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公开(公告)号：JP2007142428A
公开(公告)日：2007-06-07
申请号：JP2006310702
申请日：2006-11-16
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： ANTONIUS LEENDERS MARTINUS H , OTTENS JOOST JEROEN , KEMPER NICOLAAS R
IPC: H01L21/027 , G03F7/20
Abstract: PROBLEM TO BE SOLVED: To improve the throughput of an exposure apparatus by increasing scanning speed in an immersion exposure apparatus. SOLUTION: A liquid supply system for supplying liquid between a projection system PL and a substrate is provided with a barrier member 12 for sealing the liquid, however, the relative speed between the barrier member 12 and the substrate can be reduced, thereby to increase the speed of the substrate relative to the projection system PL by forming the barrier member 12 so that the barrier member can move relatively to the projection system PL and independently of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：通过增加浸没曝光装置中的扫描速度来提高曝光装置的生产量。 解决方案：用于在投影系统PL和基板之间供应液体的液体供应系统设置有用于密封液体的阻挡构件12，然而，可以减小阻挡构件12和基板之间的相对速度，由此 通过形成阻挡构件12使得阻挡构件能够相对于投影系统PL移动而独立于衬底来增加衬底相对于投影系统PL的速度。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2010278475A
公开(公告)日：2010-12-09
申请号：JP2010196374
申请日：2010-09-02
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： OTTENS JOOST JEROEN , JACOBS JOHANNES HENRICUS WILHELMUS , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS H
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a method of preventing liquid for immersion lithography from relatively deeply entering under a substrate. SOLUTION: A method of helping to prevent liquid reaching under a substrate is disclosed. The method includes steps of: introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate; and helping to keep immersion liquid that is present at the top and edge of the substrate away from the lower surface of the substrate. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：提供一种防止浸没式光刻液体相对深入基底的方法。 公开了一种有助于防止液体到达基底的方法。 该方法包括以下步骤：在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液; 并且有助于保持存在于基板的顶部和边缘处的浸没液体远离基板的下表面。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：JP2007180555A
公开(公告)日：2007-07-12
申请号：JP2006349601
申请日：2006-12-26
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： OTTENS JOOST JEROEN , JACOBS JOHANNES HENRICUS WILHE , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS H
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a method of preventing immersion exposure liquid from relatively deeply entering under a substrate. SOLUTION: There are provided a projection system for projecting radiation beam, to which a pattern is given, on a target portion of a substrate W; a substrate holding part WH for holding the substrate W; a discharge port 24 for reducing a pressure of a space between the substrate W and the substrate holding part WH; a liquid supply system for supplying liquid 11 to the space between the projection system and the substrate holding part WH; and a gas supply port 22 provided so as to be positioned in the vicinity of the lower surface of a substrate edge when the substrate W is held by the substrate holding part WH, wherein the gas supply port 22 supplies gas to the space between the substrate W and the substrate holding part WH so that the supplied liquid 11 does not substantially enter under the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种防止浸没曝光液体相对深入基底的方法。 解决方案：提供了一种投影系统，用于在衬底W的目标部分上投射有图案的辐射束; 用于保持基板W的基板保持部WH; 用于减小基板W和基板保持部WH之间的空间的压力的排出口24; 用于将液体11供应到投影系统和基板保持部分WH之间的空间的液体供应系统; 以及气体供给口22，其被设置为当基板W被基板保持部WH保持时位于基板边缘的下表面附近，其中，气体供给口22将气体供给到基板 W和基板保持部WH，使得供给的液体11基本上不进入基板W的下方。（C）2007，JPO＆INPIT
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公开(公告)号：JP2011071545A
公开(公告)日：2011-04-07
申请号：JP2010275375
申请日：2010-12-10
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC: H01L21/027
CPC classification number: G03F7/70341 , G03F7/707
Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPITAbstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：JP2010187025A
公开(公告)日：2010-08-26
申请号：JP2010114261
申请日：2010-05-18
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： ANTONIUS LEENDERS MARTINUS H , OTTENS JOOST JEROEN , KEMPER NICOLAAS R
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To improve the throughput of immersion lithography.
