公开(公告)号：JP2011238961A

公开(公告)日：2011-11-24

申请号：JP2011164018

申请日：2011-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  SIEBE LANDHEER ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To reduce a heat load applied to a projection system and/or an immersion system.SOLUTION: A lithographic apparatus comprises a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also comprises a barrier member surrounding a space between the substrate in use and the projection system, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further comprises a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Abstract translation: 要解决的问题：减少施加到投影系统和/或浸没系统的热负荷。 解决方案：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统具有最终元素。 该装置还包括围绕使用中的基板和投影系统之间的空间的阻挡构件，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011023749A

公开(公告)日：2011-02-03

申请号：JP2010235673

申请日：2010-10-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  BECKERS MARCEL ,  BELFROID STEFAN PHILIP CHRISTIAAN ,  MIGCHELBRINK FERDY ,  SERGEI SHULEPOV

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/709 ,  G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide a system to remove an immersion liquid capable of controlling the level of the immersion liquid present in space among a barrier member, a final element of a projection system and a substrate.
SOLUTION: A plurality of extraction conduits are provided in order to remove the immersion liquid prior to entry into a chamber. The extraction conduits are disposed at various distances from a target part of the substrate. A channel added with a suction force from the chamber is provided. When all conduits are filled with the immersion liquid, the extraction capacity becomes larger than that when one conduit or a plurality of conduits contain gas.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种系统，以去除能够控制在阻挡构件，投影系统的最终元件和基板之间的空间中存在的浸没液体的液位的浸没液体。 解决方案：提供多个提取管道以便在进入室之前去除浸没液体。 提取管道设置在与基板的目标部分不同的距离处。 提供了具有来自腔室的吸力的通道。 当所有管道充满浸没液体时，提取能力大于当一个管道或多个管道含有气体时的提取能力。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010050454A

公开(公告)日：2010-03-04

申请号：JP2009186941

申请日：2009-08-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus by which two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized. SOLUTION: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以将两相流稳定化和/或至少基本上分离成液态和气体流并且期望地基本上最小化的装置。 解决方案：描述了一种浸没式光刻设备，其中通过使富含液体的液流优先沿着表面流动，将两相流分离成富含液体的富气流。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012142625A

公开(公告)日：2012-07-26

申请号：JP2012099767

申请日：2012-04-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  VAN OERLE BARTHOLOMEUS MATHIAS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To limit the movement of immersion liquid in a gap between immersion system structure and a projection system, and to reduce the quantity of immersion liquid that escapes the immersion system through the gap.SOLUTION: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The lithographic apparatus also includes a barrier member, surrounding a space between the projection system, and the substrate in use, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of the projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a lyophobic outer surface. The lyophobic outer surface of the barrier member and/or the lyophobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

Abstract translation: 要解决的问题：为了限制浸没液体在浸没系统结构和投影系统之间的间隙中的移动，并且减少通过间隙逸出浸没系统的浸液的量。 解决方案：光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括围绕投影系统和使用中的基板之间的空间的阻挡构件，以部分地将投影系统限定为用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有疏液外表面。 屏障构件的疏液外表面和/或突出系统部分的疏液外表面具有部分限定储存器的内边缘。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009260343A

公开(公告)日：2009-11-05

申请号：JP2009094473

申请日：2009-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLEMENS JOHANNES GERARDUS VAN ,  NICOLAAS FRANCISCUS KOPPELAARS ,  ANTONIUS LEENDERS MARTINUS HEN ,  LIEBREGTS PAULUS MARTINUS MARI ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  BECKERS MARCEL ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  DANNY MARIA HUBERTUS PHILIPS ,  VERHEES REMKO JAN PETER ,  PIETER MULDER ,  VAN VLIET EVERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To disclose an immersion lithographic apparatus that includes a fluid supply system for supplying a fluid. SOLUTION: The fluid supply system has a chamber with a plurality of inlet holes formed in a first sidewall and a plurality of outlet holes formed in a second sidewall, wherein the first sidewall faces the second sidewall, and the inlet holes allows fluid entering the chamber to induce in a direction towards areas of the second sidewall between the plurality of outlet holes. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种浸没式光刻设备，其包括用于供应流体的流体供应系统。 解决方案：流体供应系统具有腔室，其具有形成在第一侧壁中的多个入口孔和形成在第二侧壁中的多个出口孔，其中第一侧壁面向第二侧壁，并且入口孔允许流体 进入室以沿朝向多个出口孔之间的第二侧壁的区域的方向引诱。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007184576A

