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    Reflective loop system producing incoherent radiation
    2.
    发明专利
    Reflective loop system producing incoherent radiation 有权
    反射环系统产生不可避免的辐射

    公开(公告)号：JP2010187027A

    公开(公告)日：2010-08-26

    申请号：JP2010118202

    申请日：2010-05-24

    Applicant: Asml Netherlands Bv ,  Dainippon Screen Mfg Co Ltd ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  大日本スクリーン製造株式会社

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  UEYAMA KENJI

    IPC: H01L21/027 ,  G02B5/00 ,  G02B17/06 ,  G02B19/00 ,  G03F7/20

    CPC classification number: G03F7/70583 ,  G02B27/48

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for producing incoherent radiation having uniform illuminance. SOLUTION: The system and method are used to form incoherent beams from a coherent beam. The system includes a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system receives the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively a plurality of non-overlapping loops, to form an incoherent beam. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于产生具有均匀照度的不相干辐射的系统和方法。 解决方案：系统和方法用于从相干光束形成非相干光束。 该系统包括辐射源和反射回路系统。 辐射源产生相干或部分相干的光束。 反射回路系统接收部分相干光束，并通过环路反射部分相干光束，或者替代地，多个非重叠环路，以形成非相干光束。 版权所有（C）2010，JPO＆INPIT

    Lithographic method and apparatus
    4.
    发明专利
    Lithographic method and apparatus 有权
    光刻方法和装置

    公开(公告)号：JP2013187539A

    公开(公告)日：2013-09-19

    申请号：JP2013025770

    申请日：2013-02-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  JASPER JOHANNES CHRISTIAAN MARIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/705 ,  G03F7/70058 ,  G03F7/70141 ,  G03F7/706 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To provide, for example, a lithographic method which provides an improved throughput or availability compared with known lithographic methods.SOLUTION: Provided is a method of patterning substrates using a lithographic apparatus. The method comprises: providing a beam of radiation using an illumination system; using a patterning device to provide the radiation beam with a pattern in its cross-section; and using a projection system to project the patterned radiation beam onto target portions of a substrate lot. The method further comprises: performing radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the substrate lot; adjusting the projection system using results of the radiation beam aberration measurement; and then projecting the patterned radiation beam onto a further subset of the substrate lot.

    Abstract translation: 要解决的问题：提供例如与已知平版印刷方法相比提供改善的生产量或可用性的光刻方法。提供了一种使用光刻设备对基板进行图案化的方法。 该方法包括：使用照明系统提供辐射束; 使用图案形成装置在其横截面上提供具有图案的辐射束; 以及使用投影系统将图案化的辐射束投影到衬底批的目标部分上。 该方法还包括：在将图案化的辐射束投影到衬底批次的子集之后执行辐射束像差测量; 使用辐射束像差测量结果调整投影系统; 然后将图案化的辐射束投影到衬底批的另一个子集上。

    Lithographic apparatus and device manufacturing method utilizing data filtering
    5.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing data filtering 有权
    利用数据过滤的平面设备和设备制造方法

    公开(公告)号：JP2013048258A

    公开(公告)日：2013-03-07

    申请号：JP2012220149

    申请日：2012-10-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method, for executing maskless lithography more effectively.SOLUTION: The apparatus comprise a projection system, a pattern forming device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto a substrate as an array of sub-beams of the radiation. The pattern forming device modulates the sub-beams of the radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter executes calculation of pattern data derived from the requested dose pattern, thereby forming a frequency-clipped target dose pattern mainly including only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal including spot exposure intensities to be generated by the patterning device, on the basis of a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern.

    Abstract translation: 要解决的问题：提供一种更有效地执行无掩模光刻的装置和方法。 解决方案：该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到衬底上作为辐射的子束的阵列。 图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。 低通滤波器执行从所请求的剂量图案导出的图案数据的计算，从而形成主要仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，生成包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2013，JPO＆INPIT

    Lithographic apparatus, and device manufacturing method
    6.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2011018925A

    公开(公告)日：2011-01-27

    申请号：JP2010198845

    申请日：2010-09-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  STREEFKERK BOB

    IPC: H01L21/027 ,  G03F9/02

    CPC classification number: G03F9/7023 ,  G03F7/70341 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide a method for correcting an exposure parameter of an immersion lithographic apparatus, and to provide a device and/or a computer program product.SOLUTION: In this method, an exposure parameter is measured using measuring beams 22, 24 projected through a liquid between the projection system PL and a substrate table of the immersion lithographic apparatus, and offset is determined based on a change of a physical property influencing measurement made using the measuring beams to at least partly correct the measured exposure parameter. Also, the height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus is measured.

