-
公开(公告)号：JP2005005707A
公开(公告)日：2005-01-06
申请号：JP2004169275
申请日：2004-06-08
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI
-
公开(公告)号：JP2004289127A
公开(公告)日：2004-10-14
申请号：JP2003417260
申请日：2003-11-11
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI
-
公开(公告)号：JP2010161421A
公开(公告)日：2010-07-22
申请号：JP2010097301
申请日：2010-04-20
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA MARIA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT
-
公开(公告)号：JP2007142460A
公开(公告)日：2007-06-07
申请号：JP2007038065
申请日：2007-02-19
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOF JOERI , ANTONIUS THEODORUS ANNA MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , G03F9/00
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which a space between the substrate and projection system is filled with a liquid while minimizing the volume of the liquid that must be accelerated during stage movements. SOLUTION: In the lithographic projection apparatus, a seal member surrounds a space between the final element of the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between the seal member and the surface of the substrate to contain the liquid in the space. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段移动期间必须加速的液体的体积。 解决方案：在光刻投影装置中，密封构件围绕投影系统的最终元件与光刻投影装置的基板台之间的空间。 在密封构件和基板的表面之间形成气体密封，以在空间中容纳液体。 版权所有（C）2007，JPO＆INPIT
-
公开(公告)号：JP2010135857A
公开(公告)日：2010-06-17
申请号：JP2010059726
申请日：2010-03-16
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOF JOERI , ANTONIUS THEODORUS ANNA MARIA DERKSEN , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , G03F9/00
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段操作期间需要加速的液体的量。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的平面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2010，JPO＆INPIT
-
Patent Agency Ranking
公开(公告)号：JP2007208279A
公开(公告)日：2007-08-16
申请号：JP2007065471
申请日：2007-03-14
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT
-
公开(公告)号：JP2004289126A
公开(公告)日：2004-10-14
申请号：JP2003417259
申请日：2003-11-11
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： LOF JOERI , ANTONIUS THEODORUS ANNA MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: G03F7/20 , G03F9/00 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI
-
公开(公告)号：JP2010212713A
公开(公告)日：2010-09-24
申请号：JP2010102149
申请日：2010-04-27
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOF JOERI , BIJLAART ERIK THEODORUS MARIA , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MERTENS JEROEN JOHANNES SOPHIA M , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , SCHAIK FRANK VAN , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projector in which the space between a final element of a projecting system and a substrate is filled with a liquid. SOLUTION: An edge sealing member 17 surrounds at least a part of a substrate W or other objects on a substrate table WT to prevent catastrophic liquid loss, when the edge of the substrate is imaged or illuminated. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光刻投影仪，其中投影系统的最终元件和基板之间的空间被填充液体。 解决方案：当基板的边缘成像或照明时，边缘密封构件17围绕基板W或基板台WT上的其它物体的至少一部分，以防止灾难性的液体损失。 版权所有（C）2010，JPO＆INPIT
-
公开(公告)号：JP2007235179A
公开(公告)日：2007-09-13
申请号：JP2007159104
申请日：2007-06-15
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT
-
公开(公告)号：JP2004289117A
公开(公告)日：2004-10-14
申请号：JP2003374968
申请日：2003-09-29
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： KURT RALPH , KOLESNYCHENKO ALEKSEY
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70883 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a lithograph projector being employed effectively in both DUV and EUV lithographs and having a means for controlling molecular contamination in situ.
SOLUTION: The lithograph projector comprises a mechanism for supplying a projection radiation beam, a structure supporting a member for patterning the projection beam according to a desired pattern, and a mechanism for projecting a patterned beam to a target part of a substrate.
COPYRIGHT: (C)2005,JPO&NCIPI
-
-
-
-
-
-
-
-
-
Search Results
17
records
(took 0.031 seconds)
