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公开(公告)号：KR100434572B1
公开(公告)日：2004-08-18
申请号：KR1019970708404
申请日：1996-05-23
Applicant: 미쓰비시 가가꾸 가부시키가이샤
IPC: C01B33/18
CPC classification number: C03B19/095 , C01B33/18 , C01P2006/80 , C03B19/01 , C03B19/09 , C03B19/1065 , C03B2201/03 , C03C3/06 , C03C2201/02 , C03C2203/26 , Y10S65/08
Abstract: A method for producing a high purity synthetic quartz powder, characterized by using a tetramethoxysilane having a trimethoxymethylsilane content of at most 0.3 wt%, and converting it to a synthetic quartz by a sol-gel method.
Abstract translation: 高纯度合成石英粉末的制造方法的特征在于，使用三甲氧基甲基硅烷含量为0.3质量％以下的四甲氧基硅烷，通过溶胶凝胶法将其转换为石英。
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82.发明申请
公开(公告)号：WO2017103162A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/081515
申请日：2016-12-16
Applicant: HERAEUS QUARZGLAS GMBH & CO. KG
Inventor： OTTER, Matthias , LEHMANN, Walter , HÜNERMANN, Michael , NIELSEN, Nils Christian , WHIPPEY, Nigel Robert , GROMANN, Boris , KPEBANE, Abdoul-Gafar
CPC classification number: C03B20/00 , C03B5/06 , C03B17/04 , C03B19/106 , C03B37/01211 , C03C1/026 , C03C3/06 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/32
Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen eines Quarzglaskörpers beinhaltend die Verfahrensschritte i.) Bereitstellen eines Siliziumdioxidgranulats, ii.) Bilden einer Glasschmelze aus dem Siliziumdioxidgranulat in einem Ofen und iii.) Bilden eines Quarzglaskörpers aus zumindest einem Teil der Glasschmelze, wobei der Ofen einen stehenden Sintertiegel beinhaltet. Die Erfindung betrifft weiterhin einen Quarzglaskörper, der durch dieses Verfahren erhältlich ist. Weiterhin betrifft die Erfindung einen Lichtleiter, ein Leuchtmittel und einen Formkörper, die jeweils durch Weiterverarbeiten des Quarzglaskörpers erhältlich sind.
Abstract translation:
本发明涉及一种用于制造石英玻璃＆OUML;包括如下工艺步骤：i）提供一Siliziumdioxidgranulats rpers，ii）形成在玻璃从Siliziumdioxidgranulat在烘箱中熔化和iii）形成的石英玻璃与OUML; ... Rpers 来自熔融玻璃的至少一部分，其中炉包括立式烧结坩埚。 本发明还涉及一种石英玻璃＆OUML;主体，可以通过此方法获得BEAR是ltlich。 此外，本发明涉及一种光导，发光装置和模制体，其每一个都可以通过进一步处理石英玻璃体
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公开(公告)号：WO2015175582A1
公开(公告)日：2015-11-19
申请号：PCT/US2015/030445
申请日：2015-05-13
Applicant: CORNING INCORPORATED
Inventor： BOOKBINDER, Andrea Weiss , BOOKBINDER, Dana Craig , GROSS, Timothy Michael , TANDON, Pushkar
CPC classification number: C03C3/045 , C03C3/06 , C03C3/091 , C03C3/111 , C03C21/007 , C03C23/007 , C03C2201/02 , C03C2201/24 , Y10T428/315
Abstract: Alkali-free glasses are disclosed having (in weight %) 50 2 ≤ 80%, 2 2 0 3 2 0 3
Abstract translation: 公开的无碱玻璃具有（重量％）50
