公开(公告)号：JP2009218588A

公开(公告)日：2009-09-24

申请号：JP2009051499

申请日：2009-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEITH FRANK BEST ,  VAN BUEL HENRICUS WILHELMUS MA ,  GUI CHENG-QUN ,  ONVLEE JOHANNES ,  PELLENS RUDY JAN MARIA ,  EDART REMI DANIEL MARIE ,  VOZNYI OLEG VIACHESLAVOVICH ,  MAURY PASCAL ANNE

IPC: H01L21/027

CPC classification number: G03F9/7084 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/708 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method capable of removing, or relaxing increase of overlay errors of patterns. SOLUTION: The lithographic method for providing an alignment mark onto a layer provided on a substrate is disclosed. The method includes providing the alignment mark to a region aligned within a specific angle range to a surface of the substrate having the layer provided thereon. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供能够去除或放松图案重叠误差增加的光刻设备和方法。 解决方案：公开了在设置在基板上的层上提供对准标记的光刻方法。 该方法包括将对准标记提供到具有在其上设置有层的基板的表面的特定角度范围内的区域。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007129218A

公开(公告)日：2007-05-24

申请号：JP2006291660

申请日：2006-10-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ONVLEE JOHANNES ,  BIJVOET DIRK-JAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716 ,  G03F9/7011

Abstract: PROBLEM TO BE SOLVED: To correct position errors caused by slip between a reticle and a reticle stage. SOLUTION: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures the position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls the position of the patterning support on the basis of the measuring signal input into the positioning device. In a corresponding device manufacturing method, a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. The position of the patterning device is measured relative to the patterning support, and the position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the position of the patterning support is controlled to compensate for slip of the patterning device relative to the patterning support. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：校正由于光罩和标线片台之间的滑动引起的位置误差。 解决方案：光刻设备具有保持图案形成装置的图形化支撑件。 至少一个位置传感器测量图案形成装置相对于图案形成支撑件的位置，并产生测量信号。 定位装置基于输入到定位装置的测量信号来控制图案形成支撑件的位置。 在相应的器件制造方法中，提供了图案形成支撑件。 图案形成装置被保持在图案形成支撑件上。 图形支撑沿着移动线移动。 图案形成装置的位置相对于图案形成支撑件测量，并且基于图案形成装置相对于图案形成支撑件的位置的测量来控制图案形成支撑件的位置。 因此，图案化支撑件的位置被控制以补偿图案形成装置相对于图案形成支撑件的滑动。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006126205A

公开(公告)日：2006-05-18

申请号：JP2005320099

申请日：2005-10-05

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ONVLEE JOHANNES ,  GREVE PETER FERDINAND ,  FRANSSEN JOHANNES HENDRIKUS GE ,  VISSER RAYMOND ,  VERHAGEN ERWIN THEODORUS JACOB

IPC: G01N21/956 ,  G01B11/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70916 ,  G01N21/94 ,  G01N21/956 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for differentiation between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a particle does not have levels higher than a predetermined threshold level respectively and, when radiation is received from the ghost particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a predetermined part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the predetermined part of the detector device. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种检测器系统，用于从来自实际颗粒的辐射分解来自重影颗粒的辐射，以在颗粒和重影颗粒之间进行区分。 解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。 在多个检测器信号中，从粒子接收的辐射分别不具有高于预定阈值的电平，并且当从重影粒子接收到辐射时，显示高于阈值电平的大致相同的电平。 检测器系统包括用于响应于入射在预定部件上的辐射产生第一检测器信号的辐射检测器装置和用于防止不是源自颗粒的辐射入射在检测器装置的预定部分上的辐射阻挡组件。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005236310A

公开(公告)日：2005-09-02

申请号：JP2005078033

申请日：2005-02-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DEN NIEUWELAAR NORBERTUS J ,  ONVLEE JOHANNES ,  BOUMEN ROEL

IPC: H01L21/027 ,  G03D5/00

CPC classification number: G03D5/00 ,  G03F7/70525 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/14

