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公开(公告)号：JP2008135769A
公开(公告)日：2008-06-12
申请号：JP2007339406
申请日：2007-12-28
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DIERICHS MARCEL MATHIJS THEODO , DONDERS SJOERD NICOLAAS LAMBER , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , SEUNTIENS-GRUDA LEJLA
IPC: H01L21/027 , B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT
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2.发明专利
公开(公告)号：JP2004177956A
公开(公告)日：2004-06-24
申请号：JP2003393923
申请日：2003-11-25
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： DIERICHS MARCEL MATHIJS THEODO , LOOPSTRA ERIK ROELOF
Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing technique for manufacturing an optical element having a relief profile with which a reflective film can surely be deposited on a multilayered stack. SOLUTION: In this manufacturing technique, the relief profile is formed by selectively applying a plasma etching to a multilayered stack including alternative layers of a first material and a second material, which have relative etching selectivity. The relief profile is coated with the film such as a reflective coating film. COPYRIGHT: (C)2004,JPO
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3.发明专利Mask used for lithography, method of forming the mask, lithographic apparatus, and device-manufacturing method 有权用于图形的掩模，形成掩模的方法，光刻设备和器件制造方法
公开(公告)号：JP2003273013A
公开(公告)日：2003-09-26
申请号：JP2003107122
申请日：2003-03-06
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： EURLINGS MARKUS FRANCISCUS ANT , VAN DIJSSELDONK ANTONIUS JOHAN , DIERICHS MARCEL MATHIJS THEODO
IPC: G03F1/00 , G03F1/24 , G03F7/20 , H01L21/027 , G03F1/08
CPC classification number: B82Y40/00 , B82Y10/00 , G03F1/24 , G03F7/70283
Abstract: PROBLEM TO BE SOLVED: To avoid or alleviate the problem caused by a contrast loss, that is induced by radiations reflected first from the dark part of a mask and second from the other absorbing layer in a lithographic apparatus. SOLUTION: A reflective mask has a sub-resolution texture applied to absorbing area to reduce the amount of power in specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in the lithographic apparatus. COPYRIGHT: (C)2003,JPO
Abstract translation: 要解决的问题：为了避免或减轻由于掩模的暗部首先反射的辐射引起的对比度损失引起的问题，而第二次由光刻设备中的另一个吸收层引起。
解决方案：反射掩模具有应用于吸收区域的亚分辨率纹理，以减少镜面反射中的光焦度。 纹理可以形成相差光栅，或者可以是扩散器。 相同的技术可以应用于光刻设备中的其它吸收体。 版权所有（C）2003，JPO
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公开(公告)号：JP2008098681A
公开(公告)日：2008-04-24
申请号：JP2008001122
申请日：2008-01-08
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
IPC: G03F7/20 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method and a substrate. SOLUTION: A substrate W is provided with a coating 4 of a material which is substantially transparent to a wavelength of a projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating 4 such that the wavelength of the projection beam is shortened as the projection beam passes through the coating. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供光刻设备，器件制造方法和衬底。 解决方案：衬底W设置有对投影光束的波长基本透明的材料的涂层4。 涂层可以比投影光束的波长厚，并且具有涂层4的折射率，使得当投影光束通过涂层时，投影光束的波长被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2004146822A
公开(公告)日：2004-05-20
申请号：JP2003345026
申请日：2003-08-27
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： DIERICHS MARCEL MATHIJS THEODO
IPC: G21K5/02 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70558
Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
SOLUTION: A sensor 4 is used to detect a luminescence emission 5 emitted from a reflecting mirror 3 as a result of status changes caused by an emitted beam 2 incident on the range 3a of the reflecting mirror 3. The intensity of the luminescence emission 5 with a specific wavelength can be used to determine the intensity of the emitted beam 2.
COPYRIGHT: (C)2004,JPO-
Patent Agency Ranking
公开(公告)号：JP2004128449A
公开(公告)日：2004-04-22
申请号：JP2003116334
申请日：2003-03-17
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： DIERICHS MARCEL MATHIJS THEODO
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70075 , G03F7/70091
Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having a lighting system with a reflective optical element capable of improving control of lighting settings.
SOLUTION: In the lighting system using a mirror, the facet of a field facet mirror condenses a plurality of source images on the respective facets of pupil facet mirrors to perform the function of an accumulator. A facet masking means is provided to selectively interrupt the facets of the field or the pupil facet mirror. The facet masking means has a grid which can be selectively inserted into a projected beam and makes an intermediate lighting setting. The grid has an interval which is smaller than the source image and larger than the wavelength of the projected beam, thereby causing no refraction.
