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    結晶シリコン太陽電池の表面テクスチャ構造及びその製造方法
    1.
    发明专利
    結晶シリコン太陽電池の表面テクスチャ構造及びその製造方法 有权
    网纹表面结构和其结晶硅太阳能电池的制造方法

    公开(公告)号：JP2017504179A

    公开(公告)日：2017-02-02

    申请号：JP2016524403

    申请日：2013-11-15

    Applicant: ▲蘇▼州阿特斯▲陽▼光▲電▼力科技有限公司 ,  ▲蘇▼州大学Soochow University ,  ▲蘇▼州大学Soochow University

    Inventor： ▲暁▼▲東▼ ▲蘇▼ ,  ▲暁▼▲東▼ ▲蘇▼ ,  ▲師▼ ▲鄒▼ ,  ▲師▼ ▲鄒▼ ,  ▲栩▼生 王 ,  ▲栩▼生 王 ,  ▲霊▼▲軍▼ 章 ,  ▲霊▼▲軍▼ 章

    IPC: H01L31/0236 ,  H01L21/306 ,  H01L21/308

    CPC classification number: H01L31/02363 ,  Y02E10/50

    Abstract: 結晶シリコン太陽電池の表面テクスチャ構造の製造方法であって、(1)シリコンウエハを洗浄して、テクスチャリングする工程と、(2)シリコンウエハを金属イオンを含有する溶液に浸漬して、シリコンウエハの表面に金属ナノ粒子層をコーティングする工程と、(3)シリコンウエハの表面を腐食して、ナノレベルの表面テクスチャ構造を形成する工程と、(4)シリコンウエハを洗浄して、金属粒子を除去する工程と、(5)シリコンウエハを第2化学エッチング液に浸漬して、微細構造に対し修正エッチングを行う工程と、(6)シリコンウエハを洗浄して、スピン乾燥させる工程と、を含む結晶シリコン太陽電池の表面テクスチャ構造の製造方法。試験によれば、本発明に係る表面テクスチャ構造は、サイズが100〜500nmであり、孔径が大きく深さが浅いナノ孔状又は角付きのナノピラミッド又は角付きのナノ円錐体又は角付きのナノピット状構造である。CN102610692Aに開示されているナノ—ミクロン複合テクスチャ構造に比べて、セルの変換効率を0.2〜0.5%程度向上させ、予想できない効果を取得した。

    Abstract translation: 制造晶体硅太阳能电池的纹理化表面结构的方法，（1）洗涤该硅晶片，纹理的工序，浸渍于含溶液的金属离子（2）的硅晶片，该硅晶片 的，（3）在硅晶片，形成纳米级的表面纹理结构的步骤的表面的腐蚀表面上涂覆金属纳米粒子层的工序，和洗涤（4）的硅晶片，金属颗粒 并除去，进行（5）的硅晶片浸渍在第二化学蚀刻剂，改性蚀刻到微结构的步骤的步骤，和对，甩干洗涤（6）的硅晶片的工序 制造方法的晶体硅太阳能电池的表面纹理化的结构。 根据试验，根据本发明的表面纹理化的结构，大小为100至500nm，具有纳米圆锥或角与纳米锥体或浅纳米孔形或方形孔尺寸更大的深度Nanopitto角 它是乔结构。 在纳米公开CN102610692A - 微米相比，复合变形，电池的转换效率是由大约0.2％至0.5％的改善，获得了不能预期的效果。

    METHOD OF PREPARING PASSIVATING CONTACTS AND METHOD OF PRODUCING PHOTOVOLTAIC DEVICE WITH N-TYPE POLYCRYSTALLINE SILICON PASSIVATING CONTACT
    5.
    发明申请
    METHOD OF PREPARING PASSIVATING CONTACTS AND METHOD OF PRODUCING PHOTOVOLTAIC DEVICE WITH N-TYPE POLYCRYSTALLINE SILICON PASSIVATING CONTACT 审中-公开

