公开(公告)号：JP2014013915A

公开(公告)日：2014-01-23

申请号：JP2013169108

申请日：2013-08-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  JOHANNES PETRUS MARTINUS BERNARDUS

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To prevent misalignment from residual strain in a substrate in a lithography apparatus.SOLUTION: An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows stress relaxation in the substrate prior to further patterning in order to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including arbitrarily the entire substrate) from a corresponding portion of a substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. In order to overcome residual frictional force between the substrate and the substrate holder, the substrate and the substrate holder may be physically separated prior to further patterning.

Abstract translation: 要解决的问题：为了防止光刻设备中的基板中的残余应变的不对准。解决方案：压印光刻设备和制造方法可以导致在施加印记图案的基板中形成机械应力。 这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。 公开了一种在进一步构图之前允许衬底中的应力松弛的装置和方法，以便减少，最小化或防止这种从残余应变的偏移。 这是通过从衬底保持器的相应部分局部松开衬底的一部分（包括任意整个衬底）来实现的，使得导致局部应变的机械应力在进一步图案化之前可能松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

公开(公告)号：JP2011103448A

公开(公告)日：2011-05-26

申请号：JP2010211472

申请日：2010-09-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  JEUNINK ANDRE BERNARDUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To align patterns with enough accuracy to each other in an imprint lithography device. SOLUTION: A method of determining an offset between an imprint template 21 and a substrate 20 by using an alignment grating 24 on the imprint template 21 and an alignment grating 23 on the substrate 20 is disclosed. The method includes bringing the imprint template alignment grating 24 and the substrate alignment grating 23 sufficiently close together such that they form a composite grating, guiding an alignment radiation beam to the composite grating while modulating the relative position of the imprint template 21 and the substrate 20, detecting a luminous intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing the modulation of the detected luminous intensity. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：在压印光刻设备中使图案彼此之间具有足够的精度。 公开了一种通过使用压印模板21上的对准光栅24和衬底20上的对准光栅23来确定压印模板21和衬底20之间的偏移的方法。 该方法包括使压印模板对准光栅24和衬底对准光栅23足够靠近在一起，使得它们形成复合光栅，将对准辐射束引导到复合光栅，同时调制压印模板21和衬底20的相对位置 检测从复合光栅反射的对准辐射的发光强度，并通过分析所检测的发光强度的调制来确定偏移。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010098310A

公开(公告)日：2010-04-30

申请号：JP2009234675

申请日：2009-10-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70766 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To prevent misalignment resulting from residual strain in a substrate in a lithography apparatus.
SOLUTION: An imprint lithography apparatus and manufacturing method can lead to mechanical stress formed in a substrate to which an imprint pattern is applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a portion of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of the substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止由光刻设备中的基板中的残余应变引起的不对准。 压印光刻设备和制造方法可以导致在施加印记图案的基板中形成的机械应力。 这可能导致衬底内的应变，导致后续图案与衬底的一部分中的早期图案的未对准，其被应变。 公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。 这是通过从衬底保持器的相应部分局部松开衬底的一部分（包括可选地整个衬底）来实现的，使得导致局部应变的机械应力在进一步图案化之前可能会松弛。 为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006157020A

公开(公告)日：2006-06-15

申请号：JP2005344811

申请日：2005-11-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： AKHSSAY M HAMED ,  BASELMANS JOHANNES JACOBUS MAT ,  COMMISSARIS FRANCISCUS ANTONIU ,  DE GROOT SIMON ,  JEUNINK ANDRE BERNARDUS ,  TEL WIM TJIBBO ,  VAN DER HOFF ALEXANDER HENDRIK ,  VAN DE STADT ARNOUT

