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    WAFER IMAGE INSPECTION APPARATUS
    82.
    发明申请
    WAFER IMAGE INSPECTION APPARATUS 有权
    WAFER图像检查装置

    公开(公告)号：US20170003230A1

    公开(公告)日：2017-01-05

    申请号：US15023112

    申请日：2014-11-27

    Applicant: NEXTIN, INC. ,  SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Tae Hoon PARK ,  Segal RAM

    IPC: G01N21/88 ,  G01N21/95

    CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8887 ,  G01N2201/063 ,  H01L22/12

    Abstract: ProA wafer image inspection apparatus for inspecting defects of a semiconductor wafer comprises: a lighting portion for generating light; a lens portion for obtaining a wafer image, which is reflected after the light has been reflected onto a wafer to be inspected, and delivering the wafer image by lighting same in one direction; a dividing optical element for dividing the wafer image delivered from the lens portion; an image detection portion comprising a plurality of image-capturing elements, which are installed so that images which have passed through the lens portion and the dividing optical element are respectively formed on different focus positions; and an image processing portion for combining the images on different focus positions captured by the plurality of image pick-up elements to form a TSOM image, and comparing the TSOM image with a TSOM image of a normal semiconductor apparatus part to determine whether an object is defective.

    Abstract translation: 用于检查半导体晶片的缺陷的ProA晶片图像检查装置包括：用于产生光的照明部分; 用于获得晶片图像的透镜部分，其在光已经被反射到要检查的晶片上之后被反射，并且通过沿一个方向照亮晶片图像来传送晶片图像; 用于分割从透镜部分传送的晶片图像的分割光学元件; 图像检测部分包括多个图像捕获元件，其被安装成使得已经通过透镜部分和分割光学元件的图像分别形成在不同的聚焦位置; 以及图像处理部分，用于组合由多个摄像元件捕获的不同对焦位置上的图像，以形成TSOM图像，并将TSOM图像与正常半导体装置部分的TSOM图像进行比较，以确定对象是否为 有缺陷

    Production Sample Shaping that Preserves Re-Normalizability
    83.
    发明申请
    Production Sample Shaping that Preserves Re-Normalizability 审中-公开
    保持重新归一化的生产样品整形

    公开(公告)号：US20150276618A1

    公开(公告)日：2015-10-01

    申请号：US14666942

    申请日：2015-03-24

    Applicant: KLA-Tencor Corporation

    Inventor： Martin Plihal ,  Ankit Jain ,  Michael Lennek

    IPC: G01N21/93 ,  H01L21/66 ,  G01N21/95

    CPC classification number: H01L22/12 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8877 ,  G01N2201/063 ,  G01N2201/12 ,  H01L22/20

    Abstract: Methods and systems for generating defect samples are provided. One method includes identifying a set of defects detected on a wafer having the most diversity in values of at least one defect attribute and generating different tiles for different defects in the set. The tiles define a portion of all values for the at least one attribute of all defects detected on the wafer that are closer to the values for the at least one attribute of their corresponding defects than the values for the at least one attribute of other defects. In addition, the method includes separating the defects on the wafer into sample bins corresponding to the different tiles based on their values of the at least one attribute, randomly selecting defect(s) from each of two or more of the sample bins, and creating a defect sample for the wafer that includes the randomly selected defects.

    Abstract translation: 提供了生成缺陷样本的方法和系统。 一种方法包括识别在具有至少一个缺陷属性值的多样性最大的晶片上检测到的一组缺陷，并为该组中的不同缺陷生成不同的瓦片。 瓦片定义了在晶片上检测到的所有缺陷的至少一个属性的所有值的一部分，其比其它缺陷的至少一个属性的值更接近于其相应缺陷的至少一个属性的值。 另外，该方法包括：基于它们的至少一个属性值，从两个或多个样本仓中的每一个中随机选择缺陷，将晶片上的缺陷分离成与不同瓦片对应的样品仓，并创建 用于晶片的缺陷样品，其包括随机选择的缺陷。

