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    Lithography equipment and method of manufacturing device
    2.
    发明专利
    Lithography equipment and method of manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE

    公开(公告)号：JP2007005795A

    公开(公告)日：2007-01-11

    申请号：JP2006168236

    申请日：2006-06-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的 用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。 解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。 通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    8.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012182498A

    公开(公告)日：2012-09-20

    申请号：JP2012135571

    申请日：2012-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT

    Method for bonding pellicle to patterning device and patterning device comprising pellicle
    10.
    发明专利
    Method for bonding pellicle to patterning device and patterning device comprising pellicle 有权
    将胶囊连接到图案装置的方法和包含细丝的图案装置

    公开(公告)号：JP2006146234A

    公开(公告)日：2006-06-08

    申请号：JP2005336589

    申请日：2005-11-22

    Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ

    Inventor： BRULS RICHARD J ,  UITTERDIJK TAMMO ,  BOOM HERMAN ,  LAGANZA JOSEPH L

    IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F1/64 ,  Y10T156/10

    Abstract: PROBLEM TO BE SOLVED: To provide a patterning device for use with a lithographic apparatus and to provide a pellicle to be used therefor. SOLUTION: A method is provided to reduce differences between the way in which reticle holding forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle holding forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured 12 for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding 16 the pellicle and the reticle are held 17 in the same way and in the same orientation as during control of the pellicle and use of the reticle in a lithographic apparatus. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于光刻设备的图案形成装置，并提供用于其的防护薄膜组件。 解决方案：提供了一种减少掩模版保持力和重力在使用和组装防护薄膜组件期间作用在掩模版上的方式之间的差异，并将其与防护薄膜保护力和重力的类似减少相结合 在粘合到掩模版和防护薄膜组件的质量控制期间作用在防护薄膜组件上的力。 在防护薄膜组件的使用过程中，防护薄膜组件的形状被测量为相对于重力的相同取向的防护薄膜组件的控制，并且在粘合16期间，防护薄膜组件和掩模版以相同的方式和相同的取向保持17 如在防护薄膜的控制期间以及在光刻设备中使用掩模版。 版权所有（C）2006，JPO＆NCIPI

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