公开(公告)号：JP2009016817A

公开(公告)日：2009-01-22

申请号：JP2008158609

申请日：2008-06-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： NIHTIANOV STOYAN ,  VAN DER SIJS ARIE JOHAN ,  MOEST BEARRACH ,  KEMPER PETRUS WILHELMUS JOSEPH ,  HAAST MARC ANTONIUS MARIA ,  BAAS GERARDUS WILHELMUS PETRUS ,  NANVER LIS KAREN ,  SARUBBI FRANCESCO ,  SCHUWER ANTONIUS ANDREAS JOHAN ,  GOMMEREN GREGORY MICHA ,  POT MARTIJN ,  SCHOLTES THOMAS LUDOVICUS MARI

IPC: H01L31/10 ,  H01L21/027

CPC classification number: H01L31/103 ,  G03F7/7085 ,  G03F7/70958 ,  H01L31/02161 ,  H01L31/022408 ,  H01L31/022416 ,  H01L31/1185 ,  H01L31/1804 ,  Y02E10/547

Abstract: PROBLEM TO BE SOLVED: To provide a radiation detector 1, a method of manufacturing a radiation detector, and a lithographic apparatus including a radiation detector.
SOLUTION: The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive to radiation with a wavelength between 10-200 nm and/or for charged particles. The radiation detector 1 has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conductivity type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to the dopant layer. The second electrode is connected to the silicon substrate.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射检测器1，一种制造辐射检测器的方法以及包括一个辐射检测器的光刻设备。 解决方案：辐射探测器具有辐射敏感表面。 辐射敏感表面对波长在10-200nm和/或带电粒子之间的辐射敏感。 辐射检测器1具有硅衬底，掺杂剂层，第一电极和第二电极。 硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。 掺杂剂层设置在硅衬底的第一表面侧上。 掺杂剂层具有掺杂剂材料的第一层和第二层。 第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。 第一电极连接到掺杂剂层。 第二电极连接到硅衬底。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012028778A

公开(公告)日：2012-02-09

申请号：JP2011160648

申请日：2011-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： POSTMA SAIZE ,  VAN DE KERKHOF MARCUS A ,  MOEST BEARRACH ,  MATIAS CERRATO VASCO MIGUEL

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G03F9/7088 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To improve the accuracy of an image sensor during reticle alignment.SOLUTION: Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of the patterning device and the substrate, and comprises imparting a radiation beam onto an alignment structure on the patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing the resultant aerial image, in which the relative positions of the image sensor and the substrate being known or subsequently determined; and measuring features of the image and thereby determining the location of the alignment structure relative to the image sensor. In the method, an alternative scanning scheme is used, in which, for example, two or more scans through the whole target volume are performed, having total duration being the same as a conventional single continuous scan.

Abstract translation: 要解决的问题：提高标线校准过程中图像传感器的精度。 解决方案：公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。 该方法涉及图案形成装置和衬底的对准，并且包括将辐射束施加到图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所得到的空间图像的目标体积根据扫描方案扫描图像传感器，其中图像传感器和基板的相对位置已知或随后确定; 并测量图像的特征，从而确定对准结构相对于图像传感器的位置。 在该方法中，使用替代扫描方案，其中，例如，执行通过整个目标体积的两次或更多次扫描，其总持续时间与常规单次连续扫描相同。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012165021A

公开(公告)日：2012-08-30

申请号：JP2012115353

申请日：2012-05-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： NIHTIANOV STOYAN ,  VAN DER SIJS ARIE JOHAN ,  MOEST BEARRACH ,  KEMPER PETRUS WILHELMUS JOSEPH MARIA ,  HAAST MARC ANTONIUS MARIA ,  BAAS GERARDUS WILHELMUS PETRUS ,  NANVER LIS KAREN ,  SARUBBI FRANCESCO ,  SCHUWER ANTONIUS ANDREAS JOHANNES ,  GOMMEREN GREGORY MICHA ,  POT MARTIJN ,  SCHOLTES THOMAS LUDOVICUS MARIA

IPC: H01L21/027 ,  H01L31/10

CPC classification number: H01L31/103 ,  G03F7/7085 ,  G03F7/70958 ,  H01L31/02161 ,  H01L31/022408 ,  H01L31/022416 ,  H01L31/1185 ,  H01L31/1804 ,  Y02E10/547

Abstract: PROBLEM TO BE SOLVED: To provide a radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector.SOLUTION: The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths of 10 to 200 nm and/or charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area on a first surface side with a doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of a dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area on the first surface side of the silicon substrate. The first electrode is connected to the dopant layer. The second electrode is connected to the silicon substrate.