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of improved model for synchronizing a track unit and a lithography apparatus for maximizing the throughput in lithographic processing cell configuration.
SOLUTION: Lithographic processing cell includes a lithographic exposure apparatus configured to expose a substrate, and track unit configured prepare the substrate before the exposure, and to develop the substrate after the exposure. The method includes predicting the time needed for the lithographic exposure apparatus to become ready to receive a substrate that has been prepared by the track unit for exposure, and adjusting the speed with which the track unit prepares the substrate so that the substrate becomes ready for the lithographic exposure apparatus to receive in time. The use of buffer in the track can be avoided significantly or even completely obviated, by adjusting the track speed so that the substrate becomes ready, just in time when the lithographic exposure apparatus needs the substrate.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于使轨道单元同步的改进模型的制造方法和用于使光刻处理单元配置中的吞吐量最大化的光刻设备。 解决方案：平版印刷处理单元包括被配置为暴露基板的光刻曝光装置，并且配置的轨道单元在曝光之前准备基板，并且在曝光之后显影基板。 该方法包括预测光刻曝光装置准备好接收由用于曝光的轨道单元制备的基板所需的时间，以及调整轨道单元准备基板的速度，使得基板准备好用于 光刻曝光装置及时接收。 通过调整轨道速度使得基板准备就绪，恰好在平版印刷曝光装置需要基板的时候，可以明显地或甚至完全地避免轨道中的缓冲区的使用。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005191571A

公开(公告)日：2005-07-14

申请号：JP2004371509

申请日：2004-12-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： NIEUWELAAR NORBERTUS JOSEPHUS ,  ONVLEE JOHANNES ,  VAN LIEROP HENRICUS PETRUS JOH ,  BRASPENNING NIELS CORNELIS WIL ,  ROODA JACOBUS E

IPC: G03F7/20 ,  G05B19/418 ,  G06F19/00 ,  H01L21/027

CPC classification number: G05B19/41865 ,  G05B2219/32301 ,  Y02P90/20 ,  Y02P90/22 ,  Y02P90/26

Abstract: PROBLEM TO BE SOLVED: To provide the preparing method of a schedule that operates a machine forming at least a part of a lithographic device or a lithographic processing cell. SOLUTION: In the method, a plurality of weighting factors on each of a plurality of qualities that affect the results of a lithographic process are received. The optimal schedule of a task that should be executed is prepared to complete the lithographic process, the optimal schedule is a schedule that brings about the results having the maximum total quality value, and the total quality is the total of each value of the qualities and each of the weighting factors. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供操作形成光刻设备或光刻处理单元的至少一部分的机器的调度的准备方法。 解决方案：在该方法中，接收影响光刻处理结果的多个质量中的每一个上的多个加权因子。 准备执行的任务的最佳时间表准备完成光刻过程，最佳时间表是带来最大总质量值的结果的时间表，总质量是每个品质值的总和， 每个加权因子。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2010153867A

公开(公告)日：2010-07-08

申请号：JP2009290308

申请日：2009-12-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ONVLEE JOHANNES ,  KUIT JAN JAAP ,  KOS JOOST

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/54 ,  G03F9/7065 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To alleviate the problem caused by the fact that a lighting source has to supply a beam having a large area for illuminating an alignment marker. SOLUTION: The lithographic apparatus includes a support section for supporting a patterning device for forming a radiation beam with a pattern, by giving a pattern to the section of the radiation beam and a substrate table for holding a substrate. The projection system projects the radiation beam with a pattern to the target part of the substrate. The patterning device includes one or a plurality of alignment patterns, and the lithographic apparatus includes a sub-lighting system for lighting each of the alignment patterns by another radiation using the radiation beam. The projection system projects an image of the respective alignment patterns to the substrate table. The substrate table includes one or a plurality of sensors for detecting the projected image of the alignment pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了减轻由于照明源必须提供具有用于照射对准标记的大面积的光束的事实而引起的问题。 解决方案：光刻设备包括支撑部分，用于通过向辐射束的部分提供图案和用于保持基板的基板台支撑用于形成具有图案的辐射束的图案形成装置。 投影系统将辐射束以图案投射到基板的目标部分。 图案形成装置包括一个或多个对准图案，并且光刻设备包括用于通过使用辐射束的另一个辐射来照亮每个对准图案的子照明系统。 投影系统将各个对准图案的图像投影到基板台。 衬底台包括用于检测对准图案的投影图像的一个或多个传感器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009044131A

公开(公告)日：2009-02-26

申请号：JP2008148196

申请日：2008-06-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AUER-JONGEPIER SUZAN LEONIE ,  ONVLEE JOHANNES ,  BARTRAY PETRUS R ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  PLUG REINDER TEUN ,  SEGERS HUBERT MARIE

IPC: H01L21/027

CPC classification number: H01L21/67178 ,  H01L21/67109

Abstract: PROBLEM TO BE SOLVED: To disclose system and method for processing wafers, a combined post-exposure bake and chill unit, and an interface.
SOLUTION: An exemplary system includes a lithography tool 12, a local track 14, a transfer device 20, a transfer device handler 21, an interface unit 16, and a controller to schedule processing. An exemplary combined post-exposure bake and chill unit includes an enclosure having an opening in its side, and a bake unit and a chill unit in the enclosure. An exemplary interface includes a plurality of enclosures arranged around robots that transfer wafers among the enclosures, one of the plurality of enclosures being an integrated bake and chill unit.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：公开处理晶片的系统和方法，组合曝光后烘烤和冷却单元以及接口。 解决方案：示例性系统包括光刻工具12，本地轨道14，传送装置20，传送装置处理器21，接口单元16和调度处理的控制器。 一个示例性组合曝光后烘烤和冷却单元包括在其侧面具有开口的外壳，以及外壳中的烘烤单元和冷却单元。 示例性界面包括围绕机器人布置的多个外壳，其在所述外壳之间传送晶片，所述多个外壳中的一个是整体烘烤和冷却单元。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009016870A

公开(公告)日：2009-01-22

申请号：JP2008257384

申请日：2008-10-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ONVLEE JOHANNES ,  GREVE PETER FERDINAND ,  FRANSSEN JOHANNES HENDRIKUS GE ,  VISSER RAYMOND ,  VERHAGEN ERWIN THEODORUS JACOB

IPC: H01L21/027 ,  G01N21/956

CPC classification number: G03F7/70916 ,  G01N21/94 ,  G01N21/956 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for discriminating between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a ghost particle does not have levels higher than a prescribed threshold level respectively and, when radiation is received from a particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a prescribed part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the prescribed part of the detector device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从用于鉴别颗粒和重影颗粒的实际颗粒的辐射中分离来自重影颗粒的辐射的检测器系统。 解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。 在多个检测器信号中，从重影粒子接收的辐射分别不具有高于规定阈值的电平，并且当从粒子接收到辐射时，显示出高于阈值电平的大致相同的电平。 检测器系统包括用于响应于入射在规定部分上的辐射而产生第一检测器信号的辐射检测器装置和用于防止不是源自粒子的辐射入射到检测器装置的规定部分上的辐射阻挡组件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008131041A

公开(公告)日：2008-06-05

申请号：JP2007291422

申请日：2007-11-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ONVLEE JOHANNES ,  BIJVOET DIRK-JAN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent a patterning device from sliding to a support. SOLUTION: A lithographic equipment includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to clamp area of the patterning device. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了防止图案形成装置滑动到支撑件。 解决方案：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 提供诸如加湿器的施加器以提供诸如水分子的分子来夹持图案形成装置的区域。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2005123608A

公开(公告)日：2005-05-12

申请号：JP2004286595

申请日：2004-09-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DEN NIEUWELAAR NORBERTUS J ,  KOENEN WILLEM HERMAN GERTRUDA ,  ONVLEE JOHANNES ,  VAN LIEROP HENRICUS PETRUS JOH ,  ROODA JACOBUS E ,  STOETS MICHIEL A R ,  DUMONT ROBERT J

IPC: G03F7/20 ,  G05B15/00 ,  G05B19/418 ,  H01L21/027

CPC classification number: G05B19/41865 ,  G03F7/70525 ,  G05B2219/32248 ,  G05B2219/32291 ,  G05B2219/45028 ,  G05B2219/45031 ,  Y02P90/20

Abstract: PROBLEM TO BE SOLVED: To provide an operation method in which scheduling for determining an order of many tasks that are performed using various functions in a machine involving lithography is corrected in a restorable manner when an expected situation occurs during operation. SOLUTION: In the operation method of the machine, a state resistor SR indicating a state of the machine and a database TDB of tasks executable in the machine are maintained, possible task orders are created based on conditions before and after the tasks on the state of the system (rather than a priority relation), an order confirming given start and end states of the machine is selected from the created orders. According to the method, the order of the tasks executable in the machine can be quickly created, and an optimum order can be quickly found, in addition, automatic restoration from an exception is possible. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种操作方法，其中当在操作期间发生预期情况时，以可恢复的方式校正在涉及光刻的机器中使用各种功能执行的许多任务的顺序的调度。 解决方案：在机器的操作方法中，保持指示机器状态的状态电阻器SR和机器中可执行的任务的数据库TDB，根据任务之前和之后的条件创建可能的任务命令 系统的状态（而不是优先级关系），从创建的订单中选择确定机器的起始和结束状态的顺序。 根据该方法，可以快速地创建在机器中可执行的任务的顺序，并且可以快速找到最佳顺序，此外，可以从异常自动恢复。 版权所有（C）2005，JPO＆NCIPI