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    Lithographic apparatus and method
    4.
    发明专利
    Lithographic apparatus and method 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2011192991A

    公开(公告)日：2011-09-29

    申请号：JP2011049270

    申请日：2011-03-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

    IPC: H01L21/027

    CPC classification number: G03F7/70875 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a heater 400 and/or a temperature sensor 500 on a surface. The surface is a surface of at least one selected from the substrate table structured to support the substrate on a substrate support area, a liquid handling system, a projection system, a surface of a lattice of a positional measurement device or a sensor, and/or an exchange bridge. A nodal plate 600 is further included so as to support the substrate. The surface, on which the heater and/or temperature sensor are formed, is a surface of the nodal plate. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备在表面上包括加热器400和/或温度传感器500。 该表面是选自被构造成将基板支撑在基板支撑区域上的至少一个表面，液体处理系统，投影系统，位置测量装置或传感器的格子表面和/ 或交换桥。 还包括节点板600以支撑衬底。 形成加热器和/或温度传感器的表面是节点板的表面。 版权所有（C）2011，JPO＆INPIT

    Heat pipe, lithographic apparatus, and device manufacturing method
    5.
    发明专利
    Heat pipe, lithographic apparatus, and device manufacturing method 有权
    热管，光刻设备和器件制造方法

    公开(公告)号：JP2011071513A

    公开(公告)日：2011-04-07

    申请号：JP2010210311

    申请日：2010-09-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  VAN DONK GERRIT ,  VEN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces uneven cooling of an object so that the object may be maintained at a substantially uniform temperature. SOLUTION: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe configured to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供减少物体的不均匀冷却的系统，使得物体可以保持在基本均匀的温度。 解决方案：提供一种光刻设备，其包括被配置为保持基板的基板保持器和被配置为将基板保持器保持在基本上均匀的温度的热管。 热管具有容纳液体储存器和蒸汽空间的室，以及在室中至少部分地与液体接触的加热元件。 版权所有（C）2011，JPO＆INPIT

    Heat pipe, lithographic apparatus and device manufacturing method
    6.
    发明专利
    Heat pipe, lithographic apparatus and device manufacturing method 有权
    热管，光刻设备和器件制造方法

    公开(公告)号：JP2011069608A

    公开(公告)日：2011-04-07

    申请号：JP2010210310

    申请日：2010-09-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  PATEL HRISHIKESH ,  VAN DONK GERRIT ,  VEN ES JOHANNES

    IPC: F28D15/02 ,  H01L21/027

    CPC classification number: F28D15/04 ,  G03F7/70341 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing the non-uniform cooling of an object such that the object is maintained at a substantially uniform temperature.
    SOLUTION: The heat pipe maintains the object at a substantially uniform temperature. The heat pipe includes a liquid reservoir and a vapor space, a chamber with one part defined by a condensation face, and a liquid transport device applying force adding to gravity to a liquid and transporting the liquid from the condensation face to the reservoir. The condensation face is formed such that a condensation liquid is moved toward the liquid transport device along the condensation face.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于减少物体的不均匀冷却的系统，使得物体保持在基本均匀的温度。

    解决方案：热管将物体保持在基本均匀的温度。 热管包括液体储存器和蒸汽空间，具有由冷凝面限定的一部分的腔室以及将重力加到液体并将液体从冷凝面传送到储液器的液体输送装置。 冷凝面形成为使得冷凝液沿着冷凝面向液体输送装置移动。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2011066440A

    公开(公告)日：2011-03-31

    申请号：JP2010257492

    申请日：2010-11-18

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ZAAL KOEN JACOBUS JOHANNES MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  OTTENS JOOST JEROEN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70691

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of supplying a high refractive index liquid to a space between a final lens component and a substrate, and of reducing the distortion of the substrate.
    SOLUTION: A burl plate 20 is intended for use in immersion lithography, wherein the substrate W is arranged on the burl (or pimple) plate 20 and the plate 20 is arranged on a flat surface of a wafer table WT. The burl plate 20 has a plurality of projections 21, 24 that are referred to as "burls" or "pimples" on the top surface thereof. The burl plate 20 has a higher burl density in a peripheral portion than in a middle so that when a higher pressure differential is applied in the peripheral portion, compression of the burls in the peripheral portion is substantially identical to that in the medial portion.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够向最终透镜部件和基板之间的空间供给高折射率液体并且减小基板的变形的光刻设备。 解决方案：喷砂板20用于浸没式光刻，其中基板W布置在凸起（或疙瘩）板20上，板20布置在晶片台WT的平坦表面上。 突出板20在其顶面上具有多个突起21,24，这些突起21,24被称为“毛刺”或“粉刺”。 凸缘板20在周边部分具有比中间更高的凸起密度，使得当在周边部分施加较高的压差时，周边部分中的毛刺的压缩与中间部分中的压缩基本相同。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    8.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2010187025A

