公开(公告)号：JP2012168293A

公开(公告)日：2012-09-06

申请号：JP2011027910

申请日：2011-02-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KODAMA KUNIHIKO ,  WADA KENJI ,  MATSUDA TOMOKI

IPC: G03F7/004 ,  C07D295/22 ,  C07D409/04 ,  C08F20/10 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10T428/24479

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which has greatly excellent exposure latitude, can form an excellent rectangular pattern shape, and has less elution to an immersion liquid in liquid immersion exposure, and a resist film and a pattern formation method using the composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by general formula (I) which generates an acid by irradiation of an actinic ray or radiation and (B) a resin which increases solubility in an alkali developer by action of an acid.

Abstract translation: 要解决的问题：为了提供具有极好的曝光宽容度的光化射线敏感或辐射敏感性树脂组合物，可以形成优异的矩形图案形状，并且在液浸曝光中对浸没液体的洗脱较少，以及 抗蚀剂膜和使用该组合物的图案形成方法。 光敏射线敏感性或辐射敏感性树脂组合物含有（A）通过光化射线或辐射照射产生酸的通式（I）表示的化合物和（B）增加溶解度的树脂 在碱性显影剂中通过酸的作用。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012159689A

公开(公告)日：2012-08-23

申请号：JP2011019328

申请日：2011-01-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： MAKINO MASAOMI ,  SAIE TOSHIYUKI ,  WADA KENJI

IPC: G03F7/038 ,  C08F220/34 ,  G02B1/11 ,  G02B5/26 ,  G02B5/28 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition and a pattern forming material capable of forming a pattern having high appropriate sensitivity, a low refractive index, little pattern chipping or residue after development, and little change in the refractive index under a high temperature and high humidity, and an excellent weather resistance property, and to provide a photosensitive film, a pattern forming method, a patterned film, a low refractive index film, an optical device, and a solid-state image sensing device using the same.SOLUTION: A photosensitive composition and a pattern forming material containing (A) hollow or porous particles, (B) a compound adapted to generate an active species by irradiation of active rays or radiation, and (C) a resin containing at least one selected from partial structures shown by the following Group A and a carboxylic acid group and whose solubility in a developer is changed by an action of the active species, and a photosensitive film, a pattern forming method, a patterned film, a low refractive index film, an optical device, and a solid-state image sensing device using the same are provided, where Group A includes a hydroxyl group, an amino group, an amide group, an urea bond, an ester bond, a sulfonate group, a phosphate group, a phosphonate group, a polyethylene glycol chain, and a polypropylene glycol chain.

Abstract translation: 要解决的问题：为了提供能够形成具有高适当灵敏度，低折射率，小图案切片或显影后残留物的图案的光敏组合物和图案形成材料，并且在下述条件下的折射率几乎没有变化 高温高湿度，耐候性优异，并且提供感光膜，图案形成方法，图案化膜，低折射率膜，光学器件和使用该感光膜的固体摄像装置 。 解决方案：一种感光组合物和含有（A）中空或多孔颗粒的图案形成材料，（B）适于通过照射活性射线或辐射产生活性物质的化合物，和（C）至少含有 选自以下A组所示的部分结构和羧酸基，其在显影剂中的溶解度通过活性种的作用而变化的光敏膜，图案形成方法，图案化膜，低折射率 提供了一种使用它们的薄膜，光学装置和固体摄像装置，其中A组包括羟基，氨基，酰胺基，脲键，酯键，磺酸酯基，磷酸酯 基团，膦酸酯基，聚乙二醇链和聚丙二醇链。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012123401A

公开(公告)日：2012-06-28

申请号：JP2012011448

申请日：2012-01-23

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SAEGUSA HIROSHI ,  WADA KENJI

IPC: G03F7/039 ,  C08F20/22 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition which causes little degradation in a profile, is improved in pattern collapse and suppresses generation of scum, not only in normal exposure (dry exposure) but in immersion exposure, and to provide a pattern forming method using the resist composition.SOLUTION: The resist composition contains (A) a resin the solubility of which with an alkali developing solution is increased by an action of an acid, (B) a compound generating an acid by irradiation with active rays or radiation, (C) a hydrophobic resin and (D) a solvent, in which a difference between the weight average molecular weight of the resin (A) and the weight average molecular weight of the hydrophobic resin (C) satisfies an expression of (weight average molecular weigh of the resin (A))-(weight average molecular weight of the hydrophobic resin (C))≥3000. The pattern forming method is carried out by using the above resist composition.