SOLUTION: An immersion lithographic apparatus is disclosed. In the immersion lithographic apparatus, at least a part of the liquid supply system which provides liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between the part and the substrate, so that the velocity at which the substrate is moved relative to the projection system is increased.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提高浸没光刻的吞吐量。 解决方案：公开了一种浸没式光刻设备。 在浸没式光刻设备中，在投影系统和基板之间提供液体的液体供应系统的至少一部分可在扫描期间在基本平行于基板顶表面的平面内移动。 移动部件以减小部件和基板之间的相对速度，使得基板相对于投影系统移动的速度增加。 版权所有（C）2010，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2010171455A
公开(公告)日：2010-08-05
申请号：JP2010096638
申请日：2010-04-20
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/707
Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography apparatus may further include an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：为了防止浸没液体中的气泡的存在对浸没式光刻设备中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻设备中，通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板，可以使浸没液中的气泡形成最小化或防止 弥补差距。 浸没式光刻设备还可以包括致动器，该致动器在物体与液体接触时横向移动物体在支撑台的孔中，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2007150308A
公开(公告)日：2007-06-14
申请号：JP2006315814
申请日：2006-11-22
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOL , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNE , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC: H01L21/027
CPC classification number: G03F7/70341 , G03F7/707
Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography.
SOLUTION: In the immersion lithography, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography may further comprise an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：为了防止浸没液中的气泡的存在对浸没式光刻中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻中，可以通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板覆盖物来减小或防止浸没液体中的气泡的形成 差距。 浸没式光刻可以进一步包括致动器，该致动器在物体与液体接触时使物体在支撑台的孔中横向移动，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2011205121A
公开(公告)日：2011-10-13
申请号：JP2011124242
申请日：2011-06-02
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： ANTONIUS LEENDERS MARTINUS H , OTTENS JOOST JEROEN , KEMPER NICOLAAS R
IPC: H01L21/027
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To improve throughput in immersion lithography.SOLUTION: There is disclosed an immersion photolithographic apparatus, in which at least a part of a liquid supply system which provides liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between the part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Abstract translation: 要解决的问题：提高浸没光刻中的生产量。解决方案：公开了一种浸没式光刻设备，其中在投影系统和基板之间提供液体的液体供应系统的至少一部分可在基本上平行的平面中移动 在扫描期间到达基板的顶表面。 移动部件以减小部件和基板之间的相对速度，使得可以相对于投影系统移动基板的速度。
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公开(公告)号：JP2010245569A
公开(公告)日：2010-10-28
申请号：JP2010164859
申请日：2010-07-22
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOLAAS , GRAAF ROELOF FREDERICK DE , CHRISTIAAN ALEXANDER HOOGENDAM , JACOBS HERNES , ANTONIUS LEENDERS MARTINUS H , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD CORNELIS , SMITS PETER , JANSSEN FRANCISCUS JOHANNES J , RIEPEN MICHEL
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/707
Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus which reduces bubbles in an immersion liquid to prevent an adverse effect on pattern image quality. SOLUTION: The liquid immersion lithographic apparatus is provided to minimize bubbles generated or to prevent bubbles from being generated in the immersion liquid by reducing sizes or volumes of gaps between a target object and a substrate support table, and their upper structures, in the liquid immersion lithographic apparatus, and/or preparing a cover plate covering the gaps. The liquid immersion lithographic apparatus may further include an actuator which laterally moves the target object in a hole of the substrate support table to reduce a gap between a peripheral end of the target object and an inner side of the hole when the target object is in contact with the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：提供一种减少浸没液体中的气泡以防止对图案图像质量的不利影响的液浸光刻设备。 解决方案：提供液浸式光刻设备，以最小化产生的气泡或通过减少目标物体和基底支撑台及其上部结构之间的间隙的尺寸或体积来防止在浸没液体中产生气泡， 液浸光刻设备，和/或制备覆盖间隙的盖板。 液浸式光刻设备还可以包括致动器，该致动器在目标物体接触时使目标物体在基板支撑台的孔中横向移动，以减小目标物体的外周端与孔的内侧之间的间隙 与浸没液体。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：JP2008277856A
公开(公告)日：2008-11-13
申请号：JP2008163625
申请日：2008-06-23
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： ANTONIUS LEENDERS MARTINUS H , OTTENS JOOST JEROEN , KEMPER NICOLAAS R
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To improve throughput in liquid immersion lithography. SOLUTION: A liquid immersion exposure apparatus is disclosed. At least a part of a liquid supply system to supply a liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top face of the substrate during scanning. The part is moved to reduce the relative speed between that part and the substrate, so that the speed of the substrate relative to the projection system may be increased. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了提高液浸光刻中的生产率。 解决方案：公开了一种浸液曝光装置。 在投影系统和基板之间供应液体的液体供应系统的至少一部分可在扫描期间在基本上平行于基板的顶面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，从而可以增加基板相对于投影系统的速度。 版权所有（C）2009，JPO＆INPIT
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