COPYRIGHT: (C)2004,JPO-
公开(公告)号：JP2005182031A
公开(公告)日：2005-07-07
申请号：JP2004364656
申请日：2004-12-16
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
IPC: G03F1/08 , G03F7/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC classification number: G03F1/54
Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method and a mask by which an improved contrast can be obtained on a substrate level in projection exposure. SOLUTION: The mask has a quartz-made transparent substrate Q and an absorber layer AB where a pattern is formed of, for example, chromium or chromium oxide, wherein the thickness (t) of the absorber layer AB is larger than the wavelength λ of a projection beam PB and three to four times as large as the width (b) of the absorber layer. The thick absorber layer causes TE polarized light (sagittal or s-polarized light) in transmitted light to increase. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种在投影曝光中在基板水平上可以获得改善的对比度的装置制造方法和掩模。 解决方案：掩模具有石英制的透明基板Q和吸收层AB，其中图案由例如铬或铬氧化物形成，其中吸收层AB的厚度（t）大于 投影光束PB的波长λ和吸收层的宽度（b）的三到四倍。 厚的吸收层使透射光中的TE偏振光（矢状或s偏振光）增加。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2005079584A
公开(公告)日：2005-03-24
申请号：JP2004247635
申请日：2004-08-27
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： DIERICHS MARCEL MATHIJS THEODO , DONDERS SJOERD NICOLAAS LAMBER , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , SEUNTIENS-GRUDA LEJLA
IPC: B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2005051243A
公开(公告)日：2005-02-24
申请号：JP2004218061
申请日：2004-07-27
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
IPC: G03F7/20 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method, and a substrate.
SOLUTION: A substrate W is provided with a coating 4 comprising a material substantially transmissive to the wavelength of a projection beam. This coating can be made thicker than the wavelength of the projection beam, and the refractive index of the coating 4 is such that the wavelength of the projection beam is reduced when the projection beam passes through. Thereby, the image formation of a smaller image structure is enabled on the substrate. As an alternative method, this coating can be used, together with a liquid supply system and serves to keep air bubbles away from the radiation sensitive layer of the substrate.
COPYRIGHT: (C)2005,JPO&NCIPIAbstract translation: 要解决的问题：提供光刻设备，设备制造方法和基板。 解决方案：衬底W设置有涂层4，涂层4包括基本上对投影光束的波长透射的材料。 可以使该涂层比投影光束的波长更厚，并且涂层4的折射率使得当投影光束通过时投影光束的波长减小。 由此，能够在基板上形成较小的图像结构。 作为替代方法，该涂层可与液体供应系统一起使用，并用于使气泡远离基板的辐射敏感层。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2004214656A
公开(公告)日：2004-07-29
申请号：JP2003426987
申请日：2003-12-24
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： BAKKER LEVINUS PETER , DIERICHS MARCEL MATHIJS THEODO , FRERIKS JOHANNES MARIA , SCHUURMANS FRANK JEROEN PIETER , VIJFVINKEL JAKOB , BOX WILHELMUS JOSEPHUS
CPC classification number: B82Y10/00 , G03F7/70166 , G03F7/70916
Abstract: PROBLEM TO BE SOLVED: To provide a contamination barrier minimizing undesirable deformation of thin films, which is related to a foil trap for a lithographic projection apparatus.
SOLUTION: This foil trap has an open structure which transmits radiation from an EUV source or the like without interference. The foil trap is equipped with thin films positioned to trap scrap particles from a radiation source. The thin films extend in the radius direction from the foil trap axis. To avoid mechanical stress, the thin films are connected to one or both of the grooves of rings so that they can slide. This structure allows the thin films to extend easily and avoids mechanical stress, resulting in no deformation in the thin films. At least one of the outer ends of the thin films is thermally connected to the rings. These rings can be cooled with a cooling system. In a preferred embodiment, the foil trap is equipped with a shield which prevents the inner ring from being irradiated with an EUV beam.
COPYRIGHT: (C)2004,JPO&NCIPIAbstract translation: 要解决的问题：提供减少薄膜不期望的变形的污染屏障，这与用于光刻投影装置的箔陷阱有关。 解决方案：该箔阱具有开放的结构，其能够在不受干扰的情况下传输来自EUV源等的辐射。 箔陷阱配备有薄膜，定位成从辐射源捕获废料颗粒。 薄膜从箔陷阱轴线沿半径方向延伸。 为了避免机械应力，薄膜连接到环的一个或两个槽，使得它们可以滑动。 这种结构允许薄膜容易地延伸并避免机械应力，导致薄膜没有变形。 薄膜的至少一个外端热连接到环上。 这些环可以用冷却系统冷却。 在优选实施例中，箔捕获器配备有防止内环被EUV射束照射的护罩。 版权所有（C）2004，JPO＆NCIPI
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