公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005197698A

公开(公告)日：2005-07-21

申请号：JP2004375765

申请日：2004-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOOGAARTS MARTINUS GODEFRIDUS ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  CUIJPERS MARTINUS AGNES WILLEM ,  KUIT JAN JAAP

IPC: G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G01N21/8851 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, which minimizes an effect of gas vibrations or gas pressure changes around an exposure system, which are caused by the actuation of a movable part of the exposure system or of another system in a housing, on the position of a board. SOLUTION: The lithographic projection apparatus includes a position disturbance correcting system, which offsets a disturbance of the position of a board holder 19 holding the board 13. In the apparatus, a space 3 including the exposure system is separated by a holed wall 5 and is separated from a space 4 including another system by a movable wall 10. The space 3, therefore, damps or cuts off the vibrations or pressure changes of the gas. The vibrations of the gas may be offset by a speaker 61. This lithograph apparatus can be employed to provide a novel device manufacturing method. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻投影装置，其使由曝光系统的可移动部分或另一系统的可动部分的致动引起的气体振动或暴露系统周围的气体压力变化的影响最小化 一个房屋，在一个董事会的职位。 解决方案：光刻投影设备包括位置干扰校正系统，其抵消了保持板13的板保持器19的位置的干扰。在该装置中，包括曝光系统的空间3由孔壁分隔开 并且通过可移动壁10与包括另一系统的空间4分离。因此，空间3阻止或切断气体的振动或压力变化。 气体的振动可以被扬声器61抵消。该光刻设备可用于提供新型的器件制造方法。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012092974A

公开(公告)日：2012-05-17

申请号：JP2011231029

申请日：2011-10-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  CUIJPERS MARTINUS AGNES WILLEM ,  RIEDSTRA BART FRISO ,  GIJZEN RONALD CORNELIS GERARDUS ,  BRUIN MAIKEL CORNELIS ANDREAS

IPC: F16F1/18 ,  F16F1/26 ,  G03F7/20 ,  H01L21/027

CPC classification number: F16F1/10 ,  F16F1/027 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide a leaf spring having a relatively high stiffness in two orthogonal directions and a relatively low stiffness in other degrees of freedom.SOLUTION: A leaf spring is mounted between two objects, wherein the leaf spring is configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at or near the center of the panel-shaped body to mount the leaf spring to a first of the two objects, wherein the leaf spring includes one or more second mounting locations at or near the circumference of the panel-shaped body to mount the leaf spring to the second of the two objects, and elongate grooves and/or slits in the panel shaped body between the first mounting location and the second mounting location, the grooves and/or slits running in at least two non-orthogonal directions in the plane of the two orthogonal directions.

Abstract translation: 要解决的问题：提供在两个正交方向上具有相对高的刚度并且在其他自由度上具有相对低刚度的板簧。 解决方案：板簧安装在两个物体之间，其中板簧构造成在两个正交方向上具有高刚度，而在其他自由度中具有相对较低的刚度，其中， 所述板簧包括位于所述板状体的中心处或附近的第一安装位置，以将所述板簧安装到所述两个物体中的第一个，其中所述板簧包括位于或接近所述板状体的第一安装位置 板状体的圆周将板簧安装到两个物体中的第二个物体上，以及在第一安装位置和第二安装位置之间的板状体中的细长槽和/或狭缝，槽和/或狭缝运行 在两个正交方向的平面中的至少两个非正交方向上。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2007134729A

公开(公告)日：2007-05-31

申请号：JP2006309413

申请日：2006-11-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CUIJPERS MARTINUS AGNES WILLEM ,  AUER FRANK ,  VAN BALLEGOIJ ROBERTUS NICODEM

IPC: H01L21/027 ,  F16C32/06 ,  G03F7/20 ,  G03F9/00 ,  H01L21/68

CPC classification number: F16F15/0275 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To remove the adverse influence to be exerted upon positioning accuracy of a wafer or a mask. SOLUTION: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：消除对晶片或掩模的定位精度施加的不利影响。 解决方案：用于光刻投影装置的支撑组件包括可移动构件，该可移动构件被轴颈安装在壳体中，使得基本上没有振动力在可移动构件和壳体之间传递。 组件包括气体填充的压力室，压力室中的气体作用在可移动构件上，以便至少部分地抵消由于可移动构件和其携带的任何其它物体的重量而产生的力。 压力室被供应气体，并且整个组件被构造和布置成使得当可移动构件基本上静止时，基本上没有气体流过压力室。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004214653A

公开(公告)日：2004-07-29

申请号：JP2003422401

申请日：2003-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN BALLEGOIJ ROBERTUS NICODEM ,  CUIJPERS MARTINUS AGNES WILLEM ,  MEIJERS PIETER J G ,  VAN NUNEN GERARDUS P M ,  OTTENS JOOST JEROEN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a substrate holder which can clamp a concave substrate more securely. SOLUTION: A substrate holder 10 has burls 12 having a height of 100 μm or less and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thus, a concave wafer W' can be securely clamped by generating an initial vacuum in the central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen so that the wafer is fully clamped. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2012073250A

公开(公告)日：2012-04-12

申请号：JP2011205457

申请日：2011-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNING PAULUS JOHANNES ,  CUIJPERS MARTINUS AGNES WILLEM ,  CHRISTIAN ALEXANDER HOOGENDAM ,  LEVACIA LEON MARTIN ,  ROLAND BLOCK ,  SMEETS MARTIN FRANCE PIERRE

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a method which calibrates a target surface of a position measurement system configured to measure a position of a movable object.SOLUTION: The position measurement system includes the target surface mounted on the movable object, a stationary sensor system, and a processing device to calculate a position of the movable object on the basis of at least one measurement signal of the sensor system. The processing device includes a correction map of the target surface to correct the irregularities of the target surface. The method includes recalibrating the correction map of the target surface by measuring the target surface and determining a recalibrated correction map of the complete target surface on the basis of the measured target surface and one or more deformation modes of the target surface and/or physical objects affecting the target surface.

