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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009188421A

    公开(公告)日：2009-08-20

    申请号：JP2009093214

    申请日：2009-04-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a liquid supply system, wherein a substrate can be moved in different directions without switching a direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate. SOLUTION: The immersion lithographic apparatus includes a liquid supply system which has an inlet configured to supply the liquid to a space between the projection system of the lithographic apparatus and the substrate and an outlet configured to remove at least a part of the liquid and is configured to rotate the inlet, the outlet, or both of them about an axis substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有液体供应系统的光刻设备，其中可以在不改变在光刻设备的投影系统和基板之间流动的液体的方向的不同方向上移动基板。 浸没式光刻设备包括液体供应系统，该液体供应系统具有入口，该入口构造成将液体供应到光刻设备的投影系统与基板之间的空间，以及出口，该出口构造成去除液体的至少一部分 并且被配置为使入口，出口或两者围绕基本上垂直于衬底的曝光平面的轴线旋转。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009164623A

    公开(公告)日：2009-07-23

    申请号：JP2009044651

    申请日：2009-02-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HU

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a means for alleviating the problem concerning the presence of a dipping liquid in a lithographic projection apparatus.
    SOLUTION: In the lithographic projection apparatus, a liquid supplying system supplies the dipping liquid between the last element of the projection apparatus and a substrate. An active drying station is provided to actively remove the remained dipping liquid from the exposed substrate W or other objects. The active drying station is equipped with a gas stream forming means or a dipping liquid dissolving liquid supplying means for dissolving the dipping liquid.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种减轻在光刻投影设备中存在浸渍液体的问题的方法。 解决方案：在平版印刷投影设备中，液体供应系统将投影设备的最后一个元件和基板之间的浸渍液体供应。 提供主动干燥站，以从暴露的基底W或其它物体主动去除剩余的浸渍液体。 活性干燥站装有用于溶解浸渍液体的气流形成装置或浸液溶解液体供给装置。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and process for fabricating device
    8.
    发明专利
    Lithography equipment and process for fabricating device 有权
    雕刻设备和制作装置的过程

    公开(公告)号：JP2006313910A

    公开(公告)日：2006-11-16

    申请号：JP2006128497

    申请日：2006-05-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is arranged to project an image of desired pattern onto a substrate W held on a substrate table WT through liquid. A gap 22 exists in the surface of the substrate table between the substrate table and the outer edge of the substrate, or between the substrate table and other component touching the liquid during normal use. The lithography equipment is provided, in the gap, with a bubble holding device arranged to hold a bubble 24 possibly generated in the gap. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被布置成通过液体将所需图案的图像投影到保持在基板台WT上的基板W上。 在衬底台与衬底的外边缘之间，或在正常使用过程中，在衬底台和其他部件接触液体之间，衬底台表面上存在间隙22。 光刻设备在间隙中设置有气泡保持装置，其被布置成保持可能在间隙中产生的气泡24。 版权所有（C）2007，JPO＆INPIT

    Lithographic device
    9.
    发明专利
    Lithographic device 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2006041520A

    公开(公告)日：2006-02-09

    申请号：JP2005210785

    申请日：2005-07-21

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/707 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate releasing mechanism used in an immersion-type lithographic device that is configured to be isolated from a substrate table by dislocating a substrate after a step including the immersing while holding the substrate on the substrate table. SOLUTION: In the immersion-type lithographic device that immerses the surface of the substrate in a liquid during an exposure operation, the substrate is held with the same contacted with the substrate table. After the exposure operation is over, the substrate is lifted and isolated from the substrate table. To overcome a condition that the substrate tends to be affixed to the substrate table with the film of a residual liquid, a pin for lifting the substrate is disposed so as to apply a force to the substrate at a position that is offset from a central axis at least first and is actuated. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备中使用的基板释放机构，其被配置为在将基板保持在基板台上之后，在包括浸渍的步骤之后使基板脱离基板而与基板台隔离 。 解决方案：在曝光操作期间，将基板表面浸入液体的浸没式光刻设备中，将基板保持与基板台相同的基板。 曝光操作结束后，将衬底从衬底台上提起并隔离。 为了克服基板倾向于用残留液体的膜固定到基板台的条件，设置用于提升基板的销，以便在偏离中心轴线的位置处向基板施加力 至少首先被致动。 版权所有（C）2006，JPO＆NCIPI

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