公开(公告)号：JP2011199285A

公开(公告)日：2011-10-06

申请号：JP2011056066

申请日：2011-03-15

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Gmbh ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・ゲーエムベーハー

Inventor： MULDER HEINE MELLE ,  HANSEN STEVEN GEORGE ,  HUBERTUS MULKENS JOHANNES C ,  DEGUENTHER MARKUS

IPC: H01L21/027 ,  G02B19/00 ,  G03F7/20

CPC classification number: G03F7/70566 ,  G03F7/70091 ,  G03F7/70116

Abstract: PROBLEM TO BE SOLVED: To provide an illumination system that is configured so that the system can generate a polarized illumination mode more flexibly, and to provide a lithographic apparatus.SOLUTION: The illumination system includes: a polarization member including first and second polarization modifiers, with both of which actuators configured to be movable into at least partial intersection with a radiation beam are connected so that the respective polarization modifiers apply a modified polarization to at least part of the beam; an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member; and a controller that can control the actuators so that the first and second polarization modifiers intersect with different portions of the radiation beam.

Abstract translation: 要解决的问题：提供一种被配置为使得系统可以更灵活地产生偏振照明模式并提供光刻设备的照明系统。解决方案：照明系统包括：包括第一和第二偏振调节器的偏振构件， 其中两个致动器被配置为可移动到与辐射束的至少部分交叉中，使得各个偏振调节器将修改的极化应用于至少部分光束; 定位成在辐射束已经通过偏振构件之后接收辐射束的单独可控反射元件的阵列; 以及控制器，其可以控制致动器，使得第一和第二偏振调节器与辐射束的不同部分相交。

公开(公告)号：JP2008283177A

公开(公告)日：2008-11-20

申请号：JP2008104803

申请日：2008-04-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MICHEL FRANSOIS HUBERT KLAASSE ,  VAN GREEVENBROEK HENDRIKUS ROB ,  MULDER HEINE MELLE ,  GREIJDANUS ERIK MARTIJN

IPC: H01L21/027 ,  G02B5/30 ,  G03F7/20

CPC classification number: G03F7/70108 ,  G03F7/70566

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a polarization changing element carrying out variable adjusting of a polarization direction of a radiation beam continuously. SOLUTION: The lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members which rotate a polarization direction of at least one segment of the radiation beam with a predetermined angle with respect to a first direction of an optical propagation length adaptor associated with the wedge-shaped optically active members, and which adjust the predetermined angle. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种包括连续地进行辐射束的偏振方向的可变调节的偏振改变元件的光刻设备。 光刻设备包括偏振改变元件，该偏振改变元件包括至少两个楔形光学有源元件，该至少两个楔形光学有源元件相对于光学器件的第一方向以预定的角度旋转辐射束的至少一个部分的偏振方向 与楔形光学有源构件相关联的传播长度适配器，并且调节预定角度。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008091907A

公开(公告)日：2008-04-17

申请号：JP2007249522

申请日：2007-09-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KLARENBEEK EDUARD MARTINUS ,  MULDER HEINE MELLE ,  RAVENSBERGEN MARIUS ,  VERBEEK JOSEPH FERDINAND DIMNA

IPC: H01L21/027 ,  G01B11/00 ,  G01B11/26 ,  G03F7/20

CPC classification number: G02B27/017 ,  G01J1/04 ,  G01J1/0414 ,  G01J1/4228 ,  G02B2027/0178 ,  G03F7/70116 ,  G03F7/7085 ,  G03F7/70891 ,  G09G5/377

Abstract: PROBLEM TO BE SOLVED: To provide a measurement apparatus which determines the inclination angle of an individually controllable element of individually controllable element array of an illuminator in real time during lithography operation, without interrupting the lithography operation.
SOLUTION: The measurement apparatus has: a radiation source for illuminating the individually controllable element of the individually controllable element array modulating a radiation beam by a measurement radiation beam and redirecting the measurement radiation beam by using a radiation source supplying the measurement radiation beam; and a detector arranged to receive the redirected measurement radiation beam, determining the position at which the redirected measurement radiation beam is incident upon the detector, and being indicative of characteristics of the individually controllable element at the position at which the redirected measurement beam is incident upon the detector.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种测量装置，其在光刻操作期间实时确定照明器的独立可控元件阵列的独立可控元件的倾斜角，而不中断光刻操作。 解决方案：测量装置具有：用于照亮单独可控元件阵列的可单独控制的元件的辐射源，其通过测量辐射束调制辐射束，并通过使用提供测量辐射束的辐射源来重定向测量辐射束 ; 以及检测器，被布置成接收重定向的测量辐射束，确定重定向的测量辐射束入射到检测器上的位置，并且指示在重定向的测量光束入射的位置处的单独可控元件的特性 检测器。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004088075A