Abstract translation: 要解决的问题：为了提供不仅在正常曝光（干式曝光）但是在浸渍曝光中，形状几乎没有劣化的抗蚀剂组合物，图案塌陷得到改善并且抑制浮渣的产生，并且提供 图案形成方法。 解决方案：抗蚀剂组合物包含（A）其与碱性显影液的溶解度通过酸的作用而增加的树脂，（B）通过用活性射线或辐射照射产生酸的化合物，（C ）疏水性树脂和（D）溶剂，其中树脂（A）的重均分子量和疏水性树脂（C）的重均分子量之间的差异满足下式（的重均分子量 树脂（A）） - （疏水性树脂（C）的重均分子量）≥3000。 通过使用上述抗蚀剂组合物进行图案形成方法。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012083387A

公开(公告)日：2012-04-26

申请号：JP2010226929

申请日：2010-10-06

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： WADA KENJI

IPC: G03F7/004 ,  B32B7/02 ,  G02B1/11 ,  G03F7/038 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition with which a pattern with a low refractive index, excellent film strength and few development defects can be formed at high resolution, a pattern forming material, as well as a photosensitive film using it, a pattern forming method, a pattern film, a low refractive index film, an antireflection film, an optical device and a solid state imaging element.SOLUTION: A photosensitive composition contains (A) hollow or porous particles, (B) an alkali soluble particle dispersant having a group capable of chemically binding to the particles (A), (C) a compound which generates an active species upon irradiation with an actinic ray or radiation, and (D) a binder of which solubility in an alkali developer is reduced by an action of the active species.

Abstract translation: 要解决的问题：为了提供一种感光组合物，其具有低分辨率的图案，低折射率，优异的膜强度和很少的显影缺陷的图案，图案形成材料以及使用它的感光膜 图案形成方法，图案膜，低折射率膜，抗反射膜，光学装置和固态成像元件。 解决方案：光敏组合物含有（A）中空或多孔颗粒，（B）具有能够与颗粒（A）化学结合的基团的碱可溶性颗粒分散剂，（C）产生活性物质的化合物 用光化射线或辐射照射，和（D）通过活性物质的作用降低其在碱性显影剂中的溶解度的粘合剂。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012032673A

公开(公告)日：2012-02-16

申请号：JP2010173190

申请日：2010-07-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TOMEBA TSUNEMITSU ,  WADA KENJI ,  SAIE TOSHIYUKI

IPC: G03F7/075 ,  C08F290/14 ,  C08G77/00 ,  G02B1/11 ,  G02B1/111 ,  G02F1/1335 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of forming a pattern having a low refractive index, excellent adhesion to a substrate and a small refractive index variation under high temperature and high humidity and exhibiting excellent weather-resistance, a pattern forming material, and to provide a photosensitive film, a pattern forming method, a pattern film, a low refractive index film, an optical device and a solid state imaging device using the same.SOLUTION: A photosensitive composition includes: (A) a hollow or porous particle; (B) a photopolymerization initiator; and (C) a compound containing at least a structural unit containing a silicon atom having a monovalent group including an alkali soluble group and a polymerizable group, a structural unit containing a silicon atom having a monovalent group including an alkali soluble group, a structural unit containing a silicon atom having a monovalent group including a polymerizable group or a structural unit containing a silicon atom having a monovalent group including an alkali soluble group and a monovalent group including a polymerizable group. A pattern forming material; and a photosensitive film, a pattern forming method, a pattern film, a low refractive index film, an optical device and a solid state imaging device using the pattern forming material are also provided.

