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    Lithographic apparatus and device manufacturing method utilizing data filtering
    1.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing data filtering 有权
    利用数据过滤的平面设备和设备制造方法

    公开(公告)号：JP2009302549A

    公开(公告)日：2009-12-24

    申请号：JP2009174603

    申请日：2009-07-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT

    IPC: H01L21/027

    CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method that more efficiently and effectively performs maskless lithography. SOLUTION: The apparatus and method comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that includes only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal comprising spot exposure intensities to be generated by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供更有效和更有效地执行无掩模光刻的装置和方法。 解决方案：该装置和方法包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。 数据处理装置基于斑点曝光强度对频率削减的目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2010，JPO＆INPIT

    Patterning device utilizing set of stepped mirror and method of using the same
    5.
    发明专利
    Patterning device utilizing set of stepped mirror and method of using the same 有权
    使用阶梯镜的组合装置及其使用方法

    公开(公告)号：JP2008070866A

    公开(公告)日：2008-03-27

    申请号：JP2007196523

    申请日：2007-07-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MAT ,  TINNEMANS PATRICIUS ALOYSIUS J

    IPC: G03F7/20 ,  G02B26/06 ,  H01L21/027

    CPC classification number: G03F7/70291 ,  G03F7/70283

    Abstract: PROBLEM TO BE SOLVED: To independently control multiple parameters of a patterned beam.
    SOLUTION: The present invention provides a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other by the controller. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to pattern the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g. semiconductor substrate or flat panel display substrate) or a display device.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：独立地控制图案化束的多个参数。 解决方案：本发明提供一种图案形成装置，其构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化。 阵列包括由控制器相对于彼此控制的多组四个阶梯式反射镜组。 每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。 在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。 例如，该物体可以是基板（例如半导体基板或平板显示基板）或显示装置。 版权所有（C）2008，JPO＆INPIT

    System and method to correct for field curvature of multilens array
    6.
    发明专利
    System and method to correct for field curvature of multilens array 有权
    校正多重阵列场景曲率的系统和方法

    公开(公告)号：JP2007133382A

    公开(公告)日：2007-05-31

    申请号：JP2006274002

    申请日：2006-10-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JORRITSMA LAURENTIUS C ,  BASELMANS JOHANNES JACOBUS MAT

    IPC: G03F7/20 ,  G02F1/13 ,  H01L21/027

    CPC classification number: G02B27/0025 ,  G02B3/0006 ,  G03F7/2008 ,  G03F7/70275 ,  G03F7/70308

    Abstract: PROBLEM TO BE SOLVED: To reduce focal plane errors of a projected beam onto a substrate in beam scanning exposure. SOLUTION: Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface 15, shaped such that focal points 13' of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, the correction surface is shaped so as to minimize the average distance between the focus and a given plane. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：在光束扫描曝光中减少投影光束到基板上的焦平面误差。 解决方案：通过使用非平面校正表面15来减少聚焦元件阵列的场的焦平面误差，该非平面校正表面15成形为使得聚焦元件的焦点13'靠近单个平面比它们将如 校正表面是平面的。 例如，校正表面被成形为使聚焦和给定平面之间的平均距离最小化。 版权所有（C）2007，JPO＆INPIT

    Method and system for forming lithographic beam
    7.
    发明专利
    Method and system for forming lithographic beam 有权
    用于形成光栅的方法和系统

    公开(公告)号：JP2006191063A

    公开(公告)日：2006-07-20

    申请号：JP2005375393

    申请日：2005-12-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DE JAGER PIETER WILLEM HERMAN ,  BASELMANS JOHANNES JACOBUS MAT ,  BRUINSMA ANASTASIUS JACOBUS AN ,  MUNNIG SCHMIDT ROBERT-HAN ,  VINK HENRI JOHANNES PETRUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/7005

    Abstract: PROBLEM TO BE SOLVED: To provide an improved system and a method for lithographic illumination that provides a projection beam with a desired output. SOLUTION: The device and the method for the lithographic illumination include steps of: receiving radiation beams of a plurality of radiation sources from a plurality of corresponding radiation sources; deflecting the radiation beams of the plurality of radiation sources along a common beam path; thereby generating a projection beam of radiation; providing the projection beam of radiation with a cross-section pattern; and projecting the patterned projection beam of radiation to a target portion of a substrate. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提供具有期望输出的投影光束的改进的光刻照明系统和方法。 解决方案：用于光刻照明的装置和方法包括以下步骤：从多个对应的辐射源接收多个辐射源的辐射束; 沿着共同的光束路径使多个辐射源的辐射束偏转; 从而产生投影射束; 提供具有横截面图案的辐射投影光束; 以及将所述图案化的投影辐射束投射到基板的目标部分。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and device manufacturing method
    8.
    发明专利
    Lithography apparatus and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006165550A

    公开(公告)日：2006-06-22

    申请号：JP2005347652

    申请日：2005-12-01

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其能够在不改变在光刻设备的投影系统和基板之间流动的液体的方向的方向上移动基板，而在具有液体供应的光刻设备中 系统。 解决方案：该光刻设备具有用于将液体供应到光刻设备的投影系统与基板之间的空间的输入端口和用于去除至少一部分液体的输出端口。 光刻设备具有一个液体供应系统，用于围绕基本上垂直于衬底的曝光平面的轴线旋转输入端口和输出端口中的任何一个或两个。 版权所有（C）2006，JPO＆NCIPI

    Lithography projection device, and device manufacturing method using the same
    9.
    发明专利
    Lithography projection device, and device manufacturing method using the same 审中-公开
    抛光投影装置及其装置制造方法

    公开(公告)号：JP2006157020A

    公开(公告)日：2006-06-15

    申请号：JP2005344811

    申请日：2005-11-30

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： AKHSSAY M HAMED ,  BASELMANS JOHANNES JACOBUS MAT ,  COMMISSARIS FRANCISCUS ANTONIU ,  DE GROOT SIMON ,  JEUNINK ANDRE BERNARDUS ,  TEL WIM TJIBBO ,  VAN DER HOFF ALEXANDER HENDRIK ,  VAN DE STADT ARNOUT

    IPC: H01L21/027

    CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection device and a device manufacturing method using the same. SOLUTION: The lithography projection device has a measurement system which measures changes of the projection system aberration with time, and a prediction/control system which predicts changes of the projection system aberration with time based on a parameter and generates a control signal to compensate characteristics of the device changing with time, such as OLV values and FOC values of lenses of the projection system. An in-line model identification system is provided to predict model parameter errors based on projection system aberration values provided by the prediction/control system and measured projection system aberration values provided by the measurement system. A replacement system replaces the model parameter of the prediction/control system by utilizing the model parameter errors to keep the characteristics changing with time in the range of an allowable performance standard. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 解决的问题：提供一种光刻投影装置及使用其的装置制造方法。 解决方案：光刻投影装置具有测量投影系统像差随时间变化的测量系统，以及基于参数预测投影系统像差随时间变化的预测/控制系统，并产生控制信号 补偿设备随时间变化的特性，例如投影系统的镜头的OLV值和FOC值。 提供了一种在线模型识别系统，用于基于由预测/控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来预测模型参数误差。 替代系统通过利用模型参数误差来代替预测/控制系统的模型参数，以使特性随时间变化在允许的性能标准的范围内。 版权所有（C）2006，JPO＆NCIPI

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