公开(公告)日：2004-03-18

申请号：JP2003151729

申请日：2003-05-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULDER HEINE MELLE ,  VAN GREEVENBROEK HENDRIKUS ROB

IPC: G02B7/00 ,  G02B19/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70075 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566 ,  G03F7/70825

Abstract: PROBLEM TO BE SOLVED: To provide an optical element assembled quickly at a low cost for offering a desired lighting mode.
SOLUTION: A part kit for assembling an optical element used in a lithographic apparatus includes a plurality of small various parts for orientating the light to each region at a pupil face of a radiation system and changing a polarized state of an impinging radiating beam. By selecting a part member manufactured previously and assembling the part member in the optical element, a desired distribution of intensity is generated promptly. The optical element is disassembled and the part member can be used again.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供以低成本快速组装以提供期望的照明模式的光学元件。 解决方案：用于组装光刻设备中使用的光学元件的部件套件包括多个小的各种部件，用于将光定向到辐射系统的光瞳面处的每个区域，并改变入射辐射束的偏振状态 。 通过选择先前制造的部件和将部件组装在光学元件中，迅速产生所需的强度分布。 拆卸光学元件，再次使用该部件。 版权所有（C）2004，JPO

公开(公告)号：JP2008166777A

公开(公告)日：2008-07-17

申请号：JP2007329420

申请日：2007-12-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HANSEN STEVEN GEORGE ,  MULDER HEINE MELLE ,  KAZINCZI ROBERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70125

Abstract: PROBLEM TO BE SOLVED: To optimize the lighting conditions of a lithographic device to a printing features having higher precision. SOLUTION: A method for constituting lighting sources of the lithographic device is provided. The method includes a step of dividing the lighting sources into pixel groups containing one or a plurality of lighting source points, respectively; a step of selecting a light form, formed by at least one pixel group for exposing a pattern; a step of repeatedly calculating lithographic metric, as a result of condition changing of the pixel group forming the modified light form in the lighting source; and a step of adjusting the light form, based on the repeated calculation. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：将光刻设备的照明条件优化为具有更高精度的打印特征。 解决方案：提供一种用于构成光刻设备的光源的方法。 该方法包括分别将光源划分为包含一个或多个光源点的像素组的步骤; 选择由用于曝光图案的至少一个像素组形成的光形式的步骤; 作为在光源中形成修改光形状的像素组的条件变化的结果，重复计算光刻度量的步骤; 以及基于重复计算的调整光形式的步骤。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004289123A

公开(公告)日：2004-10-14

申请号：JP2003401536

申请日：2003-12-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULDER HEINE MELLE ,  HOEGEE JAN ,  KOOLEN ARMAND EUGENE ALBERT

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70108 ,  G03F7/70133 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To obtain the information of an intensity distribution in a pupil plane without disrupting the operability of a lithographic apparatus and to adjust the configuration of an illumination system at any time for controlling a desired intensity distribution in the pupil plane dependent on measured information about the intensity distribution.
SOLUTION: A beam splitter is permanently located in a beam near the pupil plane. The beam splitter splits off an auxiliary beam, which is used to measure information about the spacial intensity distribution of the beam at the pupil plane. Preferably, the measured position dependence in the auxiliary beam may be deconvoluted using boundary conditions inherent to the illuminator to compensate for offset between the pupil plane and a detection element. The measured position dependence may be used to control parameters of an optical element that manipulates the position dependence in the pupil plane. An example of such an optical element is a matrix of elements that controllably steer the direction of parts of the beam. Thus a continuous feedback loop may be realized.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得光瞳平面中的强度分布的信息而不破坏光刻设备的可操作性，并且随时调整照明系统的配置以控制瞳孔平面中的期望的强度分布 取决于关于强度分布的测量信息。 解决方案：分束器永久地位于瞳孔平面附近的光束中。 分束器分离辅助光束，其用于测量关于光束在瞳孔平面处的空间强度分布的信息。 优选地，可以使用照明器固有的边界条件对辅助光束中的测量位置依赖性进行解卷积，以补偿光瞳面与检测元件之间的偏移。 测量的位置依赖性可以用于控制操纵光瞳平面中的位置依赖性的光学元件的参数。 这种光学元件的示例是可控制地引导梁的部分的方向的元件的矩阵。 因此，可以实现连续反馈回路。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289119A

公开(公告)日：2004-10-14

申请号：JP2003388544

申请日：2003-10-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MULDER HEINE MELLE ,  MOERS MARCO HUGO PETRUS

IPC: G02B13/00 ,  G02B13/18 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70941

