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    Lithographic apparatus
    8.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2010118713A

    公开(公告)日：2010-05-27

    申请号：JP2010048947

    申请日：2010-03-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus suitable for preventing or reducing production of bubbles by preventing the bubbles from escaping from one or more gaps in a substrate table to a path of a radiation beam, or extracting the bubbles that may be produced in the gaps. SOLUTION: This lithographic apparatus is configured to project an image of a desired pattern on a substrate W, which is held on a substrate table WT, through a liquid. In the lithographic apparatus, gaps 22 are formed inside a surface of the substrate table between the substrate table and an outer edge of a substrate, or between the substrate table and another component that is arranged thereon and brought into contact with the liquid in normal use. The lithographic apparatus is composed by arranging, in the gap, a bubble holding device configured to hold bubbles 24 that may be produced in the gap. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其适用于通过防止气泡从衬底台中的一个或多个间隙逸出到辐射束的路径来防止或减少气泡的产生，或提取气泡， 可能在间隙中产生。 解决方案：该光刻设备被配置为通过液体将保持在衬底台WT上的衬底W投影所需图案的图像。 在光刻设备中，间隙22形成在衬底台的表面之间，衬底台与衬底的外边缘之间，或衬底台与另一部件之间，在正常使用中与其配置并与液体接触 。 光刻设备通过在间隙中布置构造成保持可能在间隙中产生的气泡24的气泡保持装置而构成。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    9.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2010109395A

    公开(公告)日：2010-05-13

    申请号：JP2010032113

    申请日：2010-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved from a liquid supply system configured to supply immersion liquid into interspace between a terminal element of a projection system and a substrate, so as to efficiently remove the liquid from the vicinity of the substrate. SOLUTION: The liquid supply system includes a sealing member for forming a seal between its own undersurface and the substrate to substantially store the liquid in the space. A recess is formed in the undersurface and connected to a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source has lower pressure than the second pressure source, gas flow generated from the second pressure source to the first pressure source, and the liquid and/or gas extracted by the flow. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种从液体供应系统改进的光刻设备，其配置为将浸没液体供应到投影系统的端子元件和基板之间的间隙中，以便有效地从液体供应系统 基质。 解决方案：液体供应系统包括用于在其自身的下表面和基底之间形成密封的密封构件，以将液体基本上储存在空间中。 凹槽形成在下表面中并连接到第一压力源和用于抽出液体和/或气体的第二压力源。 第一压力源具有比第二压力源低的压力，从第二压力源产生的气流到第一压力源，以及由流提取的液体和/或气体。 版权所有（C）2010，JPO＆INPIT

    Lithography device
    10.
    发明专利
    Lithography device 有权
    LITHOGRAPHY设备

    公开(公告)号：JP2010239146A

    公开(公告)日：2010-10-21

    申请号：JP2010132174

    申请日：2010-06-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HUBERTUS

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a suitable method of manufacturing a device that eases a problem related to residual immersion liquid in an immersion lithography device. SOLUTION: An active drying station ADS for actively removing liquid from an object W of an immersion lithography device, a substrate table WT, or both is provided between a projection system and a substrate post-exposure processing module. The substrate table WT carries the object W to the active drying station ADS. The active drying station ADS includes a gas flow means. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种适合于制造在浸没式光刻装置中减轻与残留浸液的问题有关的装置的方法。 解决方案：在投影系统和基板后曝光处理模块之间设置主动干燥台ADS，用于从浸没式光刻装置，衬底台WT或二者的物体W主动去除液体。 衬底台WT将物体W运送到主动干燥站ADS。 主动干燥站ADS包括气流装置。 版权所有（C）2011，JPO＆INPIT

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