公开(公告)号：JP2012238877A

公开(公告)日：2012-12-06

申请号：JP2012163657

申请日：2012-07-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which reduces or eliminates deposition of contaminants on various components of an exposure apparatus.SOLUTION: A coating including a semiconductor, a photocatalyst, and/or a metal oxide is applied at least partly onto various components of an exposure apparatus, for example a sensor provided on a substrate table of a lithographic apparatus.

Abstract translation: 要解决的问题：提供减少或消除污染物沉积在曝光设备的各种部件上的光刻设备。 解决方案：包括半导体，光催化剂和/或金属氧化物的涂层至少部分地施加到曝光装置的各种部件上，例如设置在光刻设备的基板台上的传感器。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011216904A

公开(公告)日：2011-10-27

申请号：JP2011152771

申请日：2011-07-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is enclosed between a final element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use can help to prevent the formation of bubbles in the immersion liquid and to reduce a residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了浸没式光刻投影装置，其中浸没液被包围在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层。 该用途可以有助于防止在浸没液中形成气泡并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2007208279A

公开(公告)日：2007-08-16

申请号：JP2007065471

申请日：2007-03-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus which minimizes a liquid loss from a supply system during the exposure of ends of a substrate, in liquid immersion exposure. SOLUTION: Liquid is limited by a middle plate 210 located between the liquid supply system and the substrate W. Spaces 222, 215 among the middle plate 210, a transmitted image sensor (TIS) 220, and the substrate W are also filled with the liquid 111. This procedure can be performed by two separated space liquid-supply systems via holes 230, 240, or can be performed by the same space liquid-supply system via the holes 230, 240. Therefore, both the space 215 between the substrate W and the middle plate 210, and the space 225 between the transmitted image sensor 220 and the middle plate 210 are filled with the liquid, so that both the substrate W and the transmitted image sensor can be illuminated under the same condition. A part 200 provides one or a plurality of support surfaces with the middle plate 210 which can be held at a predetermined position by a vacuum source. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其在液浸曝光期间在基片的端部曝光期间使供应系统的液体损失最小化。 解决方案：液体受位于液体供应系统和基板W之间的中间板210的限制。中间板210中的空间222,215，透射图像传感器（TIS）220和基板W也被填充 该过程可以通过两个分离的空间供液系统通孔230,240进行，或者可以经由孔230,240由相同的空间液体供应系统执行。因此，两者之间的空间215 基板W和中间板210以及透射图像传感器220和中间板210之间的空间225被填充液体，从而能够在相同条件下照射基板W和透射图像传感器。 部件200提供一个或多个支撑表面，中间板210可由真空源保持在预定位置。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006173628A

公开(公告)日：2006-06-29

申请号：JP2005362558

申请日：2005-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN DE KERKHOF MARCUS A

IPC: H01L21/027 ,  G01J4/00 ,  G03F7/20

CPC classification number: G03F7/70566 ,  G03F7/706

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus arranged with the capability to measure the polarization of radiation projected by a projection system. SOLUTION: An analyzer plate AP positioned between the projection system PL and a radiation sensor DS is illuminated with a projected beam of radiation. The analyzer plate includes two crossing regions, each of which transmits radiation with a different polarization direction. The beam of projection radiation is patterned without influencing the polarization of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor DS is given polarization selectivity. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种布置成能够测量由投影系统投射的辐射的偏振的光刻设备。 位于投影系统PL和辐射传感器DS之间的分析器板AP用投影的辐射束照射。 分析器板包括两个交叉区域，每个交叉区域透射具有不同偏振方向的辐射。 图案的投影光束不影响光束的偏振。 通过使投影辐射束图案化，使得一个区域比另一个区域接收更多的辐射，辐射传感器DS被给予极化选择性。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2014017526A

公开(公告)日：2014-01-30

申请号：JP2013222157

申请日：2013-10-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOB STREEFKERK ,  JOHANNES JACOBS MATEUS BASELMANS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: An immersion lithographic projection apparatus in which immersion liquid is sealed between a final element of a projection system and a substrate is disclosed. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了一种浸没式光刻投影装置，其中浸入液体密封在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2012114485A

公开(公告)日：2012-06-14

申请号：JP2012066781

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

公开(公告)号：JP2012054601A

公开(公告)日：2012-03-15

申请号：JP2011243513

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010183113A

公开(公告)日：2010-08-19

申请号：JP2010116482

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 解决方案：浸没式光刻投影装置被公开，其中浸没液被密封在投影系统的最终元件和基底之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入液体中之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010016389A

公开(公告)日：2010-01-21

申请号：JP2009188713

申请日：2009-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing or eliminating adhesion of contaminant for various components of the exposure apparatus. SOLUTION: The exposure apparatus includes a radiation system configured for supplying radiation beam, a patterning apparatus for patterning the radiation beam according to a required pattern, a substrate table for supporting a substrate, and a projection system for projecting a patterned radiation beam to the target on the substrate. At least a portion of the substrate table is covered with a coating. The coating includes a metal oxide, a photocatalyst, or a semiconductor material, or the combination thereof. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于减少或消除对曝光设备的各种部件的污染物的粘附的光刻设备。 解决方案：曝光装置包括被配置为提供辐射束的辐射系统，用于根据所需图案构图辐射束的图案形成装置，用于支撑衬底的衬底台，以及用于将图案化辐射束 到基底上的靶。 衬底台的至少一部分用涂层覆盖。 涂层包括金属氧化物，光催化剂或半导体材料，或其组合。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007184576A

公开(公告)日：2007-07-19

申请号：JP2006337301

申请日：2006-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT