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公开(公告)号：JP2009164623A
公开(公告)日：2009-07-23
申请号：JP2009044651
申请日：2009-02-26
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , DONDERS SJOERD NICOLAAS LAMBER , LOOPSTRA ERIK ROELOF , MULKENS JOHANNES CATHARINUS HU
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70875 , B05C9/12 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a means for alleviating the problem concerning the presence of a dipping liquid in a lithographic projection apparatus.
SOLUTION: In the lithographic projection apparatus, a liquid supplying system supplies the dipping liquid between the last element of the projection apparatus and a substrate. An active drying station is provided to actively remove the remained dipping liquid from the exposed substrate W or other objects. The active drying station is equipped with a gas stream forming means or a dipping liquid dissolving liquid supplying means for dissolving the dipping liquid.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种减轻在光刻投影设备中存在浸渍液体的问题的方法。 解决方案：在平版印刷投影设备中，液体供应系统将投影设备的最后一个元件和基板之间的浸渍液体供应。 提供主动干燥站，以从暴露的基底W或其它物体主动去除剩余的浸渍液体。 活性干燥站装有用于溶解浸渍液体的气流形成装置或浸液溶解液体供给装置。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009088563A
公开(公告)日：2009-04-23
申请号：JP2009000117
申请日：2009-01-05
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
Abstract: PROBLEM TO BE SOLVED: To prevent or reduce the occurrence of residual liquid on the substrate and/or substrate table after the exposure of a substrate, in an immersion type lithographic apparatus. SOLUTION: In immersion lithography, after the exposure of a substrate is completed, a detector is used for detecting residual liquid that remains on the substrate and/or substrate table. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：在浸没式光刻设备中，为了防止或减少在曝光基板之后在基板和/或基板台上残留液体的出现。 解决方案：在浸没式光刻中，在完成基板曝光之后，使用检测器来检测残留在基板和/或基板台上的残余液体。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2009033201A
公开(公告)日：2009-02-12
申请号：JP2008274728
申请日：2008-10-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: H01L21/027 , G03F7/20 , H01L21/683
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面 的基底。 屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008227548A
公开(公告)日：2008-09-25
申请号：JP2008161756
申请日：2008-06-20
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , STAVENGA MARCO KOERT , STREEFKERK BOB , HOEVEN JAN CORNELIS V D , GROUWSTRA CEDRIC D
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: A cleaning fluid can be introduced into a space between a projection system and a substrate table of the lithographic apparatus by especially using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种清洗浸没式光刻设备内部的方法和装置。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2008227547A
公开(公告)日：2008-09-25
申请号：JP2008161741
申请日：2008-06-20
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , STAVENGA MARCO KOERT , STREEFKERK BOB , HOEVEN JAN CORNELIS V D , GROUWSTRA CEDRIC D
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a method and equipment for cleaning the interior of oil immersion lithographic equipment. SOLUTION: Cleaning fluid can be introduced into a space between the projection system and the substrate table of lithographic equipment by especially using the liquid supply system of the lithographic equipment. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided in order to produce ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种清洗油浸光刻设备内部的方法和设备。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁液体引入到平版印刷设备的投影系统和基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2008199061A
公开(公告)日：2008-08-28
申请号：JP2008120508
申请日：2008-05-02
Applicant: Asml Netherlands Bv , Carl Zeiss Smt Ag , エーエスエムエル ネザーランズ ビー.ブイ. , カール・ツァイス・エスエムティー・アーゲー
Inventor： STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BASELMANS JOHANNES JACOBUS MAT , GRAEUPNER PAUL , ENGELEN ADRIANUS FRANCISCUS PE , FINDERS JOSEF MARIA , VAN SCHOOT JAN BERNARD PLECHEL
IPC: H01L21/027 , G03F7/20 , G03F7/207
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: PROBLEM TO BE SOLVED: To improve focus latitude and/or to stabilize contrast control in an immersion lithographic apparatus, where the position of a focus changes when accelerating a substrate table during exposure.
