公开(公告)号：JP2010258470A

公开(公告)日：2010-11-11

申请号：JP2010151194

申请日：2010-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE SMIT JOANNES THEODOOR ,  BANINE VADIM YEVGENYEVICH ,  BISSCHOPS THEODORUS HUBERTUS J ,  MODDERMAN THEODORUS MARINUS ,  DIERICHS MARCLE MATHIJS T M

IPC: H01L21/027 ,  B01D19/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/708 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To improve the lithography performance of an apparatus having a liquid that fills the space between a final element of a projection system and a substrate. SOLUTION: A lithographic apparatus and a device manufacturing method make use of a high-refractive index liquid, confined in a reservoir 13, at least partly filling a lithography field between a final element of a projection lens and the substrate. Bubbles forming in the liquid resulting from dissolved atmospheric gases or the gas discharge from an apparatus element exposed to the liquid are detected and removed so that they do not interfere with the exposure, to cause burning defects on the substrate. The detection can be carried out, by measuring the frequency dependence of ultrasonic attenuation in the liquid and the removal of bubbles can be implemented by: degassing and pressurizing the liquid; isolating the liquid from the atmosphere; supplying a continuous flow of liquid through the lithography field using liquids of low surface tension; and further, phase-shifting the ultrasonic standing-wave nodes. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提高具有填充投影系统的最终元件和基板之间的空间的液体的装置的光刻性能。 解决方案：光刻设备和器件制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基底之间的光刻场。 检测并除去由溶解的大气气体引起的液体中形成的气泡或暴露于液体的装置元件的气体排出，使得它们不干扰曝光，引起基板上的燃烧缺陷。 可以通过测量液体中超声波衰减的频率依赖性进行检测，并且可以通过以下方式实现气泡的去除：对液体进行脱气和加压; 从大气隔离液体; 使用低表面张力的液体通过光刻领域提供连续的液体流; 并且进一步移相超声波驻波节点。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010109378A

公开(公告)日：2010-05-13

申请号：JP2009287423

申请日：2009-12-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MODDERMAN THEODORUS MARINUS ,  VAN ASTEN NICOLAAS ANTONIUS ALLEGONDUS JOHANNES ,  NIJMEIJER GERRIT JOHANNES ,  VAN BOXMEER JOHAN MARIA

IPC: H01L21/027 ,  G01B21/02 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7053 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

Abstract: PROBLEM TO BE SOLVED: To provide a method for exactly correcting a process-dependent offset error of a level sensor and having high cost-effectiveness. SOLUTION: The method of exposing a substrate W (e.g. a substrate in a lithographic apparatus comprising a substrate table to support a substrate) includes: a step of performing first and second height measurements of a part of at least one substrate W using first and second sensors 10, 11; a step of generating and storing an offset error map based on a difference between the measurement values; a step of generating and storing a height map of a plurality of portions of the substrate W (or another substrate subjected to the processing similar to that of the part) by executing height measurements using the first sensor 10 and correcting this height map by the offset error map; and a step of exposing the substrate W (or the other substrate). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于精确校正液位传感器的与处理相关的偏移误差并具有高成本效益的方法。 解决方案：曝光衬底W（例如，包括衬底台的光刻设备中的衬底以支撑衬底）的方法包括：使用以下步骤对至少一个衬底W的一部分进行第一和第二高度测量 第一和第二传感器10,11; 基于测量值之间的差产生和存储偏移误差图的步骤; 通过使用第一传感器10执行高度测量来生成和存储基板W（或与该部分的处理类似的处理的其他基板）的多个部分的高度图并将该高度图校正偏移的步骤 错误图; 以及使基板W（或其他基板）曝光的工序。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007142460A

