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    Lithographic apparatus and method of manufacturing device
    1.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008028392A

    公开(公告)日：2008-02-07

    申请号：JP2007185824

    申请日：2007-07-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN ,  SIMONS WILHELMUS FRANCISCUS JO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To provide an improved controlling system for a lithographic apparatus and the lithographic apparatus having the same. SOLUTION: A controlling system for controlling a position parameter of a stage in a lithographic apparatus has a stage controller for controlling at least a position parameter of a stage at least in a first direction. The controlling system has a disturbance torque estimator for estimating a disturbance torque on a stage around an axis line extended in a second direction which is substantially orthogonal to the first direction. The controlling system has a correcting signal calculator to which the estimated disturbance torque and a signal which represents a position of a stage extended in a third direction which is substantially orthogonal to the first and second directions are provided. The correcting signal calculator determines a feed forward correcting signal for correcting a position error of the stage extended in the first direction caused by the disturbance torque. The feed forward correcting signal is provided to the stage. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于光刻设备和具有该光刻设备的光刻设备的改进的控制系统。 解决方案：用于控制光刻设备中的台的位置参数的控制系统具有级控制器，用于至少在第一方向上至少控制平台的位置参数。 所述控制系统具有干扰转矩估计器，用于估计在与所述第一方向基本正交的第二方向上延伸的轴线周围的台上的扰动转矩。 控制系统具有校正信号计算器，所述校正信号计算器提供估计的干扰转矩和表示在与第一和第二方向基本正交的第三方向上延伸的平台的位置的信号。 校正信号计算器确定用于校正由干扰转矩引起的在第一方向上延伸的级的位置误差的前馈校正信号。 前馈校正信号被提供给舞台。 版权所有（C）2008，JPO＆INPIT

    Lithography apparatus, immersion projection apparatus, and method of manufacturing device
    3.
    发明专利
    Lithography apparatus, immersion projection apparatus, and method of manufacturing device 有权
    抛光装置，投影投影装置和制造装置的方法

    公开(公告)号：JP2006279044A

    公开(公告)日：2006-10-12

    申请号：JP2006084505

    申请日：2006-03-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DER TOORN JAN-GERARD CORNE ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  DRAAIJER EVERT HENDRIK JAN ,  KATE NICOLAAS TEN ,  VAN DER MEULEN FRITS ,  FRENCKEN MARK JOHANNES H ,  HOUKES MARTIJN ,  ARENDS ANTONIUS H ,  CUPERUS MINNE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus having an improved positioning method of a liquid supply system. SOLUTION: The lithography apparatus includes a substrate table for holding a substrate, and a projection system for projecting a radiation beam patterned in a target portion of the substrate. The lithography apparatus has a fluid supply system for supplying fluid between the substrate and a final optical element of the projection system, and a positional control system for controlling a position of the fluid supply system. The positional control system is formed such that it is provided with a positional amount of the substrate, adds offset of a position to the positional amount of the substrate and thus determines a desirable position of the fluid supply system, and performs positioning of the fluid supply system based on the desirable position. The positional amount may include all or one of a position of the substrate, a rotational position of the substrate table, and a height function of height of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有改进的液体供应系统的定位方法的浸没式光刻设备。 解决方案：光刻设备包括用于保持基板的基板台和用于投影图案化在基板的目标部分中的辐射束的投影系统。 光刻设备具有用于在基板和投影系统的最终光学元件之间供应流体的流体供应系统和用于控制流体供应系统的位置的位置控制系统。 位置控制系统形成为使得其具有基板的位置量，将位置的偏移增加到基板的位置量，从而确定流体供应系统的期望位置，并且执行流体供应 系统基于理想的位置。 位置量可以包括基板的位置，基板台的旋转位置和基板的高度的高度函数的全部或者一个。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus, and device manufacturing method
    6.
    发明专利
    Lithography apparatus, and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2010226106A

    公开(公告)日：2010-10-07

    申请号：JP2010060381

    申请日：2010-03-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EMPEL TJARKO ADRIAAN RUDOLF ,  HOUKES MARTIJN ,  JANSEN NORBERT ERWIN THERENZO

