公开(公告)号：JP2010141342A

公开(公告)日：2010-06-24

申请号：JP2010003632

申请日：2010-01-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOX WILHELMUS JOSEPHUS

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus in which heat adjustment on a wafer is improved. SOLUTION: The lithography device comprises a lighting system which supplies projection beams, a structure for supporting a pattern forming unit which is so constituted that the pattern forming device gives the section of a beam a pattern, a substrate table which retains a substrate, a projection system which projects a patterned beam to a target portion on the substrate, and an adjustment system which adjusts the substrate. The adjusting system adjusts a non-target portion on the substrate using an adjustment fluid. A device manufacturing method includes a step of adjusting the non-target portion on the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高了晶片上的热调节的光刻设备。 解决方案：光刻设备包括提供投影光束的照明系统，用于支撑图案形成单元的结构，该图案形成单元被构造成使得图案形成装置给予光束图案的部分，保持基板的基板台 ，将图案化的光束投影到基板上的目标部分的投影系统以及调整基板的调整系统。 调节系统使用调节流体调节基板上的非目标部分。 一种器件制造方法包括调整衬底上的非目标部分的步骤。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006049909A

公开(公告)日：2006-02-16

申请号：JP2005224791

申请日：2005-08-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOX WILHELMUS JOSEPHUS

IPC: H01L21/027

CPC classification number: G03F7/708

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projecting system for further reducing or solving thermal effects on the image forming quality of an optical element of a radiation and/or projecting system.
SOLUTION: The lithographic apparatus, having a lighting system, constituted so as to adjust a radiation beam and a support body constituted so as to support a patterning device, wherein the patterning device forms a pattern on the sectional face of the radiation beam to form a pattern-formed beam, and also having a substrate table constituted so as to hold a substrate and a projecting system, constituted so as to project the pattern-formed radiation beam on a target part of the substrate, and having a heating element arranged fixedly to at least one of the constituent elements of the apparatus that experiences thermal load, when it is used to maintain constituent elements at an almost fixed temperature. By this method, the constituent elements are prevented from being heated and cooled. Further, since thermal gradients of the constituent elements are lowered, optical distortions that are experienced are decreased.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影系统，用于进一步减少或解决对辐射和/或投影系统的光学元件的成像质量的热影响。 解决方案：具有照明系统的光刻设备被构造成调节辐射束和支撑体，其构成为支撑图案形成装置，其中，图案形成装置在辐射束的截面上形成图案 以形成图案形成的光束，并且还具有构造成保持基板和突出系统的基板台，所述基板和突出系统构成为将图案形成的辐射束投影到基板的目标部分上，并具有加热元件 当其用于将构成元件保持在几乎固定的温度时，固定地布置成经受热负荷的装置的组成元件中的至少一个。 通过这种方法，防止了组成元件被加热和冷却。 此外，由于构成元件的热梯度降低，所以经历的光学失真减小。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009158971A

公开(公告)日：2009-07-16

申请号：JP2009090699

申请日：2009-04-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BAKKER LEVINUS PIETER ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN ,  SCHUURMANS FRANK JEROEN PIETER ,  VAN DER WERF JAN EVERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithography device, and a device manufactured by the method. SOLUTION: The device manufacturing method is disclosed wherein a substrate W is provided, a projection beam of radiation PB is provided using an illumination system IL, a patterning means MA is used to impart the projection beam PB with a pattern in its cross section, the patterned beam of radiation PB is projected subsequently to a number of outer target portions CO of the substrate W before the patterned beam is projected to inner target portion CI of the substrate W, wherein each subsequent outer target portion COi+1 is spaced-apart from the outer target portion COi preceding that subsequent outer target portion COi+1. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种器件制造方法，光刻设备以及通过该方法制造的器件。 解决方案：公开了一种器件制造方法，其中设置有衬底W，使用照明系统IL提供辐射PB的投射束，使用图案形成装置MA来使投影光束PB在其十字形中具有图案 在将图案化的光束投影到基板W的内部目标部分CI之前，将图案化的光束束PB随后投射到基板W的多个外部目标部分CO，其中每个随后的外部目标部分COi + 1间隔开 从该后续外部目标部分COi + 1之前的外部目标部分COi释放。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007184576A

