公开(公告)号：JP2006293352A

公开(公告)日：2006-10-26

申请号：JP2006102617

申请日：2006-04-04

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BLEEKER ARNO JAN ,  TROOST KARS ZEGER ,  MAAS ADRIANUS JOHANNES HENRICU

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70508 ,  G03F7/70275 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a device manufacturing method utilizing multiple die designs on a substrate.
SOLUTION: The apparatus is equipped with a first data buffer 10 storing pattern data corresponding to a pattern to be exposed and a second data buffer 12 storing pattern variation data corresponding to at least one change to a part of the pattern, wherein at least one variation of the pattern is transferred by exposure on one of the areas on a substrate by using pattern variation data.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供在基板上利用多个管芯设计的光刻设备和器件制造方法。 解决方案：该装置配备有第一数据缓冲器10，其存储对应于要曝光的图案的图案数据，以及第二数据缓冲器12，存储对应于图案的一部分的至少一个变化的图案变化数据，其中， 通过使用图案变化数据，通过在衬底上的一个区域上曝光来转移图案的至少一个变化。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006165565A

公开(公告)日：2006-06-22

申请号：JP2005352089

申请日：2005-12-06

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： FRANKEN DOMINICUS JACOBUS PETR ,  BLEEKER ARNO JAN ,  BOX WILHELMUS J ,  HOEKS MARTINUS HENDRICUS HENDR ,  TEGENBOSCH HENRICUS G ,  TROOST KARS ZEGER ,  KESSELS LAMBERTUS G M ,  WILLEM DIETER WEENINK

IPC: H01L21/027 ,  G02B27/18 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To suppress to minimum an influence on an image forming performance due to heat generation by controlling the heat generation of array of an individually controllable component. SOLUTION: According to the present invention, in order to maintain the temperature of array, a control signal is inputted in an array when the array is not used for pattern-forming a projection beam. Also, in order to maintain the temperature of the array, a heat element is provided, a heat reservoir is provided, or a cooling element is provided for lowering the temperature of the array during its use. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：通过控制独立可控部件的阵列的发热来抑制由于发热而对成像性能的影响的最小化。 解决方案：根据本发明，为了保持阵列的温度，当阵列不用于图案形成投影光束时，控制信号被输入阵列。 此外，为了保持阵列的温度，设置有热元件，设置有储热器，或者设置冷却元件以降低其使用期间的阵列的温度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006060214A

公开(公告)日：2006-03-02

申请号：JP2005235188

申请日：2005-08-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DEN BOEF ARIE JEFFREY ,  BLEEKER ARNO JAN ,  VAN DOMMELEN YOURI JOHANNES LA ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  LUEHRMANN PAUL FRANK ,  PELLEMANS HENRICUS PETRUS MARI ,  VAN DER SOHAAR MAURITS ,  GROUWSTRA CEDRIC DESIRE ,  VAN KRAAIJ MARKUS GERARDUS MAR

IPC: H01L21/027 ,  G01N21/956 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method of measuring overlay and trellis-shape parameter using lithography technology and angle-resolved spectrum measurement in a pupil plane of a high numerical aperture of lens during a manufacture of a device. SOLUTION: Apparatus and the method which determine a property of a substrate by measuring an angle-resolved spectrum as a result of radiation being reflected by the substrate in the pupil plane of a high numerical aperture of lens. The property is dependent on angle and wavelength, and includes the intensity of TM- and TE-polarized light, and their relative phase difference. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种使用光刻技术测量覆盖层和网格形状参数的方法，以及在器件制造期间在高数值孔径的光瞳平面中的角度分辨光谱测量。 解决方案：通过测量作为辐射的结果的角度分辨的光谱来确定基板的性质的装置和方法，所述角度分辨光谱由透镜的高数值孔径的光瞳平面中的基板反射。 该属性取决于角度和波长，并且包括TM和TE偏振光的强度及其相对相位差。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2010272878A

公开(公告)日：2010-12-02

申请号：JP2010152489

申请日：2010-07-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BLEEKER ARNO JAN ,  BENSCHOP JOZEF PETRUS HENRICUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70041 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a programmable patterning means capable of reducing errors due to the movement of a substrate during the duration of the pulse of radiation.
SOLUTION: By supplying a means for shifting a patterned projection beam which is incident on a substrate in synchronism with the movement of the substrate during the duration of the pulse of the radiation, movement of the substrate inside is corrected during the duration of the pulse of one-time radiation.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有可编程图案形成装置的光刻设备，其能够在辐射脉冲的持续时间期间减少由于基板的移动引起的误差。 解决方案：通过在辐射脉冲的持续期间内提供用于移动入射到衬底上的图案化的投影光束与衬底的运动同步的装置，其中衬底内部的运动在 脉冲一次性辐射。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009296004A

公开(公告)日：2009-12-17

申请号：JP2009210018

申请日：2009-09-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

IPC: G02B26/08 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide a method for performing exposure in even radiation in a lithographic apparatus using a programmable array. SOLUTION: If a patterned beam of radiation which was patterned using an individually controllable elements is projected onto a target portion of a substrate, (a) each pixel ordinarily controls elements so as to deliver a radiation dose no greater than a predetermined normal maximum dose to the target portion in an exposure step, and (b) at least one selected pixel exceptionally controls the elements so as to deliver an increased radiation dose greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective pixel at a known position in the array on a pixel adjacent a selected pixel. Further, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在使用可编程阵列的光刻设备中以均匀辐射进行曝光的方法。 解决方案：如果使用独立可控元件图案化的图案化的辐射束投影到基板的目标部分上，（a）每个像素通常控制元件以便传送不大于预定的正常值的辐射剂量 在曝光步骤中对目标部分的最大剂量，和（b）至少一个所选择的像素异常地控制元件，以便递送大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与选定像素相邻的像素上的已知位置处的有缺陷像素的影响。 此外，其可以补偿由于该位置暴露于受已知缺陷元件影响的像素而导致的所选像素的位置处的目标部分的曝光不足。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009290220A