公开(公告)日：2007-06-07

申请号：JP2007038065

申请日：2007-02-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which a space between the substrate and projection system is filled with a liquid while minimizing the volume of the liquid that must be accelerated during stage movements. SOLUTION: In the lithographic projection apparatus, a seal member surrounds a space between the final element of the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between the seal member and the surface of the substrate to contain the liquid in the space. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段移动期间必须加速的液体的体积。 解决方案：在光刻投影装置中，密封构件围绕投影系统的最终元件与光刻投影装置的基板台之间的空间。 在密封构件和基板的表面之间形成气体密封，以在空间中容纳液体。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2012064979A

公开(公告)日：2012-03-29

申请号：JP2011281445

申请日：2011-12-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which a space between a substrate and a projection system is filled with a liquid while minimizing a quantity of the liquid required to be accelerated during a stage operation.SOLUTION: In a lithography projection apparatus, a space between a final element of a projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a surface of the substrate and a liquid is confined in the space.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时使在阶段操作期间需要加速的液体量最小化。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的表面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2008199034A

公开(公告)日：2008-08-28

申请号：JP2008050997

申请日：2008-02-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  NIJMEIJER GERRIT JOHANNES ,  VAN ASTEN NICOLAAS ANTONIUS A ,  HEUTS FREDERIK THEODORUS E ,  GEMEN JACOBUS ,  DU CROO DE JONGH RICHARD JOHAN ,  BOONMAN MARCUS EMILE JOANNES ,  KLINKHAMER JACOB FREDRIK FRISO ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G01B9/02 ,  H01L21/027 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To avoid the need to relate the origins of apparatuses which measure heights of substrates or masks on a plurality of stations in a lithographic projection apparatus having a plurality of substrate tables or mask tables. SOLUTION: A substrate W is mounted on a substrate table WT; then, vertical positions of a physical reference surface and vertical positions Z LS of the substrate surface are measured at a plurality of points on a measurement station (at the right of figure 8) using a level sensor 10; simultaneously, vertical positions Z IF of the substrate table are measured at the same points using a Z-interferometer Z IF ; and the substrate surface height, Z Wafer =Z LS +Z IF , is mapped. Then, the substrate table carrying the substrate is moved to an exposure station (to the left of figure 8) and vertical positions of the physical reference surface is again determined. Then, when the substrate is positioned at a right vertical position during the exposure process, the height map is referenced. This process can be applied to a mask. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了避免在具有多个基板台或掩模台的光刻投影设备中将测量基板或掩模高度的设备的起点与多个台站相关联的需要。 解决方案：将衬底W安装在衬底台WT上; 然后使用液位传感器10在测量站（图8右侧）的多个点测量基板表面的物理基准表面和垂直位置Z LS 的垂直位置; 同时，使用Z型干涉仪Z SB，在同一点测量衬底台的垂直位置Z IF ; 并且映射基板表面高度Z Wafer = Z LS + Z IF 。 然后，承载基板的基板台移动到曝光站（图8的左侧），再次确定物理基准面的垂直位置。 然后，当曝光处理期间基板位于右垂直位置时，参考高度图。 该过程可以应用于掩模。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004165666A

公开(公告)日：2004-06-10

申请号：JP2003381339

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate W is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2010135857A

公开(公告)日：2010-06-17

申请号：JP2010059726

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段操作期间需要加速的液体的量。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的平面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008311684A

公开(公告)日：2008-12-25

申请号：JP2008239157

申请日：2008-09-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to a place where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008022038A

公开(公告)日：2008-01-31

申请号：JP2007260925

申请日：2007-10-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is formed at a measurement station. Then the substrate is moved to the place of which space between a projection lens and the substrate is filled with liquid. Subsequently, the substrate is aligned with, for example, a transmission image sensor to expose exactly according to the map formed previously. In this way, the mapping is never carried out under an environment of liquid.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站处形成衬底表面的图。 然后将基板移动到投影透镜和基板之间的空间被液体填充的位置。 随后，基板与例如透射图像传感器对准，以根据先前形成的图准确地曝光。 以这种方式，映射从不在液体环境下进行。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004289126A

公开(公告)日：2004-10-14

申请号：JP2003417259

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI