公开(公告)号：JP2006313904A

公开(公告)日：2006-11-16

申请号：JP2006123549

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LE ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER TOORN JAN-GERARD CORNE ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006140498A

公开(公告)日：2006-06-01

申请号：JP2005327405

申请日：2005-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  HENDRIK SMULDERS PATRICK J C ,  SMITS PETER ,  HAGE EDWARD ,  VAN DER TOORN JAN-GERARD CORNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. SOLUTION: For example, a closing member 30 is used to receive liquid in a liquid confinement structure 12 while the substrate is replaced on a substrate table WT2 in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one more pins, or a pressure source, is employed to move the member 30 to or from the structure 12. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够在基板更换期间将投影系统的光学元件保持在湿润状态的光刻设备，并提供一种器件制造方法。 解决方案：例如，封闭构件30用于在液体限制结构12中接收液体，同时在浸没式光刻设备中的衬底台WT2上更换衬底。 例如，采用使用一个或多个板簧和一个或多个电磁体的组合的闭合构件移动机构，或者一个或多个致动器和一个以上的销的组合或压力源的组合，以将构件30移动到 调节板用于补偿不同基底上不同深度的封闭构件容器中封闭构件的变化厚度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2007194613A

公开(公告)日：2007-08-02

申请号：JP2006343648

申请日：2006-12-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device in which cooling is reduced when getting out an immersion liquid. SOLUTION: A capillary channel 20 is formed between a substrate holder WH and an edge structure 15. A plurality of electrodes 21, 22, 23 and 24 are arranged along the capillary channel 20, and the electrodes become lyophilic when it is charged. By using the electrodes, drops of liquid are separated, or the liquid can be pumped along the capillary channel. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸出式光刻装置，其中当脱出浸液时冷却降低。 解决方案：毛细管通道20形成在衬底保持器WH和边缘结构15之间。多个电极21,22,23和24沿着毛细通道20布置，并且当电极被充电时电极变得亲液 。 通过使用电极，分离液滴，或者可以沿着毛细通道泵送液体。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007150308A

公开(公告)日：2007-06-14

申请号：JP2006315814

申请日：2006-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography.
SOLUTION: In the immersion lithography, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography may further comprise an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液中的气泡的存在对浸没式光刻中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻中，可以通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板覆盖物来减小或防止浸没液体中的气泡的形成 差距。 浸没式光刻可以进一步包括致动器，该致动器在物体与液体接触时使物体在支撑台的孔中横向移动，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007013152A

公开(公告)日：2007-01-18

申请号：JP2006176047

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus capable of suppressing the conveyance of contaminants, stray light, temperature gradients and/or the effect of air bubbles on imaging quality; and to provide a method of manufacturing a device. SOLUTION: There is disclosed an immersion lithographic apparatus supplying a liquid to a space between a projection system and a substrate, and provided with a plate structure for dividing the space into two parts. The plate structure has an opening for permitting the transmission of projection beams, a through-hole for suppressing a damping effect due to the existence of the plate, and optionally one or a plurality of inlets and outlets for providing various flows to the circumference of the opening of the plate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够抑制污染物的传播，杂散光，温度梯度和/或气泡对成像质量的影响的光刻投影设备; 并提供一种制造装置的方法。 解决方案：公开了一种将液体供应到投影系统和基板之间的空间的浸没式光刻设备，并且设置有用于将空间分成两部分的板结构。 板结构具有用于允许透射投影光束的开口，用于抑制由于板的存在而引起的阻尼效应的通孔，以及可选地一个或多个入口和出口，用于向 开盘。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2009302594A

公开(公告)日：2009-12-24

申请号：JP2009227369

申请日：2009-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method, capable of reducing the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on an imaging quality. SOLUTION: In a liquid immersion lithography apparatus, liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of a projection beam, has through-holes to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供能够降低污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响的光刻设备和设备制造方法。 解决方案：在液浸光刻设备中，将液体供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影束的孔，具有通孔以减少板的存在的阻尼效应，并且可选地具有一个或多个入口和出口以提供围绕板中的孔的各种流动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009200494A