公开(公告)日：2007-07-19

申请号：JP2006337301

申请日：2006-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005203754A

公开(公告)日：2005-07-28

申请号：JP2004353616

申请日：2004-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  BARTRAY PERTRUS R ,  BOX WILHELMUS JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MARIA VAN DER WIJST MARC W

IPC: G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method that improves thermal loading.
SOLUTION: The lithography apparatus, which has an illumination system IL, a support structure MT supporting a patterning means M, a substrate table WT holding a substrate W, a projecting system PL that projects a patterned beam onto a target part of the substrate W, and a reference frame MF wherein at least one of position sensors IF at least for either one of the patterning means M and the substrate W, and the projection system PL are located, has a heat transport system HT-PL/HT-MF that thermally interacts with at least either one of the projection system PL and the reference frame MF, and transports heat at least to or from either one of the projection system PL and the reference frame MF. The heat transport system HT-PL/HT-MF is joined to another frame mechanically separated from the reference frame.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种提高热负荷的光刻设备和设备制造方法。 解决方案：具有照明系统IL的光刻设备，支持图案形成装置M的支撑结构MT，保持衬底W的衬底台WT，将图案化的光束投射到目标部分上的投影系统PL 基板W和参考框架MF，其中位于图案形成装置M和基板W中的任一个的位置传感器IF和投影系统PL中的至少一个具有热传输系统HT-PL / HT- MF与投影系统PL和参考框架MF中的至少一个热相互作用，并且至少传送至投影系统PL和参考框架MF中的任一个。 热传输系统HT-PL / HT-MF连接到与参考框架机械分离的另一个框架。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009272649A

公开(公告)日：2009-11-19

申请号：JP2009188270

申请日：2009-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOX WILHELMUS JOSEPHUS

IPC: H01L21/027

CPC classification number: G03F7/708

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection system in which thermal effects of optical elements in the radiation and/or projection systems on imaging quality are further reduced or eliminated. SOLUTION: The invention relates to a lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein at least one component in the apparatus that in use experiences a heat load is provided with an integrally mounted heating element arranged to maintain the component at a substantially constant temperature. In this way, heating and cooling effects on the component are avoided. Further, due to the component being subject to reduced thermal gradients, less optical distortions are experienced. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影系统，其中进一步降低或消除了辐射和/或投影系统中的光学元件对成像质量的热效应。 解决方案：本发明涉及一种光刻设备，包括：照明系统，其配置成调节辐射束; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中在使用中经历热负载的装置中的至少一个部件设置有整体安装的加热元件，其被布置成将所述部件保持在基本上 恒温。 以这种方式，避免了对部件的加热和冷却作用。 此外，由于该部件经受降低的热梯度，因此经历较少的光学失真。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007194590A

公开(公告)日：2007-08-02

申请号：JP2006308494

申请日：2006-11-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOX WILHELMUS JOSEPHUS ,  KLUNDER DERK JAN WILFRED ,  VAN HERPEN MAARTEN MARINUS JOH ,  DRIESSEN NIELS MACHIEL ,  SCHIMMEL HENDRIKUS G

IPC: H01L21/027 ,  G01J5/12 ,  G01K1/14 ,  G01K7/02 ,  G21K1/00 ,  G21K5/02

CPC classification number: G03F7/70916 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system which can keep a temperature of a foil trap in a tolerance by watching the temperature of foil trap that functions as a contamination barrier to shut up a contaminant from a radiation source.
SOLUTION: The radiation system 1 which generates a beam of radiation includes an extreme ultraviolet radiation source to produce extreme ultraviolet rays 3, a foil trap 4 to shut up a contaminant from the radiation source 2, a metal plate 7 which operates as a heat sink to collect the heat of radiation from the foil trap 4, and a thermocouple sensor 9 to detect a temperature of the metal plate 7.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射系统，其可以通过观察作为污染屏障的箔捕获器的温度来封闭来自辐射源的污染物，从而将箔陷阱的温度保持在公差范围内。 解决方案：产生辐射束的辐射系统1包括极紫外线辐射源以产生极紫外线3，用于封闭来自辐射源2的污染物的箔捕获器4，金属板7，其操作为 用于收集来自箔捕获器4的辐射热的散热器，以及用于检测金属板7的温度的热电偶传感器9.版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005322907A