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公开(公告)号：WO2015122517A1
公开(公告)日：2015-08-20
申请号：PCT/JP2015/054129
申请日：2015-02-16
Applicant: 東ソー株式会社
CPC classification number: C03C11/00 , C03B19/066 , C03B19/08 , C03B2201/03 , C03C3/06 , C03C2201/02 , C03C2201/80 , C03C2204/06
Abstract: 吸水性がなく、かつ赤外光の遮光性に優れる不透明石英ガラス及びその製造方法を提供する。 本発明は、不透明石英ガラスにおいて、微細な非晶質シリカ粉末と造孔剤を混合ののち成形し、所定の温度で加熱することによって、含まれる気孔が閉気孔であると共に、気孔の平均径が５～２０μｍであり、気孔の含有密度が高く、よって熱遮断性に優れた不透明石英ガラスとなる。
Abstract translation: 提供：一种不透光石英玻璃，对于红外光具有优异的遮光性能，并且不具有吸水性; 及其制造方法。 通过混合微细的无定形二氧化硅粉末和成孔剂，然后将结果成型并在预定温度下加热，得到不透明的石英玻璃，其中包含的空气腔是封闭的空气腔，平均直径 的空气腔是5-20μm，并且包含的空气腔的密度高，导致优异的隔热性能。
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85.发明申请PROCESS FOR REDUCING OR ELIMINATING BUBBLE DEFECTS IN SOL-GEL SILICA GLASS 审中-公开降低或消除溶胶硅胶玻璃中泡沫缺陷的方法
公开(公告)号：WO2002074704A1
公开(公告)日：2002-09-26
申请号：PCT/US2002/008528
申请日：2002-03-19
Applicant: YAZAKI CORPORATION , GANGULI, Rahul , COLBERN, Steven, G. , GLEASON, Matthew, S.
Inventor： GANGULI, Rahul , COLBERN, Steven, G. , GLEASON, Matthew, S.
IPC: C03B19/12
CPC classification number: C03B19/12 , C03C1/006 , C03C2201/02 , C03C2203/22 , C03C2203/27 , Y02P40/57
Abstract: This invention resides in a process for making silica articles having few or no visible bubbles by sintring silica gels derived from a sol-gel process. The process incorporates control of pH during hydroxylation and gelation, as well as chlorination at temperatures previously considered unsuitable. The process optionally incorporates addition of dispersant to the silica solution.
Abstract translation: 本发明涉及一种制备具有很少或没有可见气泡的二氧化硅制品的方法，所述二氧化硅制品通过由溶胶 - 凝胶法得到的二氧化硅凝胶。 该过程包括在羟基化和凝胶化期间pH的控制，以及先前认为不合适的温度下的氯化。 该方法任选地将分散剂加入到二氧化硅溶液中。
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Patent Agency Ranking
公开(公告)号：WO1998008776A1
公开(公告)日：1998-03-05
申请号：PCT/US1997015234
申请日：1997-08-27
Applicant: CORNING INCORPORATED , ALLAN, Douglas, C. , POWELL, William, R.
Inventor： CORNING INCORPORATED
IPC: C03C03/06
CPC classification number: G03F7/70958 , C03B19/06 , C03B19/066 , C03B19/1065 , C03B19/1453 , C03B20/00 , C03B2207/32 , C03C1/006 , C03C3/06 , C03C23/0025 , C03C2201/02 , C03C2203/50 , G03F7/70058 , G03F7/70216 , Y10S65/13
Abstract: The invention relates to fused silica having low compaction under high energy irradation, particularly adaptable for use in photolithography applications.
Abstract translation: 本发明涉及在高能量辐照下具有低压实性的熔融二氧化硅，特别适用于光刻应用。
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公开(公告)号：WO1987005287A1
公开(公告)日：1987-09-11
申请号：PCT/JP1987000126
申请日：1987-02-27
Applicant: JAPAN OXYGEN CO., LTD. , MORISHITA, Hiroshi , IMAYOSHI, Terukazu , KIKUCHI, Hitoshi , NAKAMURA, Akihiro
Inventor： JAPAN OXYGEN CO., LTD.