公开(公告)日：2009-12-10

申请号：JP2009156545

申请日：2009-07-01

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： BLEEKER ARNO JAN ,  BASELMANS JOHANNES JACOBUS MAT ,  DIERICHS MARCEL MATHIJS T M ,  WAGNER CHRISTIANE ,  RYZHIKOV LEV ,  STANISLAV SMIRNOV Y ,  TROOST KARS ZEGER

IPC: H01L21/027 ,  G02B17/08 ,  G03F7/20

CPC classification number: G03F7/702 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for directing a radiation beam to illuminate a patterning array in a direction other than a vertical direction of individually controllable elements used for patterning the radiation beam. SOLUTION: In a method of manufacturing a device, the individually controllable elements can change the telecentricity of a radiation beam PB. Projection of the radiation beam PB onto the individually controllable elements can be performed by using a concave mirror 21 or a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于引导辐射束以除了用于图案化辐射束的单独可控元件的垂直方向以外的方向照射图案化阵列的系统和方法。 解决方案：在制造装置的方法中，独立可控元件可以改变辐射束PB的远心性。 可以通过使用放置在单独可控元件的物场中的凹面镜21或折叠镜来实现辐射束PB到单独可控元件上的投影。 或者，独立可控元件可以改变辐射束的光轴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006261667A

公开(公告)日：2006-09-28

申请号：JP2006067063

申请日：2006-03-13

Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  Lsi Logic Corp ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ ,  エルエスアイ ロジック コーポレイション

Inventor： TROOST KARS Z ,  BASELMANS JOHANNES JACOBUS MAT ,  BLEEKER ARNO JAN ,  MARKOYA LOUIS J ,  CALLAN NEAL ,  EIB NICHOLAS K

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system which can change a pattern more quickly and at less cost compared with a mask base system.
SOLUTION: Wide range contrast can be attained in such a way that an inclination and location of individually controllable element are adjusted simultaneously. This can be used to compensate a cupping of the individually controllable element. Simultaneous adjustment of location and inclination of the individually controllable element can be attained by two electrodes capable of operating over a range of values.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种与掩模基础系统相比可以更快更便利地改变图案的系统。

解决方案：可以以同时调节独立可控元件的倾斜度和位置的方式获得宽范围的对比度。 这可以用于补偿单独可控元件的拔罐。 可以通过能够在一定范围内操作的两个电极来实现单独可控元件的位置和倾斜的同时调节。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005236291A

公开(公告)日：2005-09-02

申请号：JP2005039950

申请日：2005-02-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： GUI CHENG-QUN ,  BLEEKER ARNO JAN ,  HERMAN DE JAGER PIETER W ,  SYTSMA JOOST

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a device manufacturing method.
SOLUTION: A radiation distribution system is provided for distributing radiation to a plurality of patterning means for patterning radiation beams from a lighting system. The patterned radiation beams are successively projected to a substrate.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：提供辐射分配系统，用于将辐射分配到多个图案化装置，用于对来自照明系统的辐射束进行图案化。 图案化的辐射束被连续地投射到衬底上。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004172621A

公开(公告)日：2004-06-17

申请号：JP2003386748

申请日：2003-11-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BLEEKER ARNO JAN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector where a space between a substrate and a projector system is filled with liquid and a basic frame is effectively separated from jamming caused by the movement of a substrate stage, and a device manufacturing method.
SOLUTION: In a liquid immersion lithography equipment, a transparent plate 12 is formed between a substrate table and a projection lens PL, thereby preventing the flow of liquid 10 and 11 that applies a force to the projection lens PL to distort the basic frame. The transparent plate 12 is maintained in a standstill status against the basic frame by an actuator system that responds to a position sensor furnished on the basic frame. The transparent plate 12 has the same refractive index as that of the liquid.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2010002915A

公开(公告)日：2010-01-07

申请号：JP2009181380

申请日：2009-08-04

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  Lsi Corp ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ. ,  エルエスアイ コーポレーション

Inventor： TROOST KARS Z ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  MARKOYA LOUIS J ,  CALLAN NEAL ,  EIB NICHOLAS K

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70358

Abstract: PROBLEM TO BE SOLVED: To provide a system that can more quickly change a pattern at a lower cost, as compared with a mask base system.
SOLUTION: The tilt and position of individually controllable element becomes simultaneously adjustable and allows a wider range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and the tilt of the individually controllable elements can be attained by two electrodes which are operable over a range of values.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：与掩模基础系统相比，提供能够以更低的成本更快速地改变图案的系统。 解决方案：独立可控元件的倾斜和位置可同时调节，可实现更宽范围的对比度。 这也可以用于补偿单独可控元件的拔罐。 可以通过两个可在一定数值范围内操作的电极来实现单独可控元件的位置和倾斜的同时调节。 版权所有（C）2010，JPO＆INPIT