Abstract translation: 解决问题：提供能够形成低折射率图案，对基材的优异粘合性和在高温高湿下的小折射率变化并且具有优异的耐候性的图案的感光组合物，图案 并且提供感光膜，图案形成方法，图案膜，低折射率膜，光学装置和使用其的固态成像装置。 光敏组合物包括：（A）中空或多孔颗粒; （B）光聚合引发剂; 和（C）至少含有含有具有碱溶性基团和聚合性基团的一价基团的硅原子的结构单元的化合物，含有具有碱溶性基团的一价基团的硅原子的结构单元，结构单元 含有具有包含可聚合基团的一价基团的硅原子或含有具有包括可溶性基团的碱溶性基团和一价基团的一价基团的硅原子的结构单元。 图案形成材料; 还提供了感光膜，图案形成方法，图案膜，低折射率膜，光学装置和使用该图案形成材料的固态成像装置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012013960A

公开(公告)日：2012-01-19

申请号：JP2010150637

申请日：2010-06-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： WADA KENJI

IPC: G03F7/004 ,  G02B1/11 ,  H01L27/14

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition that is capable of forming a pattern having a low refractive index, a good surface condition after exposure, few development defects and excellent adhesion to a substrate with high resolution, a patterning material, as well as a photosensitive film using the photosensitive composition, a patterning method, a patterned film, a low refractive index film, an antireflection film, an optical device and a solid imaging element.SOLUTION: A photosensitive composition comprises (A) hollow or porous particles, (B) a photopolymerization initiator and (C) a polymerizable compound having alkali solubility.

Abstract translation: 要解决的问题：提供能够形成折射率低的图案，曝光后的良好的表面状态，显影缺陷少，并且对高分辨率的基板具有优异的粘附性的光敏组合物，图案形成材料， 以及使用感光性组合物的感光膜，图案形成方法，图案化膜，低折射率膜，抗反射膜，光学装置和固体成像元件。 解决方案：感光组合物包含（A）中空或多孔颗粒，（B）光聚合引发剂和（C）具有碱溶性的可聚合化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011216293A

公开(公告)日：2011-10-27

申请号：JP2010082636

申请日：2010-03-31

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： SONODA SHINICHIRO ,  WADA KENJI ,  SHIRASAKI YUICHI

IPC: H05B33/10 ,  H01L51/50 ,  H05B33/02

Abstract: PROBLEM TO BE SOLVED: To provide a low-refraction-index layer transfer sheet used for efficiently forming a low-refraction-index layer at low cost by a laser thermal transfer method, an organic electroluminescent device which can obtain high light-extraction efficiency by changing low-refraction-index layers of each pixel of RGB, and attain reduction of power consumption and life elongation, as well as a method for manufacturing the organic electroluminescent device.SOLUTION: The low-refraction-index layer transfer sheet used for forming a low-refraction-index layer in an organic electroluminescent device by a laser thermal transfer method includes a base material, a photothermal conversion layer on the base material and a low-refraction-index layer on the photothermal conversion layer, with a refraction index of the low-refraction-index layer of 1.4 or less. The photothermal conversion layer is preferred to contain a thermally evaporating substance with a boiling point of at least 70°C by 0.5 mass%.

Abstract translation: 要解决的问题：为了通过激光热转印法以低成本有效地形成低折射率层而提供低折射率层转印片，可以通过以下方式获得高光提取效率的有机电致发光器件 改变RGB的每个像素的低折射率层，并且实现功耗和寿命延长的降低，以及制造有机电致发光器件的方法。解决方案：用于形成有机电致发光器件的低折射率层转印片 通过激光热转印法在有机电致发光器件中的低折射率层包括基材，基材上的光热转换层和光热转换层上的低折射率层，折射率 低折射率层为1.4以下。 光热转换层优选含有沸点为70℃以上0.5质量％以下的热蒸发物质。