IPC: H01L21/027

CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/706

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection device and a device manufacturing method using the same. SOLUTION: The lithography projection device has a measurement system which measures changes of the projection system aberration with time, and a prediction/control system which predicts changes of the projection system aberration with time based on a parameter and generates a control signal to compensate characteristics of the device changing with time, such as OLV values and FOC values of lenses of the projection system. An in-line model identification system is provided to predict model parameter errors based on projection system aberration values provided by the prediction/control system and measured projection system aberration values provided by the measurement system. A replacement system replaces the model parameter of the prediction/control system by utilizing the model parameter errors to keep the characteristics changing with time in the range of an allowable performance standard. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 解决的问题：提供一种光刻投影装置及使用其的装置制造方法。 解决方案：光刻投影装置具有测量投影系统像差随时间变化的测量系统，以及基于参数预测投影系统像差随时间变化的预测/控制系统，并产生控制信号 补偿设备随时间变化的特性，例如投影系统的镜头的OLV值和FOC值。 提供了一种在线模型识别系统，用于基于由预测/控制系统提供的投影系统像差值和由测量系统提供的测量的投影系统像差值来预测模型参数误差。 替代系统通过利用模型参数误差来代替预测/控制系统的模型参数，以使特性随时间变化在允许的性能标准的范围内。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011037261A

公开(公告)日：2011-02-24

申请号：JP2010147035

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  RENKENS MICHAEL JOZEF MATHIJS ,  GERARD VAN SCHOTHORST ,  DIJKSMAN JOHAN FREDERIK ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  KOEVOETS ADRIANUS HENDRIK ,  DE SCHIFFART CATHARINUS ,  WUISTER SANDER FREDERIK

IPC: B29C59/02 ,  B81C99/00 ,  H01L21/027

CPC classification number: G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography apparatus and a method. SOLUTION: This imprint lithography apparatus includes: an imprint template holder 22 which is constituted in a manner to hold an imprint template 20; and a plurality of position sensors 28 which are constituted in a manner to measure the variation of the size and/or shape of the imprint template 20, and the position sensors 28 are mechanically separated from the imprint template 20. In addition, the imprint template 20 is used in order to imprint a pattern on a board 34, and the variation of the size and/or shape of the imprint template 20 are measured while the pattern is imprinted on the board 34 by this lithography method. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的压印光刻设备和方法。 解决方案：该压印光刻设备包括：压印模板保持器22，其以保持压印模板20的方式构成; 以及以测量压印模板20的尺寸和/或形状的变化的方式构成的多个位置传感器28，并且位置传感器28与压印模板20机械分离。此外，压印模板 20用于在板34上印刷图案，并且通过该光刻方法在图案印刷在板34上的同时测量压印模板20的尺寸和/或形状的变化。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010272860A

公开(公告)日：2010-12-02

申请号：JP2010109724

申请日：2010-05-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE SCHIFFART CATHARINUS ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  JANSEN NORBERT ERWIN THERENZO

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: PROBLEM TO BE SOLVED: To provide a novel or substitutional structure suitable for holding, moving or deforming an imprint template structure by being used in an imprint lithography apparatus. SOLUTION: A structure suitable for being used in an imprint lithography apparatus is disclosed. The structure includes: a support structure arranged to support an imprint template structure; a first actuator structured to apply force to the imprint template structure; and a second actuator mounted to the support structure, arranged to extend between the support structure and the imprint template structure in use, structured to apply force to the imprint template structure, and having a movement range larger than that of the first actuator. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于通过在压印光刻设备中使用来保持，移动或变形压印模板结构的新颖或替代结构。 解决方案：公开了适用于压印光刻设备的结构。 该结构包括：支撑结构，其布置成支撑压印模板结构; 构造成对压印模板结构施加力的第一致动器; 以及安装到所述支撑结构的第二致动器，其布置成在使用中在所述支撑结构和所述压印模板结构之间延伸，被构造成向所述压印模板结构施加力并且具有大于所述第一致动器的移动范围的移动范围。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010067969A

公开(公告)日：2010-03-25

申请号：JP2009204211

申请日：2009-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  SMITS PASCAL ANTONIUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  DE SCHIFFART CATHARINUS

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7049

Abstract: PROBLEM TO BE SOLVED: To describe a method for determining the position of a substrate relative to an imprint template. SOLUTION: The imprint template has at least three gratings, the substrate has at least three gratings, positioned such that each imprint template grating forms a composite grating with an associated substrate grating with each imprint template grating, and at least three imprint template gratings and the associated substrate gratings have offsets relative to one another. The method includes steps of detecting an intensity of radiation which is reflected by the three composite gratings; and using the detected intensity to determine a displacement of the substrate or imprint template from a position. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：描述用于确定衬底相对于压印模板的位置的方法。 解决方案：压印模板具有至少三个光栅，衬底具有至少三个光栅，定位成使得每个压印模板光栅形成具有每个压印模板光栅的相关衬底光栅的复合光栅，以及至少三个压印模板 光栅和相关的衬底光栅相对于彼此具有偏移。 该方法包括检测由三个复合光栅反射的辐射强度的步骤; 并且使用检测到的强度来确定基板或压印模板从位置的位移。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005216872A