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To reduce a positioning error caused by an external disturbing force in a positioning apparatus. SOLUTION: The positioning apparatus includes a first object, a second object, a positioning system for positioning the first and second objects with each other, and a soft transporting line for connecting the first and second objects with each other. The soft transporting line has a rigidity varying along the line. The transporting line can be represented by a dynamic transferring function. The transferring function is adapted to the closed-loop transferring function of the positioning system. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：减少由定位装置中的外部干扰力引起的定位误差。 解决方案：定位装置包括第一物体，第二物体，用于将第一和第二物体彼此定位的定位系统和用于将第一和第二物体彼此连接的软运输线。 软运输线具有沿线的刚度变化。 传输线可以由动态传输功能表示。 传递功能适用于定位系统的闭环传递功能。 版权所有（C）2011，JPO＆INPIT

    Suppression of damage of lithographic device by immersion
    7.
    发明专利
    Suppression of damage of lithographic device by immersion 有权
    通过浸没来抑制光刻设备的损伤

    公开(公告)号：JP2007013159A

    公开(公告)日：2007-01-18

    申请号：JP2006177816

    申请日：2006-06-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER MEULEN FRITS ,  COX HENRIKUS HERMAN MARIE ,  HOUKES MARTIJN ,  VAN VLIET ROBERTUS J ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILHELMUS J M ,  HANEGRAAF ROLAND P HENDRIKUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device which is so improved that damage due to especially collision and leakage, etc. in an immersion device is suppressed, related to an immersion lithographic projector. SOLUTION: This lithographic projector includes a calculator which calculates numerical quantities relating to a void dimension between a fluid supply system and a substrate table for holding a substrate based on numerical quantities relating to a position of the substrate table, and that relating to a position of the fluid supply system to prevent the collision between the fluid supply system and the substrate table for holding the substrate. The projector further comprises a damage suppressing system which is so constituted as to generate a warning signal when the numerical quantities relating to the dimension goes beyond a predetermined safety level. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种如此改进的平版印刷装置，其与浸没式光刻投影仪相关的浸没装置中的特别是碰撞和泄漏等的损坏被抑制。 解决方案：该光刻投影仪包括计算器，该计算器基于与衬底台的位置相关的数量计算与流体供应系统和用于保持衬底的衬底台之间的空隙尺寸相关的数量，并且涉及 流体供应系统的位置，以防止流体供应系统和用于保持基板的基板台之间的碰撞。 投影仪还包括损伤抑制系统，其被构造成当与尺寸相关的数值超过预定安全水平时产生警告信号。 版权所有（C）2007，JPO＆INPIT

    Lithographic device and method for manufacturing device
    10.
    发明专利
    Lithographic device and method for manufacturing device 有权
    光刻设备和制造设备的方法

    公开(公告)号：JP2006191055A

    公开(公告)日：2006-07-20

    申请号：JP2005374334

    申请日：2005-12-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： HOUKES MARTIJN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To improve quality of pixels in a lithographic device and a method for manufacturing the device.
    SOLUTION: The lithographic device has a first movable element (like an immersion liquid supply system), and operates while contacting the surface of a second movable element (like a substrate table). The lithographic device is also provided with a second element controller (like a substrate table controller) C2 that controls the amount of positions in the second movable element. Disturbance force by capillary force, for example, caused by relative movements of the first and the second movable elements, disturbs the positions y1, y2 of the first and the second movable elements. The lithographic device includes a feed forward control path that feeds a disturbance feed forward signal to the second element controller C2 to correct at least a part of positions of the second movable element caused by such a disturbance force, and the feed forward control path includes a disturbance force estimator Fd that estimates the disturbance force from the amount y1 of the position in the first movable element.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提高光刻设备中的像素的质量以及用于制造该设备的方法。 解决方案：光刻设备具有第一可移动元件（如浸没液体供应系统），并且在接触第二可移动元件（如基板台）的表面时操作。 光刻设备还设置有控制第二可移动元件中的位置量的第二元件控制器（如基板台控制器）C2。 由第一和第二可移动元件的相对运动引起的例如毛细管力的扰动力扰乱第一和第二可移动元件的位置y1，y2。 光刻设备包括前馈控制路径，其将干扰前馈信号馈送到第二元件控制器C2以校正由这种干扰力引起的第二可移动元件的位置的至少一部分，并且前馈控制路径包括 扰动力估计器Fd，其估计来自第一可移动元件中的位置的量y1的扰动力。 版权所有（C）2006，JPO＆NCIPI

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