    Inspection Device
    84.
    发明申请
    Inspection Device 有权
    检验装置

    公开(公告)号：US20150177161A1

    公开(公告)日：2015-06-25

    申请号：US14416752

    申请日：2013-07-03

    Applicant: Hitachi High - Technologies Corporation

    Inventor： Takahiro Jingu

    IPC: G01N21/95 ,  G01N21/01 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N21/01 ,  G01N21/88 ,  G01N21/94 ,  G01N2201/063 ,  H01L21/67288

    Abstract: In an inspection apparatus, inspection is carried out by linearly moving a wafer while rotating the wafer with respect to light. In a case where the wafer is rotated, the velocity of flow of air in outer regions of the wafer is increased, and there is a possibility that the flow of the air in the outer regions cause particles contained in an atmosphere in the vicinity of the wafer to be adhered to the wafer. In a case where such particles are adhered to the wafer, the particles are also detected as a defect, and therefore yields and cleanliness in a semiconductor production process cannot be correctly evaluated. Therefore, it is desirable that adhesion of the particles contained in the atmosphere in the vicinity of the wafer to the wafer be reduced as much as possible. Further, it is expected that, when, for example, rotation speed of the wafer is increased or a diameter of the wafer is increased, such particles are adhered further remarkably. This point has not been satisfactorily considered in the conventional arts. The invention has a feature that a conductor such as a draft to outer regions is supplied from above a substrate while the substrate is being rotated and the supplied conductor is exhausted on outside of the substrate.

    Abstract translation: 在检查装置中，通过在使晶片相对于光线旋转的同时线性移动晶片来进行检查。 在晶片旋转的情况下，晶片的外部区域的空气流速度增加，存在外部空气的流动使得包含在气氛附近的空气中的颗粒的可能性 晶片被粘附到晶片上。 在这样的颗粒粘附到晶片的情况下，也将颗粒作为缺陷进行检测，因此不能正确地评价半导体制造工序的产率和清洁度。 因此，尽可能地减少包含在晶片附近的气氛中的颗粒与晶片的粘附。 此外，例如，当例如晶片的旋转速度增加或晶片的直径增加时，这种颗粒进一步显着地粘附。 这一点在传统技术中没有被令人满意地考虑。 本发明的特征在于，在基板旋转的同时从基板的上方向外部区域供电等导体，并且将供给的导体排出到基板的外部。

    Apparatus for and method of measuring bio-chips using uniform total internal reflection illumination
    86.
    发明授权
    Apparatus for and method of measuring bio-chips using uniform total internal reflection illumination 有权
    使用均匀全内反射照明测量生物芯片的装置和方法

    公开(公告)号：US08017079B2

    公开(公告)日：2011-09-13

    申请号：US11810915

    申请日：2007-06-07

    Applicant: Uk Kang ,  Soo Jin Bae ,  Geri V Papayan

    Inventor： Uk Kang ,  Soo Jin Bae ,  Geri V Papayan

    IPC: G01N21/00

    CPC classification number: G01N21/6452 ,  G01N21/648 ,  G01N2201/063

    Abstract: Disclosed herein is an apparatus for and method of measuring bio-chips, which can implement an illumination method of a novel type that illuminates a bio sample (which may be also referred to as a “bio specimen”) through a side face of a substrate using a diffusion plate to form an evanescent field by the illumination light over the entire surface of a substrate so as to uniformly secure brightness of the illuminated light over a wide area of a substrate, thereby more efficiently measuring fluorescence information of a bio-chip over a wide field of view.