    公开(公告)号：WO2022174421A1

    公开(公告)日：2022-08-25

    申请号：PCT/CN2021/077086

    申请日：2021-02-20

    Applicant: SOOCHOW UNIVERSITY

    Inventor： YANG, Xinbo

    IPC: H01L31/18 ,  H01L31/068 ,  H01L31/0224

    Abstract: A method of preparing passivating contact and method of producing a photovoltaic device with n-type polycrystalline silicon passivating contact are provided, comprising steps of: growing a tunnel layer (102) on a substrate (101) and depositing an un-doped silicon layer (103) on the tunnel layer (102); coating the un-doped silicon layer (103) using phosphorus acid solution (104); and performing thermal annealing to activate the phosphorus doping and converting the un-doped silicon layer (103) to a phosphorus doped polycrystalline silicon layer (105). The method is particularly advantageous in preparing n-type polycrystalline silicon passivating contacts by using phosphoric acid solution (104), and the method can achieve excellent passivating contact performance with a safe, simple and low-cost process.

    A METHOD FOR DETERMINING AIR DRYING KINETICS OF A PRODUCT AND A DEVICE USED THEREOF
    6.
    发明申请
    A METHOD FOR DETERMINING AIR DRYING KINETICS OF A PRODUCT AND A DEVICE USED THEREOF 审中-公开

    公开(公告)号：WO2020048520A1

    公开(公告)日：2020-03-12

    申请号：PCT/CN2019/104637

    申请日：2019-09-06

    Applicant: SOOCHOW UNIVERSITY

    Inventor： CHEN, Xiaodong ,  XIAO, Jie ,  PUTRANTO, Aditya ,  FU, Nan

    IPC: G01N33/00 ,  G01D21/00

    Abstract: A method for determining air drying kinetics of a product comprise the steps of: S1: constructing a reaction engineering approach; S2: measuring and recording separately the temperature and moisture changed over time; S3: determining the ratio of the heat transfer coefficient to the mass transfer coefficient; S4: calculating the reaction engineering approach parameters: activation energy and rate constant; S5: measuring and obtaining a temperature-moisture relationship equation; S6: establishing a reaction engineering approach drying kinetics. Also, there is a purposely designed and constructed device used for determining air drying kinetics of a product.

    REVERSIBLE SELF-REPAIRING EPOXY RESIN AND PREPARATION AND RECOVERY REMOULDING METHOD THEREFOR
    10.
    发明申请
    REVERSIBLE SELF-REPAIRING EPOXY RESIN AND PREPARATION AND RECOVERY REMOULDING METHOD THEREFOR 审中-公开

    公开(公告)号：US20200283595A1

    公开(公告)日：2020-09-10

    申请号：US16759327

    申请日：2018-02-27

    Applicant: SOOCHOW UNIVERSITY ,  ZHANGJIAGANG INSTITUTE OF INDUSTRIAL TECHNOLOGIES SOOCHOW UNIVERSITY

    Inventor： Guozheng LIANG ,  Youhao ZHANG ,  Aijuan GU ,  Li YUAN

    IPC: C08J11/12 ,  C08G59/42 ,  C07D327/00

    Abstract: This invention provides a self-healable epoxy resin and its preparation, recycling and remolding method. With the catalyst of potassium iodide, an ester solution of 2-mercaptoacetic acid was oxidated by 30% H2O2 to form 2,2′-dithiodiacetic acid; then 2,2′-dithiodiacetic acid was dehydrated and cyclizated by anhydride to form 1,4,5-oxadithiepane-2,7-dione; 1,4,5-oxadithiepane-2,7-dione and methylhexahydrophthalic anhydride were mixed by mass ratio and cured with epoxides to get the self-healable epoxy resin. Through controlling dynamic and permanent three-dimensional crosslinked network, the self-healable epoxy resins provided in this invention exhibit high thermal resistance and improved mechanical properties as well as excellent self-healing ability, recyclability and remoldability. This invention provides a preparation method with the merits of low cost, simple production processes, broad application prospects and strong utility.

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