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    Lithography equipment, and method of manufacturing device
    1.
    发明专利
    Lithography equipment, and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008085370A

    公开(公告)日：2008-04-10

    申请号：JP2007324518

    申请日：2007-12-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is configured to project a desired pattern image on a substrate W held on a substrate table WT through liquid; in the surface of the substrate table, a gap 22 exists between the substrate table and the outer edge of the substrate, or between the substrate table and other component which comes in contact with the liquid during normal use; and a bubble holding device configured to hold bubbles 24 possibly generated in the gap is provided in the gap. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被配置为通过液体在保持在衬底台WT上的衬底W上投影所需图案图像; 在基板台的表面上，在正常使用之间，在基板台与基板的外边缘之间，或基板台与与液体接触的其它部件之间存在间隙22; 并且在所述间隙中设置气泡保持装置，所述气泡保持装置构造成保持可能在间隙中产生的气泡24。 版权所有（C）2008，JPO＆INPIT

    Lithography equipment
    2.
    发明专利
    Lithography equipment 有权

    公开(公告)号：JP2004207734A

    公开(公告)日：2004-07-22

    申请号：JP2003424900

    申请日：2003-12-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： GILISSEN NOUD JAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  LEENDERS MARTINUS HENDRIKUS AN

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

    CPC classification number: G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector decreasing deformation caused by contaminants and the severity of requirements for a plane surface against the rear surface of a plate with a projection and the front surface of a chuck simultaneously by using the plate with the projection between a removable item and a flexible member. SOLUTION: The lithography projector comprises a radiation system for supplying a projection beam of radiation, a supporting structure for supporting a patterning means of making the projection beam patternized by a desired pattern, a substrate table for supporting the substrate, and a projection system for projecting a patternized beam on a target section of the substrate. Further, the projector comprises at least one supporting structure providing at least one flexible member supporting the plate with the projection which supports the removable item used for the lithography projector. COPYRIGHT: (C)2004,JPO&NCIPI

    Lithography system and device manufacturing method
    3.
    发明专利
    Lithography system and device manufacturing method 审中-公开
    LITHOGRAPHY系统和器件制造方法

    公开(公告)号：JP2008022034A

    公开(公告)日：2008-01-31

    申请号：JP2007254085

    申请日：2007-09-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DE VEN BASTIAAN LAMBERTUS ,  HEERENS GERT-JAN ,  LANSBERGEN ROBERT GABRIEL M ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/00

    CPC classification number: G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography system which improves precision of an image projected on a substrate and reduces an idle time. SOLUTION: According to a viewpoint of the invention, a lithographic apparatus has a coupling system for positioning a patterning means with respect to a reticle stage. A projection system of a lithographic projection apparatus has an operation cycle including a projection phase in which a patterned beam is projected onto a target portion of the substrate and the reticle stage supports a patterning means, and an exchange phase in which the patterning means is exchanged and the coupling system positions the patterning means with respect to the reticle stage. The lithographic apparatus has an advantage that the coupling system is apart from the patterning means during the projection phase, so as to obtain the projection image with high accuracy. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种提高投射在基板上的图像的精度并减少空闲时间的光刻系统。 解决方案：根据本发明的观点，光刻设备具有用于相对于标线片台定位图案化装置的耦合系统。 光刻投影装置的投影系统具有操作周期，该操作周期包括投影阶段，其中图案化的光束投影到基板的目标部分上，并且标线片台支撑图案形成装置，以及交换阶段，其中图案形成装置被更换 并且联接系统相对于标线片台定位图案形成装置。 光刻设备具有在投影阶段期间耦合系统与图案化装置分离的优点，以便以高准确度获得投影图像。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    7.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2007013152A

    公开(公告)日：2007-01-18

    申请号：JP2006176047

    申请日：2006-06-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  LEENDERS MARTINUS HENDRIKUS AN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus capable of suppressing the conveyance of contaminants, stray light, temperature gradients and/or the effect of air bubbles on imaging quality; and to provide a method of manufacturing a device. SOLUTION: There is disclosed an immersion lithographic apparatus supplying a liquid to a space between a projection system and a substrate, and provided with a plate structure for dividing the space into two parts. The plate structure has an opening for permitting the transmission of projection beams, a through-hole for suppressing a damping effect due to the existence of the plate, and optionally one or a plurality of inlets and outlets for providing various flows to the circumference of the opening of the plate. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够抑制污染物的传播，杂散光，温度梯度和/或气泡对成像质量的影响的光刻投影设备; 并提供一种制造装置的方法。 解决方案：公开了一种将液体供应到投影系统和基板之间的空间的浸没式光刻设备，并且设置有用于将空间分成两部分的板结构。 板结构具有用于允许透射投影光束的开口，用于抑制由于板的存在而引起的阻尼效应的通孔，以及可选地一个或多个入口和出口，用于向 开盘。 版权所有（C）2007，JPO＆INPIT