SOLUTION: A final element 50 in a projection system that is a parallel plate used for sealing a projection system PL against an immersion liquid 10 in immersion lithography changes an incidence angle of projection beams when the final element inclines to the optical axis of the device. Force generated by the immersion liquid is utilized passively, and the final element is moved, thus changing the focus continuously at all points on the substrate to improve the focus latitude. Some methods, such as a method for inclining the projection beams to the substrate, are disclosed.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：为了提高聚焦宽度和/或稳定浸没式光刻设备中的对比度控制，其中在曝光期间加速衬底台时焦点的位置改变。 解决方案：投影系统中的最终元件50，其是用于在浸没光刻中将投影系统PL与浸没液体10密封的平行板，当最终元件倾斜到光轴的光轴时，投影光束的入射角度 装置。 由浸没液体产生的力被动被动使用，最后的元件移动，从而在基板上的所有点连续地改变聚焦，以提高焦点的纬度。 公开了一些方法，例如将投射光束倾斜到衬底的方法。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2007165934A
公开(公告)日：2007-06-28
申请号：JP2007057545
申请日：2007-03-07
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： LOOPSTRA ERIK ROELOF , DIERICHS MARCLE MATHIJS T M , JASPER JOHANNES CHRISTIAN MARI , MEIJER HENDRICUS JOHANNE MARIA , MICKAN UWE , MULKENS JOHANNES CATHARINUS HU , LIPSON MATTHEW , UITTERDIJK TAMMO , BASELMANS JOHANNES JACOBUS MAT
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of manufacturing a device. SOLUTION: A lithogrophic projection apparatus for use with an immersion liquid placed between the final element of a projection system and a substrate W is disclosed. A plurality of methods for protecting the components of the projection system, a substrate table, and a liquid confinement system are disclosed. These methods include a step of applying a protective coating on the final element 20 of the projection system and a step of providing sacrificial bodies to an upstream side of the components. Further, a final optical element composed of two components made from CaF 2 is disclosed. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 解决的问题：提供一种光刻设备及其制造方法。 解决方案：公开了一种用于放置在投影系统的最终元件和基板W之间的浸没液体的光栅投影装置。 公开了用于保护投影系统，衬底台和液体限制系统的组件的多种方法。 这些方法包括在投影系统的最终元件20上施加保护涂层的步骤以及向部件的上游侧提供牺牲体的步骤。 此外，公开了由由CaF 2 SBB制成的两个部件组成的最终光学元件。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2005175438A
公开(公告)日：2005-06-30
申请号：JP2004300277
申请日：2004-10-14
Applicant: Asml Netherlands Bv , Carl Zeiss Smt Ag , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ , カール・ツァイス・エスエムティー・アーゲー
Inventor： STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BASELMANS JOHANNES JACOBUS MAT , GRAEUPNER PAUL , ENGELEN ADRIANUS FRANCISCUS PE , FINDERS JOSEF MARIA , VAN SCHOOT JAN BERNARD PLECHEL
IPC: G03F7/20 , G03F7/207 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: PROBLEM TO BE SOLVED: To improve focus latitude and/or stabilize contrast control by an immersion lithography apparatus changing focus positions in accelerating a substrate table during exposure.
SOLUTION: The last element 50 of a projection system that is a parallel plate used for sealing a projection system PL from an immersion liquid 10 by immersion lithography changes the angle of incidence of a projected beam when tilting to the optical axis of the device. By passively using the force generated by this immersion liquid and moving the last element, the focus is continuously changed at every points on the substrate to improve the focus latitude. Moreover, there are indicated some methods such as tilting the projected beam to the substrate.
COPYRIGHT: (C)2005,JPO&NCIPIAbstract translation: 要解决的问题：通过浸没式光刻设备来改善焦点宽度和/或稳定对比度控制，以在曝光期间改变加速衬底台的焦点位置。 解决方案：作为用于通过浸没光刻从浸没液体10密封投影系统PL的平行板的投影系统的最后一个元件50，当倾斜到光轴的光轴时，投影光束的入射角度会改变 设备。 通过被动地使用由该浸渍液产生的力并移动最后一个元件，在基板上的每个点处连续地改变焦点，以提高对焦的纬度。 此外，还指出了一些方法，例如将投射的光束倾斜到衬底。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2005167211A
公开(公告)日：2005-06-23
申请号：JP2004311712
申请日：2004-10-27
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVIC , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system which minimizes voltage variation and/or temperature variation of liquid without causing unnecessary disturbance due to mechanical vibration, in a lithographic apparatus. SOLUTION: Liquid is supplied to a reservoir 10 between a final element of a projection system PS and a substrate by an inlet 21. An overflow removes the liquid above a given level. The overflow is arranged above the inlet and thus the liquid is constantly refreshed and the pressure in the liquid remains substantially constant. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种在光刻设备中使液体的电压变化和/或温度变化最小化而不引起由于机械振动引起的不必要的干扰的液体供应系统。 解决方案：通过入口21将液体供应到投影系统PS的最终元件和基底之间的储存器10.溢流器将液体移至高于给定水平的位置。 溢流口布置在入口的上方，因此液体不断刷新，液体中的压力基本保持不变。 版权所有（C）2005，JPO＆NCIPI
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公开(公告)号：JP2009283970A
公开(公告)日：2009-12-03
申请号：JP2009176829
申请日：2009-07-29
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , BRULS RICHARD JOSEPH , DIERICHS MARCLE MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , SENGERS TIMOTHEUS FRANCISCUS , RONALD WALTER JIIN SEVERYNS , SERGEI SHULEPOV , BOOM HERMAN
IPC: H01L21/027 , B05D3/12 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which immersion liquid is provided between the last element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the immersion liquid and to help reduce residue on the elements after being in contact with the immersion liquid.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供浸没式光刻投影装置。 公开了浸没式光刻投影装置，其中浸没液体设置在投影系统的最后一个元件和基板之间。 提供了在设备的各种元件上使用疏水层和亲水层两者以帮助防止在浸液中形成气泡并有助于在与浸液接触之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT
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