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    Cover for substrate table, substrate table for lithographic apparatus, lithographic apparatus, and method for manufacturing device
    1.
    发明专利
    Cover for substrate table, substrate table for lithographic apparatus, lithographic apparatus, and method for manufacturing device 有权
    底片表盖，平版印刷装置用基板，平版印刷装置及制造装置的方法

    公开(公告)号：JP2011205093A

    公开(公告)日：2011-10-13

    申请号：JP2011050948

    申请日：2011-03-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  ROSET NIEK JACOBUS JOHANNES ,  ZDRAVKOV ALEXANDER NIKOLOV ,  STOUDAM JAN WILLEM ,  BIJL BERNARDUS LAMBERTUS JOHANNES

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70341 ,  G03F7/70716

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus that improves a stability of meniscus to control pattern defects caused by bubbles in an immersion liquid or the like.SOLUTION: In the apparatus, a cover 25 includes a substrate table having a substantially planar upper surface, in which a recess 22 that is configured to receive a substrate W so that the substrate W is supported by the recess 22, is formed. The cover 25 includes a substantially planar body that, in use, extends around the substrate from the upper surface to a peripheral part of an upper major face of the substrate in order to cover a gap between an edge of the recess 22 and an edge of the substrate. The cover includes relatively flexible part that, in use, extends around the substrate in order to be configured to have a rigidity lower than that of the rest part of the cover.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其提高弯液面的稳定性以控制由浸没液体等中的气泡引起的图案缺陷。解决方案：在该设备中，盖25包括具有基本平坦的上表面 表面，其中形成有用于接收基板W以使得基板W被凹部22支撑的凹部22。 盖25包括基本上平面的主体，其在使用中围绕基板从基板的上主表面的上表面延伸到周边部分，以便覆盖凹部22的边缘与边缘之间的间隙 底物。 盖子包括相对柔性的部件，其在使用中围绕基板延伸，以便构造成具有比盖子的其余部分低的刚性。

    Lithography apparatus and internal space adjustment method of device manufacturing apparatus
    2.
    发明专利
    Lithography apparatus and internal space adjustment method of device manufacturing apparatus 有权
    设备制造设备的平面设备和内部空间调整方法

    公开(公告)号：JP2007096294A

    公开(公告)日：2007-04-12

    申请号：JP2006239753

    申请日：2006-09-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EMPEL TJARKO ADRIAAN RUDOL ,  DER HAM RONALD V ,  ROSET NIEK JACOBUS JOHANNES

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70933 ,  G03F7/70775 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and an internal space adjustment method of device manufacturing apparatus. SOLUTION: The lithography apparatus comprises at least a first gas shower constituted so as to supply a first air current into an internal space of the lithography apparatus, and at least a second gas shower constituted so as to supply a second air current into the internal space of the lithography apparatus, wherein the first and second air currents are at least partially directed to one another by the gas shower. Further, there is provided a method of adjusting the internal space of a device manufacturing apparatus, wherein the first adjusted air current and the second adjusted air current are supplied to the internal space, so that they are at least partially directed to one another. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 解决的问题：提供一种装置制造装置的光刻装置和内部空间调整方法。 解决方案：光刻设备至少包括第一气体喷淋器，其构造成将第一气流提供到光刻设备的内部空间中，并且至少第二气体喷淋器构造成将第二气流供应到 光刻设备的内部空间，其中第一和第二气流至少部分地通过气体淋浴相互指向。 此外，提供了一种调节装置制造装置的内部空间的方法，其中第一调节气流和第二调节气流被提供给内部空间，使得它们至少部分地彼此指向。 版权所有（C）2007，JPO＆INPIT

    Gas shower, lithography apparatus, and use of gas shower
    4.
    发明专利
    Gas shower, lithography apparatus, and use of gas shower 有权
    气体淋浴器，平面设备和气体淋浴器的使用

    公开(公告)号：JP2007158305A

    公开(公告)日：2007-06-21

    申请号：JP2006279042

    申请日：2006-10-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EMPEL TJARKO ADRIAAN RUDOL ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70908

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of preventing the thermal fluctuation in an optical path, for stabilizing measurement with an interferometer system. SOLUTION: A gas shower 1 of an optical device adjusts the optical path of at least one interferometer system IF. The gas shower 1 includes a gas distribution chamber 2 comprising a shower exit side that supplies gas to the optical path OP. The gas distribution chamber 2 is so configured as to spray the gas to the optical path OP. The gas distribution chamber 2 includes a substantially sharp tapered tip. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够防止光路中的热波动的光刻设备，用于使用干涉仪系统稳定测量。 解决方案：光学装置的气体淋浴器1调节至少一个干涉仪系统IF的光路。 气体淋浴器1包括：气体分配室2，其包括向光路OP供给气体的喷淋出口侧。 气体分配室2被构造成将气体喷射到光路OP。 气体分配室2包括基本上尖锐的锥形尖端。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007251156A

    公开(公告)日：2007-09-27

    申请号：JP2007043038

    申请日：2007-02-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DE VIJVER YURI JOHANNES GA ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES ,  BOSSCHART CAREL HOPE

    IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

    CPC classification number: G03F7/70858 ,  G03F7/70775 ,  G03F7/70908

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with a measurement system having highly reliable accuracy. SOLUTION: The lithographic apparatus is provided with a measurement system for measuring the position and/or movement of a substrate support relative to a reference frame. The measurement system is provided with a target mounted to any one of the substrate support and the reference frame, a radiation source mounted to the other one and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support is provided with one or more gas outlets configured so as to supply a flow of gas which encapsulates the volume of space through which the radiation beam propagates to the target. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有高度可靠精度的测量系统的光刻设备。 解决方案：光刻设备设置有用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。 测量系统设置有安装到基板支撑件和参考框架中的任一个的目标，安装到另一个的辐射源和被配置为检测从目标传播的辐射图案的传感器，其指示位置或运动 衬底支撑。 衬底支撑件设置有一个或多个气体出口，其被配置为提供封装辐射束传播到靶的空间体积的气体流。 版权所有（C）2007，JPO＆INPIT

    Fluid handling structure, lithographic apparatus and device manufacturing method
    8.
    发明专利
    Fluid handling structure, lithographic apparatus and device manufacturing method 有权
    流体处理结构，平面设备和设备制造方法

    公开(公告)号：JP2013021331A

    公开(公告)日：2013-01-31

    申请号：JP2012154530

    申请日：2012-07-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ROGIER HENDRIX MAGDALENA CORTIE ,  KATE NICOLAAS TEN ,  ROSET NIEK JACOBUS JOHANNES ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS JOZEF ,  ROPS CORNELIUS MARIA ,  JIM VINCENT OVERKAMP

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood of bubble inclusion is at least reduced.SOLUTION: A fluid handling structure for a lithographic apparatus comprises at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: meniscus pinning features to resist passage of the immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array. The plurality of gas supply openings at least partly surround one or more of the meniscus pinning features, and are placed radially outside of the meniscus pinning features. The plurality of gas supply openings in a linear array are of a similar or the same size.

    Abstract translation: 要解决的问题：提供其中气泡夹杂的可能性至少降低的光刻设备。 解决方案：用于光刻设备的流体处理结构包括在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处：弯液面钉扎特征以阻止浸没流体沿径向向外的方向 从空间; 以及线性阵列中的多个气体供给开口。 多个气体供应开口至少部分地围绕弯月面钉扎特征中的一个或多个，并且被放置在半月板钉扎特征的径向外侧。 线性阵列中的多个气体供给开口具有相似或相同的尺寸。 版权所有（C）2013，JPO＆INPIT

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