Abstract translation: 要解决的问题：提供一种辐射检测器，一种制造辐射检测器的方法以及包括一个辐射检测器的光刻设备。 解决方案：辐射检测器具有辐射敏感表面。 辐射敏感表面对10至200nm的辐射波长和/或带电粒子敏感。 辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。 硅衬底在第一表面侧的表面区域中设置有具有一定导电类型的掺杂分布。 掺杂剂层设置在硅衬底的第一表面侧上。 掺杂剂层具有掺杂剂材料的第一层和第二层。 第二层是与硅衬底的第一表面侧上的表面区域接触的扩散层。 第一电极连接到掺杂剂层。 第二电极连接到硅衬底。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010147471A

公开(公告)日：2010-07-01

申请号：JP2009281727

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN WEERT CORNELIS LAMBERTUS MARIA ,  VAN DE KERKHOF MARCUS A ,  MOEST BEARRACH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70066

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus whose surface material such as a coating is prevented from deteriorating. SOLUTION: A lithographic apparatus includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The lithography apparatus further includes an optical system configured to project an emitted beam, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The lithography apparatus further includes a shield movable into the optical path to restrict the cross-section of the emitted beam to restrict irradiation between the at least two target portions, wherein the surface material between the at least two target portions degrades when irradiated with the emitted beam through the optical system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：提供防止表面材料如涂层劣化的光刻设备。 解决方案：光刻设备包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分和至少两个目标部分之间的表面材料。 光刻设备还包括一个光学系统，该光学系统配置成沿着光学路径朝着工作台投影发射的光束，同时具有横截面以同时照射至少两个目标部分。 光刻设备还包括可移动到光路中的屏蔽件，以限制发射光束的横截面以限制至少两个目标部分之间的照射，其中当被发射的光束照射时，至少两个目标部分之间的表面材料降解 光束通过光学系统。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007110116A

公开(公告)日：2007-04-26

申请号：JP2006276040

申请日：2006-10-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCUS ADRIANUS VAN DE KERKHOF ,  MOEST BEARRACH

IPC: H01L21/027

CPC classification number: G03F7/706 ,  G03F7/70075 ,  G03F9/7069 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus comprising a diffuser configured to increase the range of angles at which a radiated illumination beam is incident on a patterning device. SOLUTION: In an alignment calibration process of a lithographic apparatus that uses a sensor to detect the properties of a projected image at a substrate level, a diffuser is inserted into an illumination beam to increase the range of angles at which the radiated beam is incident on the substrate. This allows sufficient illumination light to enter the sensor even when there is a mismatch between the illumination mode used and the acceptance NA of the sensor. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种包括扩散器的光刻投影设备，其被配置为增加辐射照明光束入射到图案形成装置上的角度范围。 解决方案：在使用传感器来检测基板级别的投影图像的特性的光刻设备的对准校准过程中，将扩散器插入照明光束中以增加辐射光束的角度范围 入射到基板上。 即使当所使用的照明模式和传感器的接收NA之间存在不匹配时，这也允许足够的照明光进入传感器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2011091398A

公开(公告)日：2011-05-06

申请号：JP2010231036

申请日：2010-10-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE KERKHOF MARCUS A ,  VENEMA WILLEM JURIANUS ,  MOEST BEARRACH ,  MATTHIAS SERAO VASCO MIGUEL ,  BOMHOF CEDRAN

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

Abstract: PROBLEM TO BE SOLVED: To further reduce overhead of measurement and/or a measurement error and a positioning error in a lithographic apparatus. SOLUTION: A certain lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：进一步降低光刻设备中的测量和/或测量误差和定位误差的开销。 解决方案：某个光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投影的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2007329462A

