公开(公告)号：JP2012138631A

公开(公告)日：2012-07-19

申请号：JP2012088182

申请日：2012-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets on a last optical element or substantially to avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. A humid gas space is defined between the projection system, the liquid confinement structure and the immersion liquid in the immersion space, the humid gas space being configured to confine humid gas.

Abstract translation: 要解决的问题：提供一种降低液滴对最后一个光学元件的影响或基本上避免这种液滴形成的系统。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在投影系统，液体限制结构和浸没空间中的浸没液体之间限定湿气空间，湿气空间被配置为限制湿气。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2008288619A

公开(公告)日：2008-11-27

申请号：JP2008219416

申请日：2008-08-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2014017526A

公开(公告)日：2014-01-30

申请号：JP2013222157

申请日：2013-10-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOB STREEFKERK ,  JOHANNES JACOBS MATEUS BASELMANS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: An immersion lithographic projection apparatus in which immersion liquid is sealed between a final element of a projection system and a substrate is disclosed. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了一种浸没式光刻投影装置，其中浸入液体密封在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2010183113A

公开(公告)日：2010-08-19

申请号：JP2010116482

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 解决方案：浸没式光刻投影装置被公开，其中浸没液被密封在投影系统的最终元件和基底之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入液体中之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008182270A

公开(公告)日：2008-08-07

申请号：JP2008107079

申请日：2008-04-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  BAGGEN MARCEL KOENRAAD MARIE ,  BRULS RICHARD JOSEPH ,  VAN DIJCK HENDRIKUS ALPHONSUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  JANSEN ALBERT JOHANNES MARIA ,  LUIJTEN CARLO CORNELIS MARIA ,  PONGERS WILLEM RICHARD ,  WEHRENS MARTIJN GERARD DOMINIQ ,  UITTERDIJK TAMMO ,  CICILIA ORLANDO SERAPIO ,  BOOM HERMAN ,  DEMARTEAU MARCEL JOHANNES LOUI

IPC: H01L21/027 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/20

CPC classification number: G03F7/70258 ,  G03F1/62 ,  G03F1/64 ,  G03F1/82 ,  G03F7/70308 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus and a device manufacturing method, capable of compensating for or improving the effect of a thick pellicle. SOLUTION: The thick pellicle is used to calculate corrections to be applied in exposure so that the thick pellicle is allowed to have a non-flat shape, and the shape compensates for the optical effect of the pellicle. In order for the pellicle to more readily compensate for, to be mounted, in such a manner as to employ a one-dimensional shape under the influence of gravity. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够补偿或改善厚薄膜的效果的光刻投影装置和装置制造方法。

解决方案：使用厚的防护薄膜来计算曝光中应用的校正值，使得薄膜组件具有非平坦的形状，并且该形状补偿防护薄膜的光学效果。 为了使防护薄膜组件更容易地在重力的影响下以使其成为一维形状的方式进行补偿。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006179937A

公开(公告)日：2006-07-06

申请号：JP2005381198

申请日：2005-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE KRUIF ROBERTUS CORNELIS MAR ,  BRULS RICHARD JOSEPH ,  TEEUWSEN JOHANNES WILHELMUS MA ,  BUURMAN ERIK P

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To provide a controller for improving iso-dense bias of lithographic equipment. SOLUTION: The lithographic equipment comprises a lighting system for supplying a projection beam of radiation, a projection system for projecting a patterned beam on a target position of a substrate, a substrate table for holding the substrate, and a controller for adjusting the spectrum distribution of radiation intensity of the projection beam. The adjustment of the spectrum intensity distribution is based on the data 150 associated with iso-dense bias, and the spectrum intensity distribution is adjusted by widening the spectrum band width or by changing the shape 153 of the spectrum intensity distribution. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于改善光刻设备的等密度偏差的控制器。 解决方案：光刻设备包括用于提供投影射线束的照明系统，用于将图案化的光束投影到基板的目标位置的投影系统，用于保持基板的基板台，以及用于调整 投影光束辐射强度的光谱分布。 频谱强度分布的调整基于与等密度偏差相关联的数据150，并且通过扩大频谱带宽或通过改变频谱强度分布的形状153来调整频谱强度分布。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011216904A

公开(公告)日：2011-10-27

申请号：JP2011152771

申请日：2011-07-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is enclosed between a final element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use can help to prevent the formation of bubbles in the immersion liquid and to reduce a residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了浸没式光刻投影装置，其中浸没液被包围在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层。 该用途可以有助于防止在浸没液中形成气泡并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2010074159A

公开(公告)日：2010-04-02

申请号：JP2009208753

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004207738A

公开(公告)日：2004-07-22

申请号：JP2003425260

申请日：2003-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JANSEN ALBERT JOHANNES MARIA ,  BAGGEN MARCEL KOENRAAD MARIE ,  JASPER JOHANNES CHRISTIAAN MAR ,  SCHRIJVER RAYMOND LAURENTIUS J ,  BRULS RICHARD JOSEPH ,  BASELMANS JOHANNES JACOBUS MAT ,  PONGERS WILLEM RICHARD ,  UITTERDIJK TAMMO

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70308 ,  G03F7/70716 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector which reduces the number of man-hours required to exchange a reticle with a pellicle, with a reticle without a pellicle. SOLUTION: In the present projection system, the pattern surface on the reticle is lightened so that a projected image that focuses on an image-forming surface can be obtained. If a pellicle exists in an optical path, a substantial shift occurs in the position of the pattern surface of the reticle. It is necessary to adapt the image-forming surface of the projected image for a proper focus depending on the presence or absence of the pellicle. A corrector moves the position of the pattern surface, thereby the substantial shift of the pattern surface due to the pellicle is removed. COPYRIGHT: (C)2004,JPO&NCIPI