Abstract translation: 要解决的问题：提供一种校准被配置为测量可移动物体的位置的位置测量系统的目标表面的方法。 解决方案：位置测量系统包括安装在可移动物体上的目标表面，固定传感器系统和处理装置，用于基于传感器系统的至少一个测量信号来计算可移动物体的位置。 处理装置包括目标表面的校正图，以校正目标表面的不规则。 该方法包括通过测量目标表面来重新校准目标表面的校正图，并且基于测量的目标表面和目标表面和/或物理对象的一个​​或多个变形模式来确定完整目标表面的重新校准的校正图 影响目标表面。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010147506A

公开(公告)日：2010-07-01

申请号：JP2010059515

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G02B21/00 ,  G02B21/26 ,  G02B21/30

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus to which countermeasures are applied for suppressing influence of pressure variation of a conditioning fluid on a substrate table. SOLUTION: This lithographic apparatus is disclosed that projects a pattern from a patterning device onto a substrate. The lithographic apparatus includes a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and suppresses a pressure variation in the conditioning system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中应用了对策来抑制调理流体对基片台的压力变化的影响。 解决方案：公开了将图案形成装置的图案投影到基板上的该光刻设备。 光刻设备包括被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括与调节系统流体连通并抑制调节系统中的压力变化的压力调节器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009260339A

公开(公告)日：2009-11-05

申请号：JP2009092537

申请日：2009-04-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  CUIJPERS MARTINUS AGNES WILLEM ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  DE JONGH ROBERTUS JOHANNES MAR ,  RENKENS MICHAEL JOZEF MATHIJS ,  VAN DER WIJST MARC WILHELMUS M ,  WIJCKMANS MAURICE WILLEM JOZEF ,  TOUSAIN ROBERTUS LEONARDUS ,  FAASSEN RONALD PETRUS HENDRICU ,  KOEVOETS ADRIANUS HENDRIK

IPC: H01L21/68 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/709 ,  G03F7/70758 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a positioning system in which vibrations caused by a torque transferred from a balance mass to a base plate are minimized. SOLUTION: The positioning system to position a table within a base frame of a lithographic apparatus includes a first actuator for exerting an actuation force on the table, and being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, and the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种定位系统，其中由从平衡块传递到基板的扭矩引起的振动最小化。 解决方案：用于将工作台定位在光刻设备的基架内的定位系统包括用于在工作台上施加致动力的第一致动器，并且连接到构造和布置成吸收反应力的第一平衡块 第一致动器和定位系统包括控制器和第二致动器，其构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在第一平衡块上的致动力引起的扭矩。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007129212A

公开(公告)日：2007-05-24

申请号：JP2006276276

申请日：2006-10-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CORNELISSEN SEBASTIAAN MARIA J ,  CUIJPERS MARTINUS AGNES WILLEM ,  OTTENS CORNELIS CHRISTIAAN ,  SMITS PETER ,  VAN DE WAL JOHANNES ANTONIUS M

IPC: H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To prevent a center of a sensor from moving relative to a substrate table, even if the substrate table thermally expands and contracts. SOLUTION: A circular sensor is mounted to a substrate table WT equipped with three leaf springs that are spaced evenly around a thermal axis of the sensor. The leaf springs are provided in two parts that are mutually attachable and detachable. Although the leaf springs are elastic and allow some movements of the sensor, relative to the substrate table WT on thermal expansion and contraction, the center of the sensor will not move relative to the substrate table. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了防止传感器的中心相对于基板台移动，即使基板台热膨胀和收缩。 解决方案：将圆形传感器安装到衬底台WT上，该基板台WT配备有围绕传感器的热轴均匀间隔的三个板簧。 板簧设置在相互相连和可拆卸的两部分中。 虽然板簧是弹性的并且允许传感器相对于基板台WT在热膨胀和收缩时的某些运动，但传感器的中心将不会相对于基板移动。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005286321A

公开(公告)日：2005-10-13

申请号：JP2005058324

申请日：2005-03-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CUIJPERS MARTINUS AGNES WILLEM

IPC: G03F7/20 ,  G03B27/58 ,  H01L21/027 ,  H02K41/03

CPC classification number: H02K41/031 ,  G03F7/70758 ,  H02K7/08 ,  H02K7/09 ,  H02K2201/18

Abstract: PROBLEM TO BE SOLVED: To provide an improved movable object carrier without additional supports.
SOLUTION: The movable object carrier can be moved in a first direction and in a second direction to be positioned in a plane. The object carrier can be moved in the first direction by first and second linear actuators. The first and second linear actuators are adapted to support the object carrier. The linear actuators can include any additional support and are positioned relative to the object carrier so that no other bearing is required to prevent the object carrier from toppling over or tilting. The object carrier can be moved in the second direction by third and fourth linear actuators. The third and fourth linear actuators can be adapted to support the first and second linear actuators.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种改进的可移动物体载体而无需额外的支撑。 解决方案：可移动物体载体可沿第一方向和第二方向移动以定位在平面中。 物体载体可以通过第一和第二线性致动器在第一方向上移动。 第一和第二线性致动器适于支撑物体载体。 线性致动器可以包括任何额外的支撑件并且相对于物体承载件定位，使得不需要其它轴承来防止物体承载件倒塌或倾斜。 物体载体可以通过第三和第四线性致动器在第二方向上移动。 第三和第四线性致动器可以适于支撑第一和第二线性致动器。 版权所有（C）2006，JPO＆NCIPI