公开(公告)日：2009-09-03

申请号：JP2009037253

申请日：2009-02-20

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： SEWELL HARRY ,  BIJLAART ERIK THEODORUS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE ,  MEIJERS RALPH JOSEPH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G01F1/662 ,  G01F1/667 ,  G01N1/2226 ,  G03F7/70341 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide an environment control means for a buffer immersion device. SOLUTION: A system in which immersion fluid containing liquid is provided from the outside to isolate an environmental chamber of an immersion lithography device is disclosed. Furthermore, a system which uses a transducer which transmits and/or receives an acoustic signal to measure a flow rate and/or vapor concentration of gas is disclosed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于缓冲浸没装置的环境控制装置。 解决方案：公开了一种从外部提供含浸液体的系统，以隔离浸没式光刻设备的环境室。 此外，公开了一种使用发送和/或接收声信号以测量气体的流量和/或蒸汽浓度的换能器的系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009152582A

公开(公告)日：2009-07-09

申请号：JP2008305944

申请日：2008-12-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  KATE NICOLAAS TEN ,  STEVENS LUCAS HENRICUS JOHANNE ,  VAN DER HAM RONALD ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce the formation of unwanted droplets or to remove unwanted droplets of immersion liquid on one or more surfaces of an immersion lithographic apparatus. SOLUTION: The surface 20 is provided with a plurality of electrodes 21 and 22. Electrodes 21 of a first type are formed on or exposed to the surface 20 so that a droplet 23 of immersion liquid on the surface may be directly in contact with an electrode 21 of the first type. Accordingly, the electrode 21 of the first type may be electrically connected to the immersion liquid of the droplet 23. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：减少不想要的液滴的形成或将浸没液体的不想要的液滴去除在浸没式光刻设备的一个或多个表面上。 解决方案：表面20设置有多个电极21和22.第一类型的电极21形成在表面20上或暴露于表面20，使得表面上的浸没液体的液滴23可以直接接触 具有第一类型的电极21。 因此，第一类型的电极21可以电连接到液滴23的浸没液体。版权所有：（C）2009，JPO＆INPIT

公开(公告)号：JP2009141355A

公开(公告)日：2009-06-25

申请号：JP2008307659

申请日：2008-12-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ROGER JOHANNES MARIA HUBERTUS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOL ,  KATE NICOLAAS TEN ,  ROSET NIEK JACOBUS JOHANNES ,  FRANSISCUS MATHIJS JACOBS ,  GERARDUS ARNOLDUS HENDRICUS FR ,  REINDER WIETSE ROOS ,  MATTIJS HOGELAND

IPC: H01L21/027 ,  G03F7/207

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus having a system for removing liquid from an upper surface of a substrate table. SOLUTION: An immersion lithography projection apparatus is disclosed. The apparatus includes the substrate table for holding a substrate. The substrate table allows a liquid flow flowing from the substrate and traversing an end part of the upper surface of the substrate table. The apparatus also includes a groove for collecting the liquid under the end part of the substrate table. Several constructions are disclosed to improve collecting of the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有从衬底台的上表面去除液体的系统的设备。 解决方案：公开了一种浸没光刻投影装置。 该装置包括用于保持基板的基板台。 衬底台允许液体流从衬底流动并且穿过衬底台的上表面的端部。 该装置还包括用于收集液体在基底台的端部下方的凹槽。 公开了几种结构以改善液体的收集。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007013151A

公开(公告)日：2007-01-18

申请号：JP2006176038

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  LAMBERTUS DONDERS SJOERD NICOL ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  SERGEI SHULEPOV

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: PROBLEM TO BE SOLVED: To provide an immersion apparatus having an effective means of removing an immersion liquid from a surface. SOLUTION: A gas knife formed to dry the surface in an immersion type lithographic apparatus is optimized to remove a liquid by establishing a pressure gradient in a liquid film on the dried surface. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有从表面去除浸液的有效手段的浸没装置。 解决方案：在浸没型光刻设备中形成干燥表面的气刀被优化以通过在干燥的表面上的液膜中建立压力梯度来除去液体。 版权所有（C）2007，JPO＆INPIT