公开(公告)日：2007-12-20

申请号：JP2007120637

申请日：2007-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOEST BEARRACH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7011 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To improve overlay control by employing a system and a method for measuring an aerial image of an object mark in space. SOLUTION: A weighted fit based on a sample density of a plurality of samples is used to determine an alignment curve. A scan that produces the samples may include portions having greater and lesser sample density. While performing an interpolation to produce a best fit curve, a plurality of neighboring samples are chosen for each sample point, for sample points associated with a value above a threshold. A weighting function may be performed based on a distance between a given sample and the chosen nearest neighbors, wherein measurements that are taken in a region with denser samples are given less weight than measurements that are taken in a region with sparser samples. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过采用用于测量空间中的物体标记的空间图像的系统和方法来改进覆盖控制。 解决方案：使用基于多个样本的样本密度的加权拟合来确定对准曲线。 产生样品的扫描可以包括具有更大和更小样品密度的部分。 在执行插值以产生最佳拟合曲线时，对于与高于阈值的值相关联的采样点，针对每个采样点选择多个相邻采样。 可以基于给定样本与所选择的最近邻居之间的距离来执行加权函数，其中在具有更密集样本的区域中进行的测量的权重小于在具有较稀疏样本的区域中进行的度量。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006148126A

公开(公告)日：2006-06-08

申请号：JP2005336584

申请日：2005-11-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOEST BEARRACH ,  VEN DE KERKHOF MARCUS ADRIANUS ,  MARIA HAAST MARC A

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method capable of preventing a sensor surface from eluting into a liquid. SOLUTION: A liquid supply system for liquid immersion exposure is provided, in which a space 10 between a projection system and a substrate table is filled with a liquid, wherein a sensor 20 is set having a surface constituted so as to be partially exposed to the space 10, and a power source 21 is provided for applying a bias voltage between the surface of the sensor 20 and a conductive or semiconductor device constituted so as to be partially exposed. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够防止传感器表面洗脱到液体中的光刻设备和设备制造方法。 提供了一种液浸式液体供给系统，其中投影系统和基板台之间的空间10填充有液体，其中传感器20被设置为具有构成为部分地形成的表面 暴露于空间10，并且提供电源21，用于在传感器20的表面和构成为部分暴露的导电或半导体器件之间施加偏置电压。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2013048276A

公开(公告)日：2013-03-07

申请号：JP2012237385

申请日：2012-10-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOEST BEARRACH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70666 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide a device for transmission image sensing for sensing an aerial image in a lithographic exposure apparatus.SOLUTION: The device comprises a projection system arranged to form, at an image side of the projection system, an aerial image of an object mark. The device further comprises a detector comprising a slit pattern having features corresponding to at least a part of the aerial image. The slit pattern is arranged to be exposed to the aerial image. The detector is further arranged to detect detection radiation transmitted by the slit pattern. Here, d

Abstract translation: 要解决的问题：提供一种用于在光刻曝光设备中感测航空图像的透射图像感测装置。 解决方案：该装置包括投影系统，该投影系统布置成在投影系统的像侧形成物体标记的空中图像。 该装置还包括检测器，其包括具有对应于空中图像的至少一部分的特征的狭缝图案。 狭缝图案布置成暴露于空中图像。 检测器还被布置成检测由狭缝图案传输的检测辐射。 这里，d <0.85 *λ/ NA，其中d表示狭缝图案的最小特征的尺寸，λ表示检测辐射的预期波长，并且大于1的NA表示图像的数值孔径 侧。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009081414A

公开(公告)日：2009-04-16

申请号：JP2008162663

申请日：2008-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOEST BEARRACH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70666 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide a device for transmission image sensing for sensing a spatial image in a lithographic exposure apparatus. SOLUTION: The device includes a projection system arranged to form, at an image side of the projection system, a spatial image of an object mark. The device further includes a detector having a slit pattern with features corresponding to at least a part of the spatial image. The slit pattern is arranged to be exposed to the spatial image. The detector is further being arranged to detect detection radiation transmitted by the slit pattern, wherein d COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于感测光刻曝光设备中的空间图像的透射图像感测装置。 解决方案：该装置包括投影系统，其布置成在投影系统的像侧形成物体标记的空间图像。 该装置还包括具有狭缝图案的检测器，其具有对应于空间图像的至少一部分的特征。 狭缝图案布置成暴露于空间图像。 检测器还被布置成检测由狭缝图案发射的检测辐射，其中d <0.85×λ/ NA，其中（d）是狭缝图案的最小特征的尺寸，λ是检测辐射的预期波长 ，大于1的NA是图像侧的数值孔径。 版权所有（C）2009，JPO＆INPIT