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    Lithography system, method of manufacturing device, and device manufactured thereby
    4.
    发明专利
    Lithography system, method of manufacturing device, and device manufactured thereby 审中-公开
    光刻系统，制造方法及其制造方法

    公开(公告)号：JP2003068637A

    公开(公告)日：2003-03-07

    申请号：JP2002170092

    申请日：2002-06-11

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KROON MARK ,  VAN DER WERF JAN EVERT ,  KOK HAICO VICTOR

    IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F9/7088 ,  G03F7/706 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To provide an image-sensing device having several sensors that can be positioned very close to each other, so that the dimension of the arranging area of the sensors may become small and the detecting structures of the sensors. SOLUTION: A lithographic projection apparatus includes a radiation system, a pattern-forming means supporting structure, a substrate table, a projecting system which projects a beam upon substrates, and the image sensing device. The image-sensing device includes a slab, provided at least with one radiation sensitive sensor on its first side face and a film made of a material, that does not transmit the radiation of the projected beam. The image-sensing sensor is integrated with the slab and responds to the radiation of the projected beam, and the film is provided on the first side face of the slab to cover the sensor and has a division patterned, to selectively transmit the radiation of the projected beam to the sensor on the sensor. The slab is mounted on the slab bearing surface of an intermediate plate by its second surface on a side opposite to its first surface.

    Abstract translation: 要解决的问题：为了提供具有可以彼此非常接近的几个传感器的图像感测装置，使得传感器的布置区域的尺寸变小并且传感器的检测结构变小。 解决方案：光刻投影装置包括辐射系统，图案形成装置支撑结构，衬底台，将光束投射到基板上的投影系统和图像感测装置。 图像感测装置包括在其第一侧面上至少设置有一个辐射敏感传感器的板坯和不透射投射光束的辐射的材料制成的薄膜。 图像感测传感器与平板一体化并响应于投影光束的辐射，并且膜被设置在板的第一侧面上以覆盖传感器并且具有分割图案化，以选择性地传输辐射 投射到传感器上的传感器。 板坯通过其第二表面在与其第一表面相对的一侧上安装在中间板的板坯承载表面上。

    Radiation system, lithography device, manufacturing method for device, and device manufactured by them
    9.
    发明专利
    Radiation system, lithography device, manufacturing method for device, and device manufactured by them 审中-公开
    辐射系统，光刻设备，器件的制造方法及其制造的器件

    公开(公告)号：JP2006140470A

    公开(公告)日：2006-06-01

    申请号：JP2005313735

    申请日：2005-10-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KROON MARK

    IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  G03F7/7005 ,  G03F7/702 ,  G03F7/70208

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation system which has a large turnout, and radiates a reduced out-of-band radiation amount and a reduced amount of high-speed particles which may possibly sputter downstream matters.
    SOLUTION: The radiation system to multiplex radiations contains two sub-radiation sources. The sub-radiation sources each supply a specific amount of radiation. The system further contains a member equipped with reflecting surfaces. The surfaces receive the radiations from the sub-radiation sources, and are arranged so as to combine the radiations. The sub-radiation sources can operate simultaneously or alternately. The surfaces can function as filtering and magnifying (demagnifying).
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种具有大的岔口的辐射系统，并且辐射减少的带外辐射量和减少量的可能溅射下游物质的高速颗粒。 解决方案：用于复用辐射的辐射系统包含两个子辐射源。 子辐射源各自提供特定量的辐射。 该系统还包括配备有反射表面的构件。 表面接收来自子辐射源的辐射，并且被布置成组合辐射。 子辐射源可以同时或交替地操作。 表面可以作为过滤和放大（缩小）。 版权所有（C）2006，JPO＆NCIPI

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