公开(公告)日：2005-08-11

申请号：JP2003417887

申请日：2003-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEVASIER LEON M ,  DEN BOEF ARIE JEFFREY ,  DIRNSTORFER INGO ,  JEUNINK ANDRE BERNARDUS ,  KRUIJSWIJK STEFAN G ,  PELLEMANS HENRICUS PETRUS MARI ,  SETIJA IRWAN DANI ,  TOLSMA HOITE PIETER THEODOOR

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection system performing alignment using a small size alignment structure and/or a reference structure while sustaining the capturing range or the error strength. SOLUTION: The lithography system comprises an alignment subsystem (21) for aligning substrates (W) for a mask (MA), the alignment structure (10) includes an acyclic formulation (15) detectable as a capturing position or a check position between phase grating parts (11) and (12) of the same periodicity using a reference grating (26) in the alignment subsystem (21). It causes phase effect or amplitude effect in a detected signal of the alignment subsystem (21). The alignment structure can be made thin enough to enter a scribe lane and effective area of the substrate is not reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在保持捕获范围或误差强度的同时使用小尺寸对准结构和/或参考结构进行对准的光刻投影系统。 解决方案：光刻系统包括用于对准用于掩模（MA）的衬底（W）的对准子系统（21），对准结构（10）包括可检测为捕获位置的无环制剂（15）或检查位置 在对准子系统（21）中使用参考光栅（26）在相位光栅部分（11）和（12）之间相同的周期。 它在对准子系统（21）的检测信号中引起相位效应或幅度效应。 可以使对准结构足够薄以进入划线，并且不减少基板的有效面积。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012049532A

公开(公告)日：2012-03-08

申请号：JP2011178719

申请日：2011-08-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  EUSSEN EMIEL JOZEF MELANIE ,  JEUNINK ANDRE BERNARDUS ,  ROBBERT EDGAR VAN LEEUWEN

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a stage device including a measurement system of high accuracy.SOLUTION: A measurement system configured to measure a position dependent signal of an object table comprises: at least one sensor attachable on the object table; an sensor target object attachable on a substantially stationary frame. The measurement system is an attachment device configured to attach the sensor target object on the substantially stationary frame. The measurement system also comprises a compensator to compensate movement and/or modification of the sensor target object in relation to the substantially stationary frame. The compensator can comprises a passive or active damper and/or a feedback position controller. In an alternative embodiment, the compensator comprises a gripping device to fix the position of the sensor target object while an movable object is moved with high accuracy.

Abstract translation: 要解决的问题：提供一种包括高精度的测量系统的舞台装置。 解决方案：被配置为测量对象台的与位置相关的信号的测量系统包括：至少一个可附着在所述对象台上的传感器; 传感器目标物体可附接在基本上固定的框架上。 测量系统是被配置为将传感器目标物体附接在基本上固定的框架上的附接装置。 测量系统还包括补偿器，用于相对于基本上固定的框架补偿传感器目标物体的移动和/或修改。 补偿器可以包括无源或主动阻尼器和/或反馈位置控制器。 在替代实施例中，补偿器包括夹持装置，用于固定传感器目标物体的位置，同时可移动物体以高精度移动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011097051A

公开(公告)日：2011-05-12

申请号：JP2010236003

申请日：2010-10-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  DEN BOEF ARIE JEFFREY ,  JEUNINK ANDRE BERNARDUS

IPC: H01L21/027 ,  B29C33/38 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To improve an alignment mark of an imprint template. SOLUTION: The imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：改进压印模板的对准标记。 压印光刻模板设置有对准标记，其中对准标记由具有与压印光刻模板的折射率不同的折射率的介电材料形成，该电介质材料具有这样的厚度 它提供已经通过电介质材料的对准辐射和未通过电介质材料的对准辐射之间的相位差。 版权所有（C）2011，JPO＆INPIT