公开(公告)日：2005-11-17

申请号：JP2005130916

申请日：2005-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOX WILHELMUS JOSEPHUS ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VERHAGEN THOMAS HENRICUS JACOB

IPC: G03F7/20 ,  G03B27/52 ,  H01L21/027

CPC classification number: G03F7/70833 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To improve the thermal stability of a projection lens forming a part of a stable chaining, a lens supporter, and a reference frame, in order to enhance image-formation accuracy, in a lithographic projection apparatus where a projection lens is located on the reference frame, using the lens supporter.
SOLUTION: A heat-adjusting system, which heat-adjusts the projection lens supporter LS supporting the projection lens PL, is located on the reference frame MF. In a direct heat-adjusting system, there is provided a heat-adjusting channel, passing a heat-adjusting fluid through inside the lens supporter; and in an indirect heat-adjusting system, the heat-adjusting channel is located on a heat-adjusting plate 4 fitted on the lens supporter, and these systems cools or heats the lens supporter by means of the heat-adjusting fluid. The channel is preferably a closed channel for not leaking the heat-adjusting fluid to the outside. The heat-adjusting system may be a gas heat-adjusting system.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题为了提高形成稳定链接，透镜支架和参考框架的一部分的投影透镜的热稳定性，为了提高图像形成精度，在光刻投影设备中，其中 投影镜头位于参考框架上，使用透镜支架。 解决方案：对支撑投影透镜PL的投影透镜支架LS进行热调节的热调节系统位于参考框架MF上。 在直接调温系统中，设置有热调节通道，将调节流体通过透镜支架内; 并且在间接调温系统中，热调整通道位于安装在透镜支架上的调热板4上，这些系统借助于调节流体来冷却或加热透镜支架。 通道优选是用于不将调节流体泄漏到外部的闭合通道。 热调节系统可以是气体热调节系统。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011146737A

公开(公告)日：2011-07-28

申请号：JP2011064408

申请日：2011-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEIJAART PETER PAUL ,  BOX WILHELMUS JOSEPHUS ,  EUSSEN EMIEL JOZEF MELANIE ,  LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  CATHARINA MARIA BEERENS RUUD ANTONIUS ,  SMITS ALBERTUS ADRIANUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To increase positional accuracy for an encoder-type sensor system in a lithographic apparatus.
SOLUTION: The lithographic apparatus that includes the encoder-type sensor system configured to measure the position of a substrate table of the lithographic apparatus relative to a reference structure is disclosed. The encoder-type sensor system includes an encoder sensor head and an encoder sensor target, and the lithographic apparatus includes a recess to accommodate the encoder sensor target.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提高光刻设备中的编码器型传感器系统的位置精度。 公开了包括编码器型传感器系统的光刻设备，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007013140A

公开(公告)日：2007-01-18

申请号：JP2006166261

申请日：2006-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  BARTRAY PETRUS R ,  BOX WILHELMUS JOSEPHUS ,  STAVENGA MARCO KOERT ,  HARINK THIJS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/7075 ,  G03F7/70791

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for reducing risk of contamination caused by the problems that a clean air supplied for keeping an in-device environment clean is not efficiently running through the entire substrate, and that movement of tables, etc. in a tight space acts as a pump to attract the contaminated air, when a lithographic device has a substrate of large size. SOLUTION: A loading table LT and an unloading table UT of a substrate handler for loading/unloading the substrate W from a substrate table WT is provided with a clean gas feed unit FU, which supplies a clean gas G to both of an exposed substrate EW and an unexposed substrate UW. Since the clean gas feed unit FU is movably attached, the clean gas G can be supplied in every steps in processes. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低由于为了保持设备内环境清洁而供应的清洁空气不能有效地穿过整个基板的问题而降低污染风险的系统和方法， 当平版印刷装置具有大尺寸的基片时，紧密空间中的桌子等用作吸引污染空气的泵。 解决方案：用于从衬底台WT装载/卸载衬底W的衬底处理器的装载台LT和卸载台UT设置有清洁气体供给单元FU，其将清洁气体G供应到 暴露的基底EW和未曝光的底物UW。 由于清洁气体供给单元FU可移动地附接，因此可以在每个步骤中提供清洁气体G。 版权所有（C）2007，JPO＆INPIT