    公开(公告)日：2010-08-26

    申请号：JP2010114261

    申请日：2010-05-18

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ANTONIUS LEENDERS MARTINUS H ,  OTTENS JOOST JEROEN ,  KEMPER NICOLAAS R

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To improve the throughput of immersion lithography.
    SOLUTION: An immersion lithographic apparatus is disclosed. In the immersion lithographic apparatus, at least a part of the liquid supply system which provides liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between the part and the substrate, so that the velocity at which the substrate is moved relative to the projection system is increased.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提高浸没光刻的吞吐量。 解决方案：公开了一种浸没式光刻设备。 在浸没式光刻设备中，在投影系统和基板之间提供液体的液体供应系统的至少一部分可在扫描期间在基本平行于基板顶表面的平面内移动。 移动部件以减小部件和基板之间的相对速度，使得基板相对于投影系统移动的速度增加。 版权所有（C）2010，JPO＆INPIT

    Lithographic device and manufacturing method therefor
    9.
    发明专利
    Lithographic device and manufacturing method therefor 有权
    光刻设备及其制造方法

    公开(公告)号：JP2010109390A

    公开(公告)日：2010-05-13

    申请号：JP2010022217

    申请日：2010-02-03

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： OTTENS JOOST JEROEN ,  NEERHOF HENDRIK ANTONY JOHANNES ,  ZAAL KOEN JACOBUS JOHANNES MARIA ,  LE KLUSE MARCO

    IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

    CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70708

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate holder in which a fixing force between the top face of the substrate holder and the rear of a substrate does not cause a problem. SOLUTION: A lithographic device includes an illumination system supplying the beams of radiation, and an article supporter 5 supporting a flat article arranged in the path of the beam of radiation. The lithographic device further includes a back-fill gas supply arranged to the article supporter for supplying the rear of the article with a back-fill gas when the article is supported by a supporting means, and a clamp 3 clamping the article to the article supporter during a projection. In this case, the device includes a controller 2 adjusting the clamp and/or a back-fill supply pressure with the object of the release of the clamp before the back-fill gas supply pressure is reduced. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种基板保持器，其中基板保持器的顶面和基板的后部之间的固定力不会引起问题。 解决方案：光刻设备包括提供辐射束的照明系统和支撑布置在辐射束路径中的扁平物品的物品支撑件5。 平版印刷装置还包括布置在物品支撑件上的补充填充气体，用于当物品由支撑装置支撑时向物品的后部供应填充气体;夹具3将物品夹持到物品支撑件 在投影期间。 在这种情况下，该设备包括控制器2，在回填气供应压力降低之前，调整夹具和/或补充供给压力，释放夹具。 版权所有（C）2010，JPO＆INPIT

    Device manufacturing method, lithography device, and device manufactured thereby
    10.
    发明专利
    Device manufacturing method, lithography device, and device manufactured thereby 有权
    器件制造方法，光刻设备及其制造的器件

    公开(公告)号：JP2009158971A

    公开(公告)日：2009-07-16

    申请号：JP2009090699

    申请日：2009-04-03

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： OTTENS JOOST JEROEN ,  BAKKER LEVINUS PIETER ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN ,  SCHUURMANS FRANK JEROEN PIETER ,  VAN DER WERF JAN EVERT

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

    Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithography device, and a device manufactured by the method. SOLUTION: The device manufacturing method is disclosed wherein a substrate W is provided, a projection beam of radiation PB is provided using an illumination system IL, a patterning means MA is used to impart the projection beam PB with a pattern in its cross section, the patterned beam of radiation PB is projected subsequently to a number of outer target portions CO of the substrate W before the patterned beam is projected to inner target portion CI of the substrate W, wherein each subsequent outer target portion COi+1 is spaced-apart from the outer target portion COi preceding that subsequent outer target portion COi+1. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种器件制造方法，光刻设备以及通过该方法制造的器件。 解决方案：公开了一种器件制造方法，其中设置有衬底W，使用照明系统IL提供辐射PB的投射束，使用图案形成装置MA来使投影光束PB在其十字形中具有图案 在将图案化的光束投影到基板W的内部目标部分CI之前，将图案化的光束束PB随后投射到基板W的多个外部目标部分CO，其中每个随后的外部目标部分COi + 1间隔开 从该后续外部目标部分COi + 1之前的外部目标部分COi释放。 版权所有（C）2009，JPO＆INPIT

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