公开(公告)号：JP2003266710A

公开(公告)日：2003-09-24

申请号：JP2002068652

申请日：2002-03-13

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI ,  ARAKAWA KATSUHARU

IPC: B41J2/16 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method for an ink-jet head with a small number of parts in a simple structure, capable of miniaturizing and achieving a light weight of a head with high design freedom. SOLUTION: The method for manufacturing a linear ink-jet head by bonding with an adhesive the side surfaces of a plurality of chips 100 each comprising a nozzle actuator, comprises a chip manufacturing step of manufacturing a plurality of the chips 100 each comprising the nozzle actuator, an adhesive applying step of applying the adhesive 99 on the side surfaces of the manufactured chips, a positioning step of positioning a chip with the adhesive applied and another chip, and a pressuring step of contacting and pressuring the side surfaces of the positioned chips with each other. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2000229410A

公开(公告)日：2000-08-22

申请号：JP3141199

申请日：1999-02-09

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI ,  ATOBE MITSUAKI

IPC: B41J2/135

Abstract: PROBLEM TO BE SOLVED: To sustain water repellency for a long term by setting the etching depth of a protruding and recessed structure being formed on the surface of a basic material at a specified value or less. SOLUTION: A water repellent structure is provided with a protruding and recessed structure comprising recesses 17 and protrusions 18 formed on the surface of a silicon substrate. Consequently, an air layer is generated in the recesses 17. In order to exhibit an water repellent function, contact angle of water θ is set at 120 deg. or above (about 90 deg. or above in case of ink liquid drop). Size of the recess 17 is set such that a liquid drop touches the air layer without dropping into the recess 17. Since the diameter of ink drop is about 10 μm, A [width of protrusion (by mask design)] and B [width of trench (by mask design)] are preferably set in the range of 1-10 μm and C machining amount [depth (10 μm or less), by etching time]} is preferably set at about 1 μm or above. Uniformity of height of the protrusions is set within about 0.1 time of the value of A, B in view point of scratch resistance.

公开(公告)号：JP2000226570A

公开(公告)日：2000-08-15

申请号：JP2678699

申请日：1999-02-03

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI ,  ATOBE MITSUAKI

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/135 ,  C09K3/18

Abstract: PROBLEM TO BE SOLVED: To obtain a water-repellent structural form with water repellency sustainable for a long period. SOLUTION: This water-repellent structural form 100 is such one as to have uneven structure (recess 17, projection 18) formed on a base material 11 and provided with a water-repellent film 19 with a thickness of >=10 nm on the surface of the uneven structure.

公开(公告)号：JP2000211133A

公开(公告)日：2000-08-02

申请号：JP1712999

申请日：1999-01-26

Applicant: SEIKO EPSON CORP

Inventor： KAYANO YUJI ,  KARASAWA YASUSHI

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/16

Abstract: PROBLEM TO BE SOLVED: To protect an ink jet head against corrosion with ink by forming a thin ink-resistant film on the surface of the head touching ink in the ink channel and composing the thin ink-resistant film of a compound of iridium and tin. SOLUTION: An intermediate substrate 2 comprising a silicon single crystal substrate is bonded to an upper substrate 1 having a plurality of nozzle holes 4 to define a pressure chamber 6, an orifice 7, and a reservoir 8 thus constituting a channel unit. A thin ink-resistant film of a conductive oxide of iridium and tin is formed, by any one of sputtering or vacuum deposition, on the surface of recesses 21-23 forming the orifice 7 and reservoir 8 of the intermediate substrate 2. According to the method, pinhole of the thin ink-resistant film and corrosion of silicon ink channel can be prevented.

公开(公告)号：JP2000104182A

公开(公告)日：2000-04-11

申请号：JP27849698

申请日：1998-09-30

Applicant: SEIKO EPSON CORP

Inventor： KAYANO YUJI ,  KARASAWA YASUSHI ,  ATOBE MITSUAKI

IPC: B41J2/16 ,  B81C1/00 ,  C23F1/08 ,  H01L21/306 ,  H05K3/06

Abstract: PROBLEM TO BE SOLVED: To form metallic foil or a metallic sheet with high dimensional precision at a low cost by spraying etching solns. to the face to be etched in the material to be worked disposed in such a manner that the face to be etched orientates toward the lower direction from the lower direction by a spray. SOLUTION: The material 1 to be worked in which a mask pattern 2 has been formed is fixed to a moving mechanism part 10 in such a manner that the face in which the mask pattern 2 has been formed orientates toward the lower direction, and opposite to the etching face, an etching nozzle 4 is disposed. High pressure gaseous nitrogen 6 is sprayed from the etching nozzle 4, and simultaneously, etching solns. 5 and 5' are atomized to work the part 3 to be etched. The etching solns. may be pressurized by a pump or the like, but, they are drawn up by the negative pressure generated at the time of spraying the high pressure gaseous nitroge 6. Moreover, by opening and closing a valve 7 disposed on the way of etching soln. feeding piping, the etching solns. can intermittently be atomized, and, in the case the etching solns. are cut-off, the etching solns. adhered to the surface of the material 1 to be worked by the high pressure gaseous nitrogen 6 are removed.