    Abstract translation: 要解决的问题：提供一种用于校正浸没式光刻设备的曝光参数的方法，并提供设备和/或计算机程序产品。解决方案：在该方法中，使用测量光束22,24测量曝光参数 通过投影系统PL和浸没式光刻设备的衬底台之间的液体投影，并且基于影响使用测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正测量的曝光参数。 此外，测量在浸没式光刻设备中连接到投影系统和基板台之间的液体的光学元件的高度。

    Lithographic apparatus, and method of manufacturing device
    7.
    发明专利
    Lithographic apparatus, and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2010183099A

    公开(公告)日：2010-08-19

    申请号：JP2010088441

    申请日：2010-04-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

    Abstract: PROBLEM TO BE SOLVED: To prevent or reduce generation of residual liquid, for example, on a substrate and/or substrate table after exposure of the substrate, in an immersion lithographic apparatus. SOLUTION: In immersion lithography, after the exposure of the substrate is completed, a detector is used to detect the residual liquid that remains on the substrate and/or substrate table. When the residual liquid is detected, an alarm signal may be generated to instruct an operator to take measures of manual correction. When an automatic drying system is started or a drying process is already executed alternatively, the apparatus is restarted. An error code flag may be added to instruct a track unit on execution of an additional drying step such as spin drying before sintering after exposure or other processes which are likely to be affected by liquid. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 待解决的问题：在浸没式光刻设备中，为了防止或减少残留液体的产生，例如在基板和/或基板台上暴露之后。 解决方案：在浸没式光刻中，在完成基板曝光之后，使用检测器来检测残留在基板和/或基板台上的残留液体。 当检测到残留液体时，可能产生报警信号以指示操作者采取手动校正措施。 当自动干燥系统启动或干燥处理已经交替执行时，装置重启。 可以添加错误代码标志来指示轨道单元执行额外的干燥步骤，例如在暴露之后的烧结之前的旋转干燥或可能受液体影响的其它过程。 版权所有（C）2010，JPO＆INPIT

    Lithographic method and apparatus
    8.
    发明专利
    Lithographic method and apparatus 有权
    光刻方法和装置

    公开(公告)号：JP2013225673A

    公开(公告)日：2013-10-31

    申请号：JP2013077786

    申请日：2013-04-03

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: H01L21/027 ,  G02B19/00 ,  G03F7/20

    CPC classification number: G01J1/42 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/70941

    Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for determining apodization properties of a projection system in a lithographic apparatus.SOLUTION: The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths, a pinhole reticle provided with wedges of different orientations is used.

    Abstract translation: 要解决的问题：提供一种用于确定光刻设备中的投影系统的变迹特性的方法和装置。解决方案：该方法包括允许来自照明场中的给定点的光沿着至少三种不同的方式通过投影系统 光路，然后确定来自两个不同光路的投影场中接收的光的强度差，以及从强度差计算投影系统的变迹特性。 不需要知道照明场中的强度分布。 为了提供不同的光路，使用设置有不同取向的楔的针孔掩模版。

    Lithographic apparatus, method, and computer program product for generating mask pattern, and method of manufacturing device using the same
    10.
    发明专利
    Lithographic apparatus, method, and computer program product for generating mask pattern, and method of manufacturing device using the same 有权
    用于生成掩模图案的平版印刷设备，方法和计算机程序产品，以及使用其制造设备的方法

    公开(公告)号：JP2011095755A

    公开(公告)日：2011-05-12

    申请号：JP2010248143

    申请日：2010-11-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  KAREL DIEDERICK VAN DER MAST ,  KARS ZEGER TROOST

    IPC: G03F1/08

    CPC classification number: G03F7/70283 ,  G03F1/36 ,  G03F7/70291 ,  G03F7/70441

    Abstract: PROBLEM TO BE SOLVED: To provide an improved method that brings about an optical proximity effect correction features to lithography. SOLUTION: Grayscale optical proximity effect correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features (S11). The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process (S15) of simulating an aerial image that would be produced by the pattern (S12), comparing the simulation to the desired pattern (S14), and adjusting the OPC features may be used to generate an optimum pattern for projection. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种将光学邻近效应校正特征引入光刻的改进方法。 解决方案：通过使用二维校正核或两个一维校正内核卷积器件特征来将灰度光学邻近效应校正器件特征添加到掩模图案中，以产生灰度OPC特征（S11）。 所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。 可以使用模拟由图案产生的空间图像（S12），将模拟与期望图案进行比较（S14）和调整OPC特征的迭代处理（S15）来生成用于投影的最佳图案。 版权所有（C）2011，JPO＆INPIT

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