    Lithography equipment and process for fabricating device
    8.
    发明专利
    Lithography equipment and process for fabricating device 有权
    雕刻设备和制作装置的过程

    公开(公告)号：JP2006313910A

    公开(公告)日：2006-11-16

    申请号：JP2006128497

    申请日：2006-05-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is arranged to project an image of desired pattern onto a substrate W held on a substrate table WT through liquid. A gap 22 exists in the surface of the substrate table between the substrate table and the outer edge of the substrate, or between the substrate table and other component touching the liquid during normal use. The lithography equipment is provided, in the gap, with a bubble holding device arranged to hold a bubble 24 possibly generated in the gap. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被布置成通过液体将所需图案的图像投影到保持在基板台WT上的基板W上。 在衬底台与衬底的外边缘之间，或在正常使用过程中，在衬底台和其他部件接触液体之间，衬底台表面上存在间隙22。 光刻设备在间隙中设置有气泡保持装置，其被布置成保持可能在间隙中产生的气泡24。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus and device manufacturing method
    9.
    发明专利
    Lithography apparatus and device manufacturing method 审中-公开
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2005203754A

    公开(公告)日：2005-07-28

    申请号：JP2004353616

    申请日：2004-12-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  BARTRAY PERTRUS R ,  BOX WILHELMUS JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MARIA VAN DER WIJST MARC W

    IPC: G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70858

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method that improves thermal loading.
    SOLUTION: The lithography apparatus, which has an illumination system IL, a support structure MT supporting a patterning means M, a substrate table WT holding a substrate W, a projecting system PL that projects a patterned beam onto a target part of the substrate W, and a reference frame MF wherein at least one of position sensors IF at least for either one of the patterning means M and the substrate W, and the projection system PL are located, has a heat transport system HT-PL/HT-MF that thermally interacts with at least either one of the projection system PL and the reference frame MF, and transports heat at least to or from either one of the projection system PL and the reference frame MF. The heat transport system HT-PL/HT-MF is joined to another frame mechanically separated from the reference frame.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提高热负荷的光刻设备和设备制造方法。 解决方案：具有照明系统IL的光刻设备，支持图案形成装置M的支撑结构MT，保持衬底W的衬底台WT，将图案化的光束投射到目标部分上的投影系统PL 基板W和参考框架MF，其中位于图案形成装置M和基板W中的任一个的位置传感器IF和投影系统PL中的至少一个具有热传输系统HT-PL / HT- MF与投影系统PL和参考框架MF中的至少一个热相互作用，并且至少传送至投影系统PL和参考框架MF中的任一个。 热传输系统HT-PL / HT-MF连接到与参考框架机械分离的另一个框架。 版权所有（C）2005，JPO＆NCIPI

    Lithographic system, method of manufacturing device, and device manufactured by the method
    10.
    发明专利
    Lithographic system, method of manufacturing device, and device manufactured by the method 有权
    光刻系统，制造装置的方法以及由该方法制造的装置

    公开(公告)号：JP2005045253A

    公开(公告)日：2005-02-17

    申请号：JP2004212414

    申请日：2004-07-21

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DE VEN BASTIAAN LAMBERTUS ,  HEERENS GERT-JAN ,  LANSBERGEN ROBERT GABRIEL M ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF

    IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic system that improves the accuracy of images projected upon a substrate and, at the same time, is shortened in idling time. SOLUTION: The lithographic system is provided with a coupling system which positions a patterning means with respect to a reticle stage. The projecting system of the lithographic system has an operation cycle containing a projecting phase in which a patterned beam is projected upon the target portion of a substrate. The reticle stage supports the patterning means and an exchanging phase in which the patterning means is exchanged with another patterning means. The coupling system positions the exchanged patterning means with respect to the reticle stage. Since the coupling system is separated from the patterning means during the projecting phase, more accurate projected images can be obtained. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提高投影在基板上的图像的精度的光刻系统，同时在空转时间上缩短。 解决方案：光刻系统设有耦合系统，其将图案化装置相对于掩模版台定位。 光刻系统的投影系统具有包含投影相位的操作周期，其中图案化的光束投影到基板的目标部分上。 刻线台支撑图形装置和交换阶段，其中图形装置与另一图案形成装置交换。 耦合系统将交换的图案形成装置相对于标线片台定位。 由于耦合系统在投影阶段与图案化装置分离，所以可以获得更准确的投影图像。 版权所有（C）2005，JPO＆NCIPI

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