公开(公告)号：JP2009229774A

公开(公告)日：2009-10-08

申请号：JP2008074740

申请日：2008-03-21

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TAKAHASHI HIDETOMO ,  WADA KENJI ,  KAMIMURA SATOSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition for an electron beam, an X-ray or EUV light simultaneously satisfying requirements for high sensitivity, high resolution, a good pattern shape, and good line-edge roughness in solving problems associated with performance improving techniques in micro processing of a semiconductor element using the electron beam, the X-ray or the EUV light, and to provide a pattern forming method using the composition. SOLUTION: The positive resist composition for the electron beam, the X-ray or the EUV light contains (A) a resin which is decomposed by the action of an acid and consequently its rate of solution in an aqueous alkali solution is increased, (B) a compound which generates an acid when irradiated with an active ray or with radiation, (C) a compound which is decomposed by the action of an acid and generates an acid, and (D) an organic solvent, wherein a compound having a specific structure is included as a compound of the (C) component, and a pattern forming method using the positive resist composition is also claimed. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于电子束的正性抗蚀剂组合物，X射线或EUV光，同时满足高灵敏度，高分辨率，良好的图案形状和良好的线边缘粗糙度在解决问题中的要求 与使用电子束，X射线或EUV光的半导体元件的微处理中的性能改进技术相关联，并且提供使用该组合物的图案形成方法。 解决方案：电子束的正型抗蚀剂组合物，X射线或EUV光包含（A）通过酸的作用而分解的树脂，因此其在碱性水溶液中的溶解速率增加 ，（B）当用活性射线或辐射照射时产生酸的化合物，（C）通过酸的作用分解并产生酸的化合物和（D）有机溶剂，其中化合物 具有特定结构的化合物作为（C）成分的化合物，还要求使用正型抗蚀剂组合物的图案形成方法。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009093137A

公开(公告)日：2009-04-30

申请号：JP2008009840

申请日：2008-01-18

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： WADA KENJI

IPC: G03F7/004 ,  C08F20/10 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

CPC classification number: C08F20/10 ,  C07D211/96 ,  C07D243/04 ,  C07D295/26 ,  C08F214/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/34 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2022 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition which can provide good pattern shape and line-edge roughness in normal exposure (dry exposure), liquid immersion exposure and double exposure, a pattern-forming method using the photosensitive composition, and a compound used in the photosensitive composition. SOLUTION: The photosensitive composition contains a resin (A) containing a repeating unit corresponding to a compound represented by general formula (I), which resin produces an acid group when irradiated with active ray or radiation. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供在正常曝光（干曝光），液浸曝光和双重曝光中能够提供良好图案形状和线条粗糙度的光敏组合物，使用该感光性组合物的图案形成方法，以及 用于感光组合物中的化合物。 光敏组合物含有含有与通式（I）表示的化合物相当的重复单元的树脂（A），当用活性射线或辐射照射时，该树脂产生酸基。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009093011A

公开(公告)日：2009-04-30

申请号：JP2007264726

申请日：2007-10-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO TAKAYUKI ,  KODAMA KUNIHIKO ,  WADA KENJI

IPC: G03F7/039 ,  C08F20/10 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive resist composition improved in pattern collapse performance and focus margin even in the formation of a fine pattern of ≤100 nm and having good exposure latitude, and a pattern forming method using the same. SOLUTION: The positive resist composition comprises: (A) a resin which has an acid-decomposable repeating unit having a specific tertiary ester structure and whose solubility in an alkali developer increases by the action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) a compound capable of generating a compound having a proton accepting functional group of a specific structure upon irradiation with actinic rays or radiation. The pattern forming method using the same is also provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：即使在形成≤100nm的精细图案并且具有良好的曝光宽容度的情况下，也提供了改善图案塌陷性能和聚焦余量的正性抗蚀剂组合物，以及使用其的图案形成方法。 正型抗蚀剂组合物包括：（A）具有特定叔酯结构的酸可分解重复单元并且其在碱性显影剂中的溶解度由于酸的作用而增加的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和（C）能够在用光化射线或辐射照射时能够产生具有特定结构的质子接受官能团的化合物的化合物。 还提供了使用该图案形成方法的图案形成方法。 版权所有（C）2009，JPO＆INPIT