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公开(公告)号：JP2009033201A
公开(公告)日：2009-02-12
申请号：JP2008274728
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面 的基底。 屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008135769A
公开(公告)日：2008-06-12
申请号：JP2007339406
申请日：2007-12-28
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DIERICHS MARCEL MATHIJS THEODO , DONDERS SJOERD NICOLAAS LAMBER , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , SEUNTIENS-GRUDA LEJLA
IPC: H01L21/027 , B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2009267404A
公开(公告)日：2009-11-12
申请号：JP2009100474
申请日：2009-04-17
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： WATSO ROBERT DOUGLAS , VAN DOMMELEN YOURI JOHANNES LA , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , ANTONIUS LEENDERS MARTINUS HEN , JEROEN JOHANNES SOPHIA MARIA M , STEIJAART PETER PAUL , DE JONG ANTHONIUS MARTINUS COR , VAN DE WINKEL JIMMY MATHEUS WI , DA PAZ SENA JOAO PAULO , VAN DER LEE MAURICE MARTINUS J , VAN LIER HENRICUS MARTINUS DOR , TANASA GHEORGHE
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus including a cleaning station. SOLUTION: Several embodiments of a cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with a final element of a projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：公开一种包括清洁站的光刻投影设备。 解决方案：公开了清洁站的几个实施例。 在一个实施例中，采取措施以避免清洁流体与投影系统的最终元件接触。 在一个实施例中，采取措施以避免清洁流体的起泡。 还公开了热隔离岛的使用以及其最佳位置。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JP2009044185A
公开(公告)日：2009-02-26
申请号：JP2008274716
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially as the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或障壁40，以及围绕其它物体20的阻挡物100，其围绕基本上与衬底的上表面位于同一平面中的传感器 阻挡层40和100构造成在衬底W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影设备中精细部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008072147A
公开(公告)日：2008-03-27
申请号：JP2007312122
申请日：2007-12-03
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JEROEN JOHANNES SOPHIA MARIA M , CHRISTIAAN ALEXANDER HOOGENDAM , JANSSEN HENDRICUS WILHELMUS A , TINNEMANS PATRICIUS ALOYSIUS J , VAN DEN SCHOOR LEON JOSEPH MAR , DONDERS SJOERD NICOLAAS LAMBER , STREEFKERK BOB
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system capable of supplying immersion liquid with an extremely stable flow rate and minimum pressure fluctuation into a space between a last element of a projection lens and a substrate in an immersion liquid lithographic apparatus. SOLUTION: In an immersion liquid lithographic apparatus, immersion liquid is supplied from a tank through a flow rate limiter. Liquid preserved in the tank is maintained virtually at a fixed height above the flow rate limiter, thereby, a stable liquid flow is assured. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种液体供应系统，其能够以非常稳定的流速和最小的压力波动将浸没液体供应到浸没液体光刻设备中的投影透镜的最后一个元件与基板之间的空间中。 解决方案：在浸没液体光刻设备中，浸没液体通过流速限制器从罐中提供。 保存在罐中的液体实际上保持在流量限制器上方的固定高度，从而确保稳定的液体流动。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2005079584A
公开(公告)日：2005-03-24
申请号：JP2004247635
申请日：2004-08-27
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： DIERICHS MARCEL MATHIJS THEODO , DONDERS SJOERD NICOLAAS LAMBER , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , SEUNTIENS-GRUDA LEJLA
IPC: B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: The liquid supply system further comprises a de-mineralizing unit, a distillation unit and a UV radiating source for the purification of an immersion liquid. Chemicals may be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种光刻投影装置，其中液体供应系统在具有液体限制系统的投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统还包括去矿化单元，蒸馏单元和用于净化浸液的UV辐射源。 可以将化学品加入到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2009060127A
公开(公告)日：2009-03-19
申请号：JP2008274725
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus, which is so configured as to prevent contamination with immersion liquid. SOLUTION: A substrate table WT is provided with a drainage ditch, namely, a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding another object 20 like a sensor existing on practically the same plane as an upper face of the substrate W. Since the barriers 40 and 100 can collect any liquid spilt from a liquid supply system during exposure of the substrate W, the risk of contamination of delicate components of a lithographic projection apparatus is reduced. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被设置为防止浸没液体的污染。 解决方案：衬底台WT设置有排水沟，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡物100，像传感器存在于与实际上相同的平面上的传感器 由于障碍物40和100可以收集在衬底W暴露期间从液体供应系统溢出的任何液体，所以降低了光刻投影设备的微妙部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009044186A
公开(公告)日：2009-02-26
申请号：JP2008274721
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或屏障40，以及围绕基本上位于衬底W的上表面的同一平面中的诸如传感器的其它物体20的阻挡层100 挡板40和100被配置为在基板W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影装置中的细小部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009033200A
公开(公告)日：2009-02-12
申请号：JP2008274726
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号：JP2008160155A
公开(公告)日：2008-07-10
申请号：JP2008073704
申请日：2008-03-21
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , JOHANNES JACOBUS MATHEUS BASEL , COX HENRIKUS HERMAN MARIE , ANTONIUS THEODORUS ANNA MARIA , SJOERD NICOLAAS LAMBERTUS DOND , CHRISTIAAN ALEXANDER HOOGENDAM , JOERI LOF , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , VAN DER MEULEN FRITS , MULKENS JOHANNES CATHARINUS HU , GERARDUS PETRUS MATTHIJS VAN N , SIMON KLAUS , SLAGHEKKE BERNARDUS ANTONIUS , STRAAIJER ALEXANDER , VAN DER TOORN JAN-GERARD CORNE , HOUKES MARTIJN
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT
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