公开(公告)日：2007-07-19

申请号：JP2006337301

申请日：2006-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005340825A

公开(公告)日：2005-12-08

申请号：JP2005150621

申请日：2005-05-24

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BECKERS MARCEL ,  HULTERMANS RONALD J ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  KOPPELAARS NICOLAAS F ,  SCHOTSMAN JAN-MARIUS ,  DER HAM RONALD V ,  VAN UIJTREGT JOHANNES ANTONIUS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device having a gas flushing device.
SOLUTION: The lithography device includes a lighting system which supplies projection beams, and a support structure which supports a patterning device useful for supplying beams having a pattern in the section thereof. The lithography device also has a gas flushing device which flushes a practically layered gas flow across the projection beams and/or along the surface of optical components and includes a single gas exit having an inner rim on the downstream end thereof. The inner rim demarcates the entire area of the gas exit, which is equipped with a laminator having an effective area where the layered gas flow practically comes out therefrom when the gas is used. The effective area of the laminator has a laminator opening and includes a material at least having the same size as the entire area of the gas exit.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有气体冲洗装置的光刻装置。 解决方案：光刻设备包括提供投影光束的照明系统，以及支撑结构，其支撑用于在其部分中提供具有图案的光束的图案形成装置。 光刻装置还具有气体冲洗装置，其冲刷跨越投影束和/或沿着光学部件的表面的实际分层的气流，并且包括在其下游端具有内缘的单个气体出口。 内缘划分出气体出口的整个区域，该气体出口配备有当使用气体时具有有效面积的层压气体实际上从其出来的层压机。 层压机的有效面积具有层压机开口，并且包括至少与气体出口的整个区域具有相同尺寸的材料。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2012182498A

公开(公告)日：2012-09-20

申请号：JP2012135571

申请日：2012-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011066416A

公开(公告)日：2011-03-31

申请号：JP2010206356

申请日：2010-09-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a seal member or a barrier member that reduces a turbulent flow and an overflow of immersion liquid in a liquid supply system for an immersion lithographic apparatus.
SOLUTION: The immersion liquid is supplied into a seal member 12 through an inlet 128. The immersion liquid is pushed into orifices 121 that permit fluid communication between a first chamber 120 and a second chamber 122, causing a first pressure drop in the immersion liquid. The orifices 121 are individual holes prepared in a plate 123 separating the chambers 120 and 122, and the orifices 121 disperse a flow in a tangential direction over a plate 126 separating the chamber 122 from a space, ensuring a uniform flow over the width of the array of orifices 124. The orifices 124 are provided as a (regular) two-dimensional array in the plate 126 of the seal member 12. Thus uniform and parallel flows are generated in the space.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种密封构件或阻挡构件，其减少用于浸没式光刻设备的液体供应系统中的湍流和浸没液体的溢出。 解决方案：浸没液体通过入口128供应到密封构件12.浸入液体被推入孔口121，孔口121允许第一室室120和第二室室122之间的流体连通， 浸液 孔121是在分离腔室120和122的板123中制备的单独的孔，并且孔口121沿切线方向分散流体，从而使腔室122与空间分离，从而确保在宽度方向上的均匀流动 孔124的阵列在密封构件12的板126中作为（规则的）二维阵列提供。因此，在该空间中产生均匀和平行的流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010153920A

公开(公告)日：2010-07-08

申请号：JP2010075268

申请日：2010-03-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  JACOBS JOHANNES H W ,  KATE NICOLAAS T ,  MIGCHELBRINK FERDY

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system of a liquid immersion lithographic apparatus, the system taking measures by which possibility of liquid overflow from between a projection system and a substrate or possibility of air bubble inclusion into the liquid is reduced.
SOLUTION: A protrusion 100 is prepared on a barrier member 10 at least partially confining the liquid between the projection system PL and the substrate W. The protrusion 100 comes closer to the projection system PL than other parts of the barrier member 10, thereby promotes adherence of a liquid meniscus 110 between the protrusion 100 and the projection system PL.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供液浸式光刻设备的液体供应系统，采取措施减少液体从投影系统和基板之间溢出的可能性或气泡夹杂在液体中的可能性 。 解决方案：在阻挡构件10上制备突起100，其至少部分地限制投影系统PL和衬底W之间的液体。突起100比阻挡构件10的其它部分更靠近投影系统PL， 从而促进突起100和投影系统PL之间的液体弯液面110的粘附。 版权所有（C）2010，JPO＆INPIT