公开(公告)号：JP2012114485A

公开(公告)日：2012-06-14

申请号：JP2012066781

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

公开(公告)号：JP2012054601A

公开(公告)日：2012-03-15

申请号：JP2011243513

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007142460A

公开(公告)日：2007-06-07

申请号：JP2007038065

申请日：2007-02-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which a space between the substrate and projection system is filled with a liquid while minimizing the volume of the liquid that must be accelerated during stage movements. SOLUTION: In the lithographic projection apparatus, a seal member surrounds a space between the final element of the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between the seal member and the surface of the substrate to contain the liquid in the space. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段移动期间必须加速的液体的体积。 解决方案：在光刻投影装置中，密封构件围绕投影系统的最终元件与光刻投影装置的基板台之间的空间。 在密封构件和基板的表面之间形成气体密封，以在空间中容纳液体。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2012114484A

公开(公告)日：2012-06-14

申请号：JP2012066780

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：浸没型光刻投影装置包括：辐射系统Ex，IL，其设置有辐射源LA并且提供放射线的投影束PB; 连接到用于相对于构件PL正确定位掩模的第一定位装置的第一对象表（掩模台）MT; 连接到用于相对于构件PL正确定位衬底的第二定位装置的第二对象台（衬底台）WT; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012054602A

公开(公告)日：2012-03-15

申请号：JP2011243516

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289127A

公开(公告)日：2004-10-14

申请号：JP2003417260

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2010135857A

公开(公告)日：2010-06-17

申请号：JP2010059726

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段操作期间需要加速的液体的量。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的平面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008311684A

公开(公告)日：2008-12-25

申请号：JP2008239157

申请日：2008-09-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  DE SMIT JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for accurately aligning and/or leveling a substrate in an immersion lithography apparatus.
SOLUTION: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to a place where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在浸没式光刻设备中精确对准和/或调平基板的方法和装置。 解决方案：在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。 版权所有（C）2009，JPO＆INPIT