    Abstract translation: 本文公开了一种测量生物芯片的装置和方法，其可以实现通过衬底的侧面照射生物样品（其也可以称为“生物样本”）的新型照明方法 使用扩散板通过在基板的整个表面上的照明光形成消逝场，从而均匀地将照明光的亮度保持在基板的宽阔区域上，从而更有效地测量生物芯片的荧光信息 广泛的视野。

    反射特性測定装置およびこれに用いられる偏光板の製造方法
    89.
    发明专利
    反射特性測定装置およびこれに用いられる偏光板の製造方法 有权
    反射特性测量装置的制造方法和在此所使用的偏振板

    公开(公告)号：JPWO2014083798A1

    公开(公告)日：2017-01-05

    申请号：JP2014549795

    申请日：2013-11-19

    Applicant: コニカミノルタ株式会社

    Inventor： 義幸 長嶋 ,  義幸 長嶋 ,  克敏 ▲鶴▼谷 ,  克敏 ▲鶴▼谷

    IPC: G01N21/27

    CPC classification number: G01N21/21 ,  G01N21/251 ,  G01N33/32 ,  G01N2201/063

    Abstract: 本発明の反射特性測定装置は、厚さ方向に重ねてホルダーに保持される照明光用および反射光用の各偏光板を有し、前記ホルダーは、被保持姿勢を決める被嵌合部を有し、前記各偏光板それぞれは、前記被嵌合部と嵌合する嵌合部を有し、各嵌合部は、互いの偏光方向を直交させる姿勢で前記各偏光板を前記ホルダーに保持する位置に設けられる。そして、本発明の、前記装置に用いられる偏光板の製造方法では、前記照明光用および前記反射光用の各偏光板は、同一の偏光板部材から打ち抜かれて製造される。

    Abstract translation: 本发明的反射特性测量装置具有用于照明光以及用于反射由堆叠在厚度方向上的保持器保持的光的偏振板，保持器可以具有用于确定所保持的姿态一个配合部分 并且，其中，每个偏振片的具有安装有被嵌合部的嵌合部，所述嵌合部保持各偏光板到保持器中的位置，以正交极化方向彼此 它是在一个位置上。 然后，本发明中，在装置中使用的偏振板的制造方法中，对于照明和用于反射光的偏振板是通过相同的偏振板构件的冲压生产。

    Defect detection method, defect detection device, and defect observation device provided with the same
    90.
    发明专利
    Defect detection method, defect detection device, and defect observation device provided with the same 有权
    缺陷检测方法，缺陷检测装置以及与之相关的缺陷观察装置

    公开(公告)号：JP2011106974A

    公开(公告)日：2011-06-02

    申请号：JP2009262445

    申请日：2009-11-18

    Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

    Inventor： OTANI YUKO ,  TACHIZAKI TAKEHIRO ,  WATANABE MASAHIRO ,  MATSUMOTO SHUNICHI

    IPC: G01N21/956 ,  H01L21/66

    CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for detailed observation of defects detected by an optical defect inspection apparatus or by an optical visual inspection apparatus capable of placing a defect to be observed into the field of view of an electronic microscope or the like, without fail, and reducing the size of the apparatus. SOLUTION: An electronic microscope 5, for observing defects detected by an optical defect inspection apparatus or an optical visual inspection apparatus, is configured in such a manner that an optical microscope 14 for redetecting defects is mounted thereupon and that a distribution polarization element and a spatial filter are inserted in its pupil surface, when the optical microscope 14 is used to observe dark field. In an electronic microscope 5 for observing the defects detected by an optical defect inspection apparatus or an optical visual inspection apparatus, an optical microscope 14 for redetecting defects is mounted thereupon and a distribution filter is inserted in its pupil surface, when the optical microscope 14 is used to observe dark field. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于详细观察由光学缺陷检查装置或能够将观察到的缺陷放置在电子显微镜的视场中的光学目视检查装置检测到的缺陷的装置，或者 喜欢，没有失败，并减少设备的大小。 解决方案：用于观察由光学缺陷检查装置或光学目视检查装置检测到的缺陷的电子显微镜5被配置为使得用于重新检测缺陷的光学显微镜14安装在其上，并且分布偏振元件 并且当光学显微镜14用于观察暗场时，将空间滤光片插入其瞳孔表面。 在用于观察由光学缺陷检查装置或光学目视检查装置检测到的缺陷的电子显微镜5中，在其上安装用于重新检测缺陷的光学显微镜14，并且在光学显微镜14为 用于观察暗场。 版权所有（C）2011，JPO＆INPIT

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