IPC: C03B20/00
CPC classification number: C03C3/06 , C03B20/00 , C03C2201/02 , C03C2203/10 , Y10S65/08
Abstract: A process for manufacturing glass by vacuum melting, which comprises heating a silicon dioxide powder in the presence of a phase conversion promoter to form a sinter having a cristobalite crystal phase, molding or re-pulverizing this sinter, placing it in a vessel of a desired shape and heating it in vacuo to effect vitrification, or collecting a plurality of the sinters in a desired shape and heat-melting them in vacuo to effect vitrification. This process enables a high quality glass ingot of a desired shape or a larger-sized glass ingot to be obtained easily without lowering the productivity.
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公开(公告)号：WO1987005286A1
公开(公告)日：1987-09-11
申请号：PCT/JP1987000125
申请日：1987-02-27
Applicant: JAPAN OXYGEN CO., LTD. , MORISHITA, Hiroshi , IMAYOSHI, Terukazu , KIKUCHI, Hitoshi , NAKAMURA, Akihiro
Inventor： JAPAN OXYGEN CO., LTD.
IPC: C03B20/00
CPC classification number: C03C3/06 , C03B20/00 , C03C2201/02 , C03C2203/10 , Y02P40/57 , Y10S65/08
Abstract: A process for manufacturing glass from silicon dioxide by vacuum melting, which comprises uniformly pre-heating a silicon dioxide powder containing a phase conversion promoter to about 800°C, filling it in a vessel while substantially keeping that temperature, re-heating it to form a sintered molding having a cristobalite crystal phase, and heat-melting the molding in vacuo to effect vitrification. This process makes it possible to increase the conversion of the starting material and the productivity by shortening the heating time, and nearly completely prevent formation of cracks on the surface of the sintered molding, thus suppressing the formation of defectives.
Abstract translation: 由二氧化硅制造真空熔化玻璃的方法包括在约800℃下均匀地预热含有相转化活化剂的二氧化硅粉末，将其倒入室中，同时维持 该温度基本上被重新加热以形成具有方晶石结晶相的烧结模制品，并且将真空模制品加热熔化以实现玻璃化。 通过该工序，能够缩短加热时间，几乎完全防止烧结成型体表面产生裂纹，能够提高初始材料转换率和生产率，能够消除缺陷的产生。
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公开(公告)号：WO1980000939A1
公开(公告)日：1980-05-15
申请号：PCT/US1979000913
申请日：1979-10-29
Applicant: GENERAL ELECTRIC CO
Inventor： GENERAL ELECTRIC CO , HALL W , HUMPHREY J
IPC: B32B17/10
CPC classification number: C23C14/10 , B29D11/00865 , C03C3/06 , C03C2201/02 , C03C2201/06 , C03C2203/40 , C08J7/045 , C08J2369/00 , C23C14/024 , Y10T428/31507 , Y10T428/31645
Abstract: An abrasion, scratch, mar and solvent resistant glass coated non-opaque shaped polycarbonate article comprising a polycarbonate substrate having deposited on the surface thereof (i) an intermediate primer layer containing the photoreaction products of certain polyfunctional acrylic monomers; and (ii) a top layer of vapor deposited glass.
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90.发明授权公开(公告)号：US11981594B2
公开(公告)日：2024-05-14
申请号：US17422897
申请日：2020-12-09
Applicant: ZHONGTIAN TECHNOLOGY ADVANCED MATERIALS CO., LTD. , JIANGSU ZHONGTIAN TECHNOLOGY CO., LTD.
Inventor： Ming-Ming Tang , Meng-Fei Wang , Yi-Gang Qian , Jun-Yi Ma , Xian-Gen Zhang , Yi-Chun Shen , Ya-Li Chen
CPC classification number: C03B19/066 , C03B19/1453 , C03C1/022 , C03C3/06 , C03B25/00 , C03B2201/04 , C03C2201/02 , C03C2203/10 , C03C2203/40 , C03C2204/00
Abstract: A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.
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