パリレンの3次元多孔質構造
    81.
    发明专利

    公开(公告)号:JP2018115309A

    公开(公告)日:2018-07-26

    申请号:JP2017094472

    申请日:2017-05-11

    Abstract: 【課題】複数の孔を有するポリ−p−キシレン構造を含むパリレン(登録商標)の3D多孔質構造の提供。 【解決手段】多孔質構造のサイズは20nm〜5cmとの間であり、気孔率が55%と85%の間であるポリ−p−キシレン構造を有する、パリレンの3D多孔質構造。好ましくは、官能基を有する、ポリ−p−キシレン構造であり、多孔質構造が複数の標的分子を更に含み、標的分子が蛍光分子又は生物学的因子或いはナノ粒子を備えるパリレンの3D多孔質構造。ポリ−p−キシレン構造の孔は異なるサイズの孔サイズを備え、孔の孔サイズは勾配で異なることが望ましい、パリレンの3D多孔質構造。多孔質構造は一体的に形成され、犠牲固体型板上にポリマー単量体が蒸着され、犠牲固体型板を消費して、3D多孔質構造を形成する、パリレンの3D多孔質構造の製造方法。 【選択図】図1

    POROUS/NANOPOROUS PHT
    86.
    发明申请

    公开(公告)号:US20170114186A1

    公开(公告)日:2017-04-27

    申请号:US15399365

    申请日:2017-01-05

    Abstract: Methods of forming nanoporous materials are described herein that include forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. The method generally includes forming a reaction mixture comprising a formaldehyde, a solvent, a primary aromatic diamine, and a diamine having a primary amino group and a secondary amino group, the secondary amino group having a base-reactive substituent, and heating the reaction mixture to a temperature of between about 50 degC and about 150 degC to form a polymer. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

    POROUS/NANOPOROUS PHT
    88.
    发明申请
    POROUS/NANOPOROUS PHT 有权
    POROUS / NANOPOROUS PHT

    公开(公告)号:US20160108175A1

    公开(公告)日:2016-04-21

    申请号:US14564650

    申请日:2014-12-09

    Abstract: Methods of forming nanoporous materials are described herein that include forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. The method generally includes forming a reaction mixture comprising a formaldehyde, a solvent, a primary aromatic diamine, and a diamine having a primary amino group and a secondary amino group, the secondary amino group having a base-reactive substituent, and heating the reaction mixture to a temperature of between about 50 deg C. and about 150 deg C. to form a polymer. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

    Abstract translation: 本文描述形成纳米多孔材料的方法,包括用化学可除去部分形成聚合物网络。 化学可除去部分可以是聚碳酸酯聚合物,其可在施加热或暴露于在暴露于酸中时可去除的碱或聚六氢三嗪(PHT)或聚乙烯胺(PHA))聚合物上除去。 该方法通常包括形成包含甲醛,溶剂,伯芳族二胺和具有伯氨基和仲氨基的二胺的反应混合物,仲氨基具有碱反应性取代基,并加热反应混合物 至约50摄氏度至约150摄氏度的温度以形成聚合物。 当聚合物链分解时,去除聚合物的任何部分导致纳米孔的形成,在聚合物基体中留下孔。

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