的PKa 其共轭酸为8以下。 A - 表示-SO 3 - ，-CO 2 X 1 -N - -X 2 -R 1 ; X 1 和X 2 分别独立地表示-CO-或-SO- SB 2; R SB 1表示一价有机基团。 X + 表示抗衡阳离子。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250290A

公开(公告)日：2010-11-04

申请号：JP2010049872

申请日：2010-03-05

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TSUCHIMURA TOMOTAKA ,  TAKAHASHI HIDETOMO ,  ITO TAKAYUKI ,  INAZAKI TAKESHI ,  KATAOKA SHOHEI

IPC: G03F7/039 ,  C08F212/14 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F224/00 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/029 ,  G03F7/0392 ,  G03F7/2037 ,  Y10S430/122 ,  C08F220/16 ,  C08F212/32 ,  C08F2220/1883 ,  C08F2220/1825

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that satisfies, at a high level, all of high sensitivity, high resolution, good pattern profile and good line edge roughness in an ultrafine region, particularly in electron beam, X-ray or EUV photolithography, and satisfactorily reduces a problem of outgassing during exposure, and to provide a pattern forming method using the composition. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a repeating unit (A) having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali decomposable group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供在超细区域中高度满足高灵敏度，高分辨率，良好图案轮廓和良好线边缘粗糙度的光化射线敏感或辐射敏感性树脂组合物， 特别是在电子束，X射线或EUV光刻中，并且令人满意地减少曝光期间的除气问题，并提供使用该组合物的图案形成方法。 光解射线敏感性或辐射敏感性树脂组合物含有具有重复单元（A）的树脂（P），所述重复单元（A）具有在用光化射线照射时能够在侧链上产生酸性阴离子的离子结构部分 或辐射，其中所述离子结构部分的阳离子部分具有酸可分解基团或碱可分解基团。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010065021A

公开(公告)日：2010-03-25

申请号：JP2009065581

申请日：2009-03-18

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： NISHIKAWA HIDEYUKI ,  TAKAHASHI MAKOTO ,  KATAOKA SHOHEI ,  YASUOKA HIROSHI

IPC: C07C67/08 ,  C07C69/63 ,  C07C253/30 ,  C07C255/57 ,  C07C259/18

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing an acrylate (methacrylate) precursor in high purity.
SOLUTION: The method for producing the acrylate (methacrylate) precursor such as chloropropionates comprises: a step of reacting an acrylate (methacrylate) derivative included as an impurity with a hydrophilic nucleophilic reagent; and a step of removing the reaction product.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制备高纯度丙烯酸酯（甲基丙烯酸酯）前体的方法。 解决方案：制备丙烯酸酯（甲基丙烯酸酯）前体如氯丙酸酯的方法包括：使作为杂质包含的丙烯酸酯（甲基丙烯酸酯）衍生物与亲水亲核试剂反应的步骤; 和除去反应产物的步骤。 版权所有（C）2010，JPO＆INPIT