Abstract: PROBLEM TO BE SOLVED: To provide a method of determining a stray radiation condition of a projection system of a lithographic projection apparatus having a numerical aperture NA.
SOLUTION: The method comprises steps of providing a detector with a detector aperture coincident with the image plane of the projection system, measuring a reference parameter in accordance with the projection beam intensity, measuring a stray radiation parameter of an image of an isolated feature formed by the projection system, and calculating a coefficient representing the stray radiation condition of the projection system on the basis of the measured stray radiation parameter and the reference parameter. The shape of presented feature is first scaled down by the scaling factor of the projection system and subsequently each line element constituting the edge of the scale-down shape is displaced parallel to itself over a distance of at least λ/NA in a direction perpendicular to that line element, and further the detector aperture is positioned within the image of the isolated feature by a positioning step so that the extent of the detector aperture fits within the extent of a defined notional shape.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2013098565A

公开(公告)日：2013-05-20

申请号：JP2012238555

申请日：2012-10-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MULDER HEINE MELLE

IPC: H01L21/027 ,  G02B26/10 ,  G03F7/20

CPC classification number: G03F7/2008 ,  G03F7/26 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic system in which one or more problems introduced by deviation of the wavelength of one or more of radiation beams from a nominal value can be mitigated or minimized, for example.SOLUTION: The lithographic apparatus has a projection system to project a plurality of radiation beams onto a substrate. The plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.

Abstract translation: 要解决的问题：提供一种光刻系统，其中例如可以减轻或最小化一个或多个由一个或多个辐射束的波长偏离标称值引起的问题。 解决方案：光刻设备具有将多个辐射束投影到基板上的投影系统。 多个辐射束包括由第一波长范围内的辐射形成的一个或多个辐射束的第一组和由不同于第一波长范围的第二波长范围内的辐射形成的一个或多个辐射束的第二组。 该装置还具有一个色散元件，其配置成使得第一组的一个或多个辐射束以与第二组的一个或多个辐射束不同的角度入射在分散元件上，并且使得一个或多个辐射束 从分散元件输出的第一和第二组基本上是平行的。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2008235941A

公开(公告)日：2008-10-02

申请号：JP2008172173

申请日：2008-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS ,  MARKUS FRANCISCUS ANTONIUS EUR ,  KRIKKE JAN JAAP ,  MULDER HEINE MELLE ,  MUIJDERMAN JOHANNES HENDRIK EV ,  VAN DUIJN CORNELIS JACOBUS

IPC: G02B26/02 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide an optical attenuator having one optical attenuator element or a plurality of optical attenuator elements arranged symmetrically to a center line of a beam and in a central part of the beam. SOLUTION: The optical attenuator device operates to remove a part of a beam of radiation having intensity higher than average intensity by using at least one optical attenuator element. The device has applications in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有一个光衰减器元件或多个光束衰减器元件的光衰减器，所述光衰减器元件或对称地布置在梁的中心线和梁的中心部分中。 解决方案：光衰减器件通过使用至少一个光衰减器元件来操作以去除强度高于平均强度的辐射束的一部分。 该装置在辐射系统和/或光刻设备，特别是扫描光刻设备中具有应用，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008135742A

公开(公告)日：2008-06-12

申请号：JP2007300017

申请日：2007-11-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STOELDRAIJER JUDOCUS MARIE DOM ,  LOOPSTRA ERIK R ,  MULDER HEINE MELLE ,  SENGERS TIMOTHEUS FRANCISCUS ,  STOFFELS FREERK ADRIAAN ,  JORRITSMA LAURENTIUS CATRINUS ,  JUNGBLUT REINER MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70108 ,  G03F7/70216

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, capable of reducing an uneven heating effects on an element of a projection system, when using, for example, a local illumination mode, or to provide a method improved for reducing the uneven heating effects. SOLUTION: In the lithographic apparatus, a corrective irradiation step is performed by using an illumination mode arranged so as to heat a selected part on which a large amount of heat is not applied during the production exposure of the element of the projection system close to the pupil plane of the lithographic apparatus. The corrective irradiation step is performed to improve uniformity of optical component heating of the projection system and/or reduce the phase gradient. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其能够减少对投影系统的元件的不均匀的加热效应，当使用例如局部照明模式时，或提供改进以减少不均匀的方法 加热效果。 解决方案：在光刻设备中，通过使用照射模式来执行校正照射步骤，所述照射模式被布置为在投影系统的元件的生产曝光期间加热不施加大量热量的选定部分 靠近光刻设备的光瞳平面。 执行校正照射步骤以改善投影系统的光学部件加热的均匀性和/或降低相位梯度。 版权所有（C）2008，JPO＆INPIT