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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009110016A

    公开(公告)日：2009-05-21

    申请号：JP2008315593

    申请日：2008-12-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  KLINKHAMER JACOB FREDRIK FRISO ,  HOEBERICHTS EDUARD

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70475 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for exposing a substrate. SOLUTION: An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements and projects the beams through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. A projection system is positioned so that each beam is scanned along a respective track. The tracks overlap so that each track comprises a first portion that is scanned by one beam and a second portion that overlaps the adjacent track and is scanned by two beams. Because a maximum intensity of a part of each beam directed towards the first portion of the track is greater than a maximum intensity of a part of that beam directed towards the second portion of the track, the first and second portions are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于使基板曝光的光刻设备和方法。 解决方案：照明系统提供一系列由单独可控元件的阵列构图的辐射束，并将光束穿过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将光束的相应部分引向基板。 位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。 定位投影系统，使得每个光束沿着相应的轨道被扫描。 轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠并由两个波束扫描的第二部分。 因为指向轨道的第一部分的每个光束的一部分的最大强度大于朝向轨道的第二部分的该光束的一部分的最大强度，所以第一和第二部分暴露于基本上 相同的最大强度。 相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。 版权所有（C）2009，JPO＆INPIT

    Apparatus and method for optical position evaluation
    2.
    发明专利
    Apparatus and method for optical position evaluation 有权
    光学位置评估的装置和方法

    公开(公告)号：JP2009049423A

    公开(公告)日：2009-03-05

    申请号：JP2008253068

    申请日：2008-09-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  BIJNEN FRANSISCUS GODEFRIDUS C ,  JOHAN CHRISTIAAN GERARD HOEFNA ,  JOANNES THEODOOR DE SMIT

    IPC: G01B11/00 ,  H01L21/027 ,  G01B11/14 ,  G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70275 ,  G03F9/7088

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for optical position evaluation, having an illumination system for supplying a positioning beam of radiation to derive position data from reflection of the positioning beam, and also to provide its method. SOLUTION: A substrate is supported on a substrate table, and the positioning beam is projected to a target area of the substrate by means of a projection system. A positioning system causes relative motion between the substrate and the projection system. An array of lenses is arranged and structured so that respective lenses of the array focus individual parts of the positioning beam to individual parts of the target area. In an array of detectors, respective detectors in the array detect light reflected from the substrate through the individual lenses of the array, and provide outputs expressing the intensity of light reflected through the individual lens from the substrate. A processor is connected to an output of the detector to derive data exhibiting the position of the lens array for the substrate from the output of the detector. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光学位置评估的装置，具有用于提供定位射束的照明系统，以从定位光束的反射导出位置数据，并提供其方法。 解决方案：基板被支撑在基板台上，并且定位光束通过投影系统投射到基板的目标区域。 定位系统引起基板和投影系统之间的相对运动。 透镜阵列被布置和构造成使得阵列的各个透镜将定位光束的各个部分聚焦到目标区域的各个部分。 在一组检测器中，阵列中的各个检测器通过阵列的各个透镜检测从基板反射的光，并且提供表示通过单独透镜从基板反射的光的强度的输出。 处理器连接到检测器的输出，以从检测器的输出导出表现出用于衬底的透镜阵列的位置的数据。 版权所有（C）2009，JPO＆INPIT

    Method and system for lithographic gray scaling
    4.
    发明专利
    Method and system for lithographic gray scaling 有权
    用于灰度灰度分级的方法和系统

    公开(公告)号：JP2006191099A

    公开(公告)日：2006-07-20

    申请号：JP2005378942

    申请日：2005-12-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOF JOERI ,  DE JAGER PIETER WILLEM HERMAN ,  JOANNES THEODOOR DE SMIT

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70283

    Abstract: PROBLEM TO BE SOLVED: To provide an improved gay scaling imaging method and a system. SOLUTION: The Improved gray scaling imaging method and the system include a group of elements within an array of individually controllable elements that make a part of a radiation beam project to a lens in an array 302 of microlenses and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供改进的同性恋缩放成像方法和系统。 改进的灰度成像方法和系统包括使得辐射束的一部分投影到微透镜阵列302中的透镜的独立可控元件的阵列内的一组元件，并且是单独可控的，使得 可以打开或关闭任何数量的可单独控制的元件以产生灰度级。 版权所有（C）2006，JPO＆NCIPI

    Method and system for forming lithographic beam
    7.
    发明专利
    Method and system for forming lithographic beam 有权
    用于形成光栅的方法和系统

    公开(公告)号：JP2006191063A

    公开(公告)日：2006-07-20

    申请号：JP2005375393

    申请日：2005-12-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DE JAGER PIETER WILLEM HERMAN ,  BASELMANS JOHANNES JACOBUS MAT ,  BRUINSMA ANASTASIUS JACOBUS AN ,  MUNNIG SCHMIDT ROBERT-HAN ,  VINK HENRI JOHANNES PETRUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/7005

    Abstract: PROBLEM TO BE SOLVED: To provide an improved system and a method for lithographic illumination that provides a projection beam with a desired output. SOLUTION: The device and the method for the lithographic illumination include steps of: receiving radiation beams of a plurality of radiation sources from a plurality of corresponding radiation sources; deflecting the radiation beams of the plurality of radiation sources along a common beam path; thereby generating a projection beam of radiation; providing the projection beam of radiation with a cross-section pattern; and projecting the patterned projection beam of radiation to a target portion of a substrate. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提供具有期望输出的投影光束的改进的光刻照明系统和方法。 解决方案：用于光刻照明的装置和方法包括以下步骤：从多个对应的辐射源接收多个辐射源的辐射束; 沿着共同的光束路径使多个辐射源的辐射束偏转; 从而产生投影射束; 提供具有横截面图案的辐射投影光束; 以及将所述图案化的投影辐射束投射到基板的目标部分。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and device manufacturing method
    8.
    发明专利
    Lithography apparatus and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006133784A

