公开(公告)号：JP2008258613A

公开(公告)日：2008-10-23

申请号：JP2008085232

申请日：2008-03-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK R ,  COX HENRIKUS HERMAN MARIE ,  MERTENS JEROEN JOHANNES SOPHIA ,  SIMONS WILHELMUS FRANCISCUS JO ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

Abstract: PROBLEM TO BE SOLVED: To provide a position control system for a lithographic device in which an accuracy of positioning a target portion with respect to a lens column or a projection system may be improved. SOLUTION: The position control system for a substrate support of a lithographic device includes a position measurement system constructed to specify a position of a sensor or a sensor target on the substrate support, a controller constructed to provide a control signal based on a desired position of a target portion of the substrate and the specified position, and one or more actuators constructed to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, which includes a relation between a difference in a change in a position of the target portion and a change in position of the sensor or sensor target, as a result of a force exerted on the substrate support. The position control system is constructed to substantially correct the position of the target portion using the stiffness compensation model at least during projection of a patterned radiation beam on the target portion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻设备的位置控制系统，其中可以提高目标部分相对于透镜柱或投影系统的定位精度。 解决方案：用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，其被构造成指定传感器或传感器目标在基板支撑件上的位置;控制器，被构造成提供基于 基板的目标部分和指定位置的期望位置，以及构造成作用在基板支撑件上的一个或多个致动器。 位置控制系统包括基板支撑件的刚度补偿模型，其包括目标部分的位置变化的差异与传感器或传感器目标的位置变化之间的关系，作为施加的力 在基板支撑上。 位置控制系统被构造成至少在图案化的辐射束在目标部分的投影期间使用刚度补偿模型来基本上校正目标部分的位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008085370A

公开(公告)日：2008-04-10

申请号：JP2007324518

申请日：2007-12-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS AN ,  MERTENS JEROEN JOHANNES SOPHIA ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment suitable for preventing or reducing generation of bubbles by preventing bubbles from leaking to a radiation beam passage through one or more gaps in a substrate table, or by extracting bubbles possibly generated in the gap. SOLUTION: The lithography equipment is configured to project a desired pattern image on a substrate W held on a substrate table WT through liquid; in the surface of the substrate table, a gap 22 exists between the substrate table and the outer edge of the substrate, or between the substrate table and other component which comes in contact with the liquid during normal use; and a bubble holding device configured to hold bubbles 24 possibly generated in the gap is provided in the gap. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过防止气泡通过衬底台中的一个或多个间隙而泄漏到辐射束通道中，或通过提取可能在间隙中产生的气泡来提供适于防止或减少气泡产生的浸没式光刻设备 。 解决方案：光刻设备被配置为通过液体在保持在衬底台WT上的衬底W上投影所需图案图像; 在基板台的表面上，在正常使用之间，在基板台与基板的外边缘之间，或基板台与与液体接触的其它部件之间存在间隙22; 并且在所述间隙中设置气泡保持装置，所述气泡保持装置构造成保持可能在间隙中产生的气泡24。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007208279A

公开(公告)日：2007-08-16

申请号：JP2007065471

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006313904A

公开(公告)日：2006-11-16

申请号：JP2006123549

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LE ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER TOORN JAN-GERARD CORNE ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006165550A

公开(公告)日：2006-06-22

申请号：JP2005347652

申请日：2005-12-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，其能够在不改变在光刻设备的投影系统和基板之间流动的液体的方向的方向上移动基板，而在具有液体供应的光刻设备中 系统。 解决方案：该光刻设备具有用于将液体供应到光刻设备的投影系统与基板之间的空间的输入端口和用于去除至少一部分液体的输出端口。 光刻设备具有一个液体供应系统，用于围绕基本上垂直于衬底的曝光平面的轴线旋转输入端口和输出端口中的任何一个或两个。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009188421A

公开(公告)日：2009-08-20

申请号：JP2009093214

申请日：2009-04-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a liquid supply system, wherein a substrate can be moved in different directions without switching a direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate. SOLUTION: The immersion lithographic apparatus includes a liquid supply system which has an inlet configured to supply the liquid to a space between the projection system of the lithographic apparatus and the substrate and an outlet configured to remove at least a part of the liquid and is configured to rotate the inlet, the outlet, or both of them about an axis substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有液体供应系统的光刻设备，其中可以在不改变在光刻设备的投影系统和基板之间流动的液体的方向的不同方向上移动基板。 浸没式光刻设备包括液体供应系统，该液体供应系统具有入口，该入口构造成将液体供应到光刻设备的投影系统与基板之间的空间，以及出口，该出口构造成去除液体的至少一部分 并且被配置为使入口，出口或两者围绕基本上垂直于衬底的曝光平面的轴线旋转。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009088563A

公开(公告)日：2009-04-23

申请号：JP2009000117

申请日：2009-01-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce the occurrence of residual liquid on the substrate and/or substrate table after the exposure of a substrate, in an immersion type lithographic apparatus. SOLUTION: In immersion lithography, after the exposure of a substrate is completed, a detector is used for detecting residual liquid that remains on the substrate and/or substrate table. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：在浸没式光刻设备中，为了防止或减少在曝光基板之后在基板和/或基板台上残留液体的出现。 解决方案：在浸没式光刻中，在完成基板曝光之后，使用检测器来检测残留在基板和/或基板台上的残余液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009076940A

公开(公告)日：2009-04-09

申请号：JP2008328259

申请日：2008-12-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To disclose and provide an apparatus that is equipped with a substrate table for supporting substrate. SOLUTION: A supporting table includes a plurality of supporting protrusions, coming into contact with a substrate when used to support the substrate. This support table includes a plurality of heat transfer protrusions, extending toward the substrate without making contact with the substrate, when the substrate is supported by the supporting protrusions during use. A heat exchange gap, containing a gas for exchanging heat with the substrate, extends between the heat transfer protrusions and the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：公开并提供装备有用于支撑基板的基板台的装置。 解决方案：支撑台包括多个支撑突起，当用于支撑基板时与支撑基板接触。 该支撑台包括多个传热突起，当基板在使用期间由支撑突起支撑时，朝向基板延伸而不与基板接触。 包含用于与衬底交换热量的气体的热交换间隙在传热突起和衬底之间延伸。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008227548A

公开(公告)日：2008-09-25

申请号：JP2008161756

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: A cleaning fluid can be introduced into a space between a projection system and a substrate table of the lithographic apparatus by especially using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗浸没式光刻设备内部的方法和装置。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT