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    Method and system for lithographic gray scaling
    1.
    发明专利
    Method and system for lithographic gray scaling 有权
    用于灰度灰度分级的方法和系统

    公开(公告)号：JP2006191099A

    公开(公告)日：2006-07-20

    申请号：JP2005378942

    申请日：2005-12-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOF JOERI ,  DE JAGER PIETER WILLEM HERMAN ,  JOANNES THEODOOR DE SMIT

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70283

    Abstract: PROBLEM TO BE SOLVED: To provide an improved gay scaling imaging method and a system. SOLUTION: The Improved gray scaling imaging method and the system include a group of elements within an array of individually controllable elements that make a part of a radiation beam project to a lens in an array 302 of microlenses and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供改进的同性恋缩放成像方法和系统。 改进的灰度成像方法和系统包括使得辐射束的一部分投影到微透镜阵列302中的透镜的独立可控元件的阵列内的一组元件，并且是单独可控的，使得 可以打开或关闭任何数量的可单独控制的元件以产生灰度级。 版权所有（C）2006，JPO＆NCIPI

    Calibration method, calibration substrate, lithographic apparatus and device manufacturing method
    3.
    发明专利
    Calibration method, calibration substrate, lithographic apparatus and device manufacturing method 有权
    校准方法，校准基板，平面设备和器件制造方法

    公开(公告)号：JP2003297743A

    公开(公告)日：2003-10-17

    申请号：JP2003100901

    申请日：2003-02-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOF JOERI ,  VAN BUEL HENRICUS WILHELMUS MA ,  GUI CHENG-QUN ,  BIJNEN FRANSISCUS GODEFRIDUS C

    IPC: G03F9/02 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F9/7019 ,  G03F9/7011 ,  G03F9/7084

    Abstract: PROBLEM TO BE SOLVED: To provide a method which is used when a device having circuit patterns on both sides of a substrate is manufactured by using a lithographic projection apparatus, and is used in order to calibrate an alignment system for aligning the patterns on both sides with required alignment precision.
    SOLUTION: A constitution procedure uses a calibration substrate HW which has reference markers WM1, WM3 on opposite sides and is transparent to an alignment beam. The position of the surface side reference marker WM3 is determined by an ordinary method. The position of the rear side reference marker WM1 is determined by the alignment beam penetrating the calibration substrate HW. In order to compensate for the shift in the focal position of the marker WM1 relating to the marker WM3, a planar plate 50 is arranged on the calibration substrate HW, in such a manner that the marker WM1 is seen on a plane in front of the calibration substrate HW. Thus the procedure which can be understood directly and easily is provided.
    COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题：提供一种当通过使用光刻投影装置制造具有基板两侧的电路图案的装置时使用的方法，并且用于校准用于对准图案的对准系统 在两侧需要对准精度。 解决方案：结构程序使用校准基板HW，其具有在相对侧上的参考标记WM1，WM3并且对准光束是透明的。 表面侧参考标记WM3的位置由普通方法确定。 后侧参考标记WM1的位置由穿过校准基板HW的对准光束确定。 为了补偿与标记WM3相关的标记WM1的焦点位置的偏移，平面板50以这样的方式被布置在校准基板HW上，使得在标记WM1的前方的平面上看到标记WM1 校准基板HW。 因此，可以直接且容易地理解的程序。 版权所有（C）2004，JPO

    Lithography apparatus and method for manufacturing device
    10.
    发明专利
    Lithography apparatus and method for manufacturing device 有权
    LITHOGRAPHY设备和制造设备的方法

    公开(公告)号：JP2006024924A

    公开(公告)日：2006-01-26

    申请号：JP2005189495

    申请日：2005-06-29

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LOF JOERI ,  JOANNES THEODOOR DE SMIT

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70275

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having projection beams of uniform intensity, and to provide a method for manufacturing a device. SOLUTION: An illumination system for supplying projection radiation beams, an array of plural elements capable of being controlled individually for patterning projection radiation beams, a projection system for projecting patterned beams on a target plane, and a substrate table for supporting the substrate, such that the target surface of the substrate coincides with the target plane are comprised; and the projection system comprises an array of plural lenses configured such that the individual lenses receive the individual parts of the patterned beams and gathers them. The apparatus comprises a sensor system for detecting the intensity distribution of the projection radiation pattern and an alignment system, capable of controlling such that the position and/or orientation of at least one of the array of plural elements, the components of the projection system, and the illumination system is adjusted on the basis of the detection result. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供具有均匀强度的投影光束的光刻设备，并提供一种用于制造器件的方法。 解决方案：一种用于提供投影辐射束的照明系统，能够单独控制的多个元件的阵列，用于图案化投影辐射束，用于在目标平面上投影图案化束的投影系统，以及用于支撑衬底的衬底台 使得基板的目标表面与靶平面重合; 并且投影系统包括多个透镜的阵列，其被配置为使得各个透镜接收图案化的光束的各个部分并收集它们。 该装置包括用于检测投影辐射图案的强度分布的传感器系统和对准系统，其能够控制使得多个元件的阵列，投影系统的组件中的至少一个的位置和/ 并根据检测结果对照明系统进行调整。 版权所有（C）2006，JPO＆NCIPI

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