    公开(公告)日：2006-05-25

    申请号：JP2005321654

    申请日：2005-11-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  KLINKHAMER JACOB FREDRIK FRISO ,  HOEBERICHTS EDUARD

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70475 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method for exposing a large-area substrate in a single scan. SOLUTION: An illumination system supplies beams that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of tracks on the substrate. Each track comprises a first portion scanned by one beam and a second portion overlapping an adjacent track and scanned by two beams. As a maximum intensity of each beam directed towards the first portion of the track is greater than a maximum intensity of the beam directed towards the second portion, the first and second portions are exposed to radiation of substantially the same maximum intensity. Overlapping of adjacent beams and modulation of the intensity of beams as above described can allow the optical footprints of different optical columns to be seamed together to achieve exposure of a large-area substrate in a single scan. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种在单次扫描中曝光大面积基板的光刻设备和方法。 解决方案：照明系统提供由单独可控元件阵列构图的光束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统导致基板和梁之间的相对位移，使得沿着预定扫描方向跨过基板扫描光束。 投影系统被定位成使得每个光束沿着衬底上的相应轨道扫描。 每个轨道包括由一个光束扫描的第一部分和与相邻轨道重叠并由两个光束扫描的第二部分。 由于朝向轨道的第一部分的每个光束的最大强度大于朝向第二部分的光束的最大强度，所以第一和第二部分暴露于基本上相同的最大强度的辐射。 如上所述，相邻光束的重叠和光束强度的调制可以使不同光学柱的光学占据面被缝合在一起，以实现单个扫描中的大面积衬底的曝光。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus and device manufacturing method
    9.
    发明专利
    Lithography apparatus and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006054459A

    公开(公告)日：2006-02-23

    申请号：JP2005230548

    申请日：2005-08-09

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TROOST KARS Z ,  HOEFNAGELS JOHAN CHRISTIAAN GE ,  DE JAGER PIETER WILLEM HERMAN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70791 ,  G03F7/70275

    Abstract: PROBLEM TO BE SOLVED: To provide a system to introduce a beam where a plurality of patterns are formed on a substrate supported on a substrate table using a lithography apparatus, and to provide its method. SOLUTION: A group of beams where a plurality of patterns are formed are projected on the objects, and the beams are scanned across the substrate according to the relative displacement between the substrate and the beam with a pattern formed. A first projection device projects a portion of a first relatively large area extending across the substantial portion of the substrate, and a second project device projects a second long portion of the substrate extending in the direction of relative displacement, and a third project device can project a third long portion of the substrate extending in the lateral direction across the direction of relative displacement. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种系统，其使用光刻设备引入在支撑在基板台上的基板上形成多个图案的光束，并提供其方法。 解决方案：将形成有多个图案的一组光束投影在物体上，并且根据形成的图案的基板和光束之间的相对位移，横跨基板扫描光束。 第一投影装置投影延伸穿过基板的基本部分的第一相对较大区域的一部分，并且第二投影装置投影沿相对位移方向延伸的基板的第二长部分，并且第三投影装置可投影 衬底的第三长部分在横向方向上跨过相对位移的方向延伸。 版权所有（C）2006，JPO＆NCIPI

    Lithography projection aligner and device manufacturing method
    10.
    发明专利
    Lithography projection aligner and device manufacturing method 有权
    LITHOGRAPHY投影对准器和器件制造方法

    公开(公告)号：JP2005252256A

    公开(公告)日：2005-09-15

    申请号：JP2005055657

    申请日：2005-03-01

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： SYSTMA JOOST ,  DE JAGER PIETER WILLEM HERMAN

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70558 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a simply structured system that uniforms strengths of radiation beams actually projected on a board in the case that a plurality of separately controllable arrays of elements are used as a patterning means for the radiation beams generated by a lithogrphy projection aligner and the radiation beams are distributed among the arrays from a plurality of radiation sources and/or via a plurality of radiation distribution channels.
    SOLUTION: By the lithography projection aligner, the radiation beams 6 from a lighting system 5 are distributed among the arrays, by using a distributor 7 via the radiation distribution channels or to an optical engine 8 including individual arrays and a projection system. The strengths of the radiation beams related to each array are measured by a detector 20 moving on the back or front of the arrays. Measurement given by the detector 20 is fed back to compensate the loss of the radiation beams to uniform the strengths of the radiation beams projected on the board 9.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种简单结构化的系统，其在多个可单独控制的元件阵列用作用于由一个或多个元件产生的辐射束的图案化装置的情况下均匀化实际投射在基板上的辐射束的强度 光栅投影对准器和辐射束从多个辐射源和/或经由多个辐射分布通道分布在阵列之间。 解决方案：通过光刻投影对准器，通过使用经由辐射分配通道的分布器7或包括单独阵列和投影系统的光学引擎8，将来自照明系统5的辐射束6分布在阵列之间。 通过在阵列的背面或前面移动的检测器20测量与每个阵列相关的辐射束的强度。 由检测器20给出的测量被反馈以补偿辐射束的损失，以均衡投射在电路板9上的辐射束的强度。（C）2005年，JPO和NCIPI

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