公开(公告)号：JPH11268281A

公开(公告)日：1999-10-05

申请号：JP7102898

申请日：1998-03-19

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI ,  ATOBE MITSUAKI ,  SHOJI SHIYUUICHI

IPC: B41J2/135 ,  B41J2/16 ,  H01L21/3063

Abstract: PROBLEM TO BE SOLVED: To provide a high quality nozzle plate having highly accurate uniform nozzles at a low price with high productivity. SOLUTION: The method for fabricating a nozzle plate comprises step (a) of forming an etching resistant mask corresponding to a nozzle pattern on one side of an n-type silicon single crystal substrate 11 having crystal orientation (100), step (b) of forming a translucent conductive film on the other side of the substrate 11 step (c) of forming via holes corresponding to the nozzle pattern on one side of the substrate 11 through anisotropic etching by touching it to alkaline aqueous solution, and step (d) of boring the via holes deeper or making through holes through electrolytic etching using the translucent conductive film as an anode by irradiating the other side of the substrate 11 with light while touching one side to a solution containing hydrofluoric acid.

公开(公告)号：JPH1178006A

公开(公告)日：1999-03-23

申请号：JP24511997

申请日：1997-09-10

Applicant: SEIKO EPSON CORP

Inventor： KAYANO YUJI ,  KARASAWA YASUSHI ,  ARAKAWA KATSUHARU

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/16

Abstract: PROBLEM TO BE SOLVED: To provide an ink-jet head with high size accuracy and positioning accuracy, and a production method thereof. SOLUTION: A highly oriented film to be a vibrating plate 7 is adhered on a spacer 3. An island part 9 is formed thereon with a photosensitive resin film. The island part 9 elongates in the longitudinal direction of a pressure generating room 4 for efficiently transmitting dislocation of a piezoelectric oscillator 11. By accordingly forming the island part 9 of a photosensitive resin film integrally with the spacer 3 and the vibrating plate 7, an ink-jet head with little printing quality irregularity can be produced with a high yield.

公开(公告)号：JPH10323979A

公开(公告)日：1998-12-08

申请号：JP7103198

申请日：1998-03-19

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/135

Abstract: PROBLEM TO BE SOLVED: To prevent the water-repellent, oil-repellent performance of an ink discharging surface from decreasing even during a long term usage of a head, and make troubles such as a printing turbulence hard to generate by forming an intermediate film having an ink hardly soluble property, which can chemically combine with a water-repellent, oil-repellent substance, on the ink discharging side surface of a base material. SOLUTION: Titanium and a water-repellent, oil-repellent substance are formed on a nozzle plate made of silicon. On the surface of a silicon base plate 11 on which a nozzle hole 12 is formed, a titanium film 13 of approx. 1000 angstroms is formed by a sputter method, and a naturally oxidized film 14 is applied on the surface of the titanium film 13 by leaving it to stand in an atmospheric environment. Then, a fluoroalkylsilane based water-repellent, oil-repellent substance 15 is formed on the top of the naturally oxidized film 14 by a vacuum deposition method. In a final stage, the nozzle plate and a first plate are bonded, and an ink jet head is completed.

公开(公告)号：JPH09239991A

公开(公告)日：1997-09-16

申请号：JP5063596

申请日：1996-03-07

Applicant: SEIKO EPSON CORP

Inventor： KARASAWA YASUSHI

IPC: B41J2/045 ,  B41J2/055 ,  B41J2/16

Abstract: PROBLEM TO BE SOLVED: To enhance the friction resistance and printing quality of an ink jet recording head. SOLUTION: A water and oil repelling film 11 is laminated on a nozzle plate 4 made of silicon having nozzle orifices 6 formed thereon by a vacuum vapor deposition method and, continuously, the surface 14 of the nozzle plate is irradiated with ultraviolet rays 12 of 300mw/cm (measured value at a wavelength of 250nm) containing a wavelength of 300nm in respective environments of the atmosphere, nitrogen and argon.

公开(公告)号：JPH06308738A

公开(公告)日：1994-11-04

申请号：JP9289093

申请日：1993-04-20

Applicant: SEIKO EPSON CORP

Inventor： SUZUKI YUJI ,  KARASAWA YASUSHI ,  ATOBE MITSUAKI

IPC: G03F7/30 ,  G03F7/32

Abstract: PURPOSE:To enable development without discharging environment destroying materials, such as triethane, by constituting the developer of butyl acetate and alcohol of specific number of carbon atoms and specifying the ranged an alcohol concn. CONSTITUTION:The developer consists of the butyl acetate and 1 to 9C alcohol of 33.3 to 75wt.% concn. An acrylic dry film 2 is thermocompression bonded by a laminator on a substrate 1 and is rested until the temp. falls down to room temp. The film is then irradiated with UV rays 4 through mask patterns 3 to form exposed parts 5 and unexposed parts 6; thereafter, the substrate is rested at room temp. This material to be developed is developed by a liquid mixture composed of the butyl acetate and alcohol described above. The mechanism of the development is such that the butyl acetate molecules and the alcohols are solvated and the alcohol molecules are attracted to the circumferences of the butyl acetate molecules by mixing the butyl acetate and the alcohol. The influential power of the butyl acetate on the photosensitive resin is, therefore, relieved by the alcohol molecules and the balance are hardly dissolved.