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    Imprint lithography
    1.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008098633A

    公开(公告)日：2008-04-24

    申请号：JP2007252991

    申请日：2007-09-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE W ,  DIJKSMAN JOHAN F ,  WUISTER SANDER F ,  SCHRAM IVAR

    IPC: H01L21/027 ,  B29C59/02 ,  G03F7/20

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography device which prevents increase in the time required to form a thin continuous layer of an imprintable material, requirement for the time for releasing of gas between an imprint template and a substrate, and formation of air bubbles being sealed with the gas sandwiched between the template and the substrate, etc. SOLUTION: In one embodiment, this imprint lithography device includes a support structure that supports an imprint template, having a neutral surface substantially dividing the imprint template into two pieces, and an actuator which is, when the imprint template is supported by the supporting structure, positioned at a certain position so that the actuator is positioned between the support structure and a side part of the imprint template. The actuator is brought into contact with the imprint template at a place displaced from the neutral surface of the imprint template. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种压印光刻装置，其防止形成可压印材料的薄连续层所需的时间的增加，需要在压印模板和基板之间释放气体的时间和形成 的气泡被夹在模板和基板之间的气体等密封。解决方案：在一个实施例中，该压印光刻装置包括支撑结构，其支撑压印模板，具有基本上划分印模板的中性表面 以及致动器，当压印模板由支撑结构支撑时，致动器定位在特定位置，使得致动器位于支撑结构和压印模板的侧部之间。 致动器在与压印模板的中性表面偏移的位置与压印模板接触。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    3.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2009081421A

    公开(公告)日：2009-04-16

    申请号：JP2008211243

    申请日：2008-08-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S269/903

    Abstract: PROBLEM TO BE SOLVED: To provide a chuck apparatus provided with a second surface portion deflecting gas over a substrate held on a first surface portion, and holding the substrate. SOLUTION: The chuck apparatus includes the first surface portion on which the substrate is to be held and the second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种卡盘装置，其具有在保持在第一表面部分上的基板上偏转气体的第二表面部分，并且保持基板。 解决方案：卡盘装置包括要保持基板的第一表面部分和与第一表面部分相邻的第二表面部分并且至少部分地围绕第一表面部分的边缘延伸并且在使用中 被布置成使气体偏转在第一表面部分上，并因此偏转待保持在第一表面部分上的基底。 版权所有（C）2009，JPO＆INPIT

    Imprint lithography
    4.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2008042187A

    公开(公告)日：2008-02-21

    申请号：JP2007182903

    申请日：2007-07-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN F ,  WUISTER SANDER F ,  KRUIJT-STEGEMAN YVONNE W ,  LAMMERS JEROEN HERMAN

    IPC: H01L21/027 ,  B41J2/01 ,  B82B3/00

    CPC classification number: B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography method and equipment capable of eliminating or reducing variation in physical property of an imprintable medium, etc. SOLUTION: A method of depositing the imprintable medium onto a target area of a substrate for the imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate, and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够消除或减少可压印介质的物理性能的改进的压印光刻方法和设备等。解决方案：一种将可压印介质沉积到目标区域上的方法 公开了一种用于压印光刻的衬底。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 并且相对于另一个在第二相对方向上跨过目标区域移动基板，打印头或两者，同时在第一系列液滴上或与液滴相邻的基板上喷射可压印介质的第二系列液滴 。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    6.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007307899A

    公开(公告)日：2007-11-29

    申请号：JP2007123276

    申请日：2007-05-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR

    IPC: B29C59/02 ,  B29C33/38 ,  H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide a making method of an imprint template.
    SOLUTION: The making method of the imprint template 44 comprises mounting a transfer layer on a substrate 30; mounting a layer of an imprintable medium 36 on the transfer layer; polymerizing the imprintable medium by exposing the imprintable medium to chemical rays using a master imprint template 38 in order to imprint a pattern on the imprintable medium; and etching the obtained polymer layer, the transfer layer and the substrate so that the imprinted pattern is transferred to the substrate. By this the substrate is converted to the imprint template having the pattern reverse to the pattern mounted on the master imprint template.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供压印模板的制作方法。 解决方案：压印模板44的制作方法包括将转印层安装在基板30上; 在转印层上安装一层可压印介质36; 通过使用母版印模板38将可压印介质暴露于化学射线以便将图案压印在可压印介质上来聚合可压印介质; 并蚀刻所得到的聚合物层，转印层和基板，使得印刷图案转印到基板上。 由此，将基板转换成具有与安装在主印模模板上的图案相反的图案的印模模板。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    7.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2009141328A

    公开(公告)日：2009-06-25

    申请号：JP2008262679

    申请日：2008-10-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  KNAAPEN RAYMOND JACOBUS WILHEL ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  SCHRAM IVAR

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To assure a desired amount of deformation by applying a desired amount of force to an imprint template.
    SOLUTION: An imprint lithography apparatus includes a support structure 51 holding the imprint template. The apparatus further includes: an actuator 52 disposed between the support structure 51 and the side of the imprint template 50 and configured to impart force to the imprint template 50 when the support structure 51 holds the imprint template; and a force sensor 53 disposed between the support structure 51 and the side of the imprint template 50 when the support structure 51 holds the imprint template 50.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：通过对压印模板施加所需的力来确保所需的变形量。 解决方案：压印光刻设备包括保持压印模板的支撑结构51。 该装置还包括：致动器52，其设置在支撑结构51和压印模板50的侧面之间，并且构造成当支撑结构51保持压印模板时向压印模板50施加力; 以及当支撑结构51保持压印模板50时，设置在支撑结构51和压印模板50的侧面之间的力传感器53.版权所有（C）2009，JPO＆INPIT

    Lithography meandering order
    8.
    发明专利
    Lithography meandering order 有权
    LITHOGRAPHY MEANDERING ORDER

    公开(公告)号：JP2009065135A

    公开(公告)日：2009-03-26

    申请号：JP2008203107

    申请日：2008-08-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHRAM IVAR ,  DIJKSMAN JOHAN FREDERIK ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  SCHROEDERS RICHARD JOSEPH MARI

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/7035 ,  G03F7/70425 ,  G03F7/70433

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus that may obviate or mitigate the issue that a magnification error may occur in different parts of a substrate when applying patterns to the substrate and devices which are formed from these patterns may, e.g., not function consistently with respect to one another. SOLUTION: The imprint lithography method includes imprinting a plurality of patterns in an imprintable medium provided on the substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供压印光刻方法和装置，其可以消除或减轻当将图案应用于基板时由基板和由这些图案形成的装置的基板的不同部分可能发生放大误差的问题 可能例如不能相对于彼此一致地运作。 压印光刻方法包括在设置在基板上的可压印介质中印刷多个图案，其中图案印刷在可压印介质中的顺序为：对于大多数图案，连续两个 印记图案不会彼此相邻印刷。 版权所有（C）2009，JPO＆INPIT

    Inprintable medium dispenser
    9.
    发明专利
    Inprintable medium dispenser 有权
    不可中介分配器

    公开(公告)号：JP2008091865A

    公开(公告)日：2008-04-17

    申请号：JP2007164953

    申请日：2007-06-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DIJKSMAN JOHAN FREDERIK ,  PIERIK ANKE ,  VERNHOUT MARTIN MAURICE ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR

    IPC: H01L21/027 ,  B05C5/00 ,  B29C41/36 ,  B29C59/02 ,  B41J3/38

    CPC classification number: B41J2/1429 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an imprintable medium dispenser used for imprint lithography and to provide a related method. SOLUTION: The imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于压印光刻的可压印介质分配器，并提供相关方法。 可压印介质分配器包括腔室，喷嘴和连接到室的致动器，并被构造成致动，从而在室内产生压力波，使得可压缩的介质从喷嘴分配。 可压印介质分配器设置有控制电路，该控制电路包括被配置为接收致动器致动时产生的瞬态振荡信号的监视装置，并且通过监视瞬时振荡信号来监视可压印介质分配器的操作。 版权所有（C）2008，JPO＆INPIT

    Imprint lithography
    10.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007313880A

    公开(公告)日：2007-12-06

    申请号：JP2007075810

    申请日：2007-03-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WUISTER SANDER F ,  DIJKSMAN JOHAN F ,  KRUIJT-STEGEMAN YVONNE W ,  SCHRAM IVAR

    IPC: B29C59/02 ,  B29C33/38 ,  H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

    Abstract: PROBLEM TO BE SOLVED: To disclose a method of forming a substantial replica of a first imprint template having a first pattern.
    SOLUTION: A second imprint template having a second pattern substantially reverse to the first pattern is made by filling a recess of the first imprint template with a first material and removing the first material from the first imprint template. A third imprint template having a pattern of a substantial replica of the first pattern is made by filling a recess of the second pattern with a photo-curable medium, curing the photo-curable medium by irradiation and removing the cured medium from the second imprint template.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：公开形成具有第一图案的第一印模模板的实质复制品的方法。 解决方案：通过用第一材料填充第一印模模板的凹部并从第一印模模板中移除第一材料，制成具有与第一图案基本相反的第二图案的第二印模模板。 通过用光固化介质填充第二图案的凹部，通过照射固化光固化介质并从第二印模模板中除去固化介质来制作具有第一图案的实质复制图案的第三印模模板 。 版权所有（C）2008，JPO＆INPIT

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