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    Imprint lithography
    1.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2014103421A

    公开(公告)日：2014-06-05

    申请号：JP2014041529

    申请日：2014-03-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SIMON KLAUS

    IPC: H01L21/027

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography capable of a high resolution imprint.SOLUTION: An imprint method is disclosed. In one example, separated first and second target regions made of an imprintable medium on a substrate are brought into contact with first and second templates, respectively, to form first and second imprints on the imprintable medium, and then the first and second templates are removed from the imprinted medium.

    Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻。解决方案：公开了一种压印方法。 在一个示例中，分离的由可压印介质构成的分离的第一和第二目标区域分别与第一和第二模板接触，以在可压印介质上形成第一和第二印记，然后移除第一和第二模板 从印记媒体。

    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2005051231A

    公开(公告)日：2005-02-24

    申请号：JP2004207959

    申请日：2004-07-15

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To reduce the distortion of an image due to the temperature gradient of a substrate and an immersion liquid, in a liquid immersed projection exposure apparatus.
    SOLUTION: In an immersed lithographic apparatus including a temperature control unit for adjusting the temperature of a member in the final state of a projection exposure apparatus PL, a substrate, and an immersion liquid to a common target temperature T4, the temperature gradient is reduced, by adjusting the total temperature of these constituent components. By doing so, the matching properties of image formation and the total performance are improved. The means to be used includes a control of the flow rate of the immersion liquid and the temperature by a feedback circuit.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：在液浸式投影曝光装置中，为了减少由于基板和浸没液体的温度梯度引起的图像的变形。 解决方案：在包括用于将投影曝光装置PL，基板和浸入液体的最终状态下的部件的温度调节到共同目标温度T4的温度控制单元的浸没式光刻设备中，温度梯度 通过调节这些构成成分的总温度来减少。 通过这样做，提高了图像形成的匹配性能和总性能。 要使用的手段包括通过反馈电路控制浸液的流量和温度。 版权所有（C）2005，JPO＆NCIPI

    Imprint lithography
    4.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2010114473A

    公开(公告)日：2010-05-20

    申请号：JP2010027357

    申请日：2010-02-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENKO ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To solve a problem that since template holders occupy a significant amount of space in an imprint lithography apparatus, there is not sufficient space to provide an imprint template to imprint every imprint area at the same time. SOLUTION: The imprint lithography apparatus has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题为了解决由于模板保持器在压印光刻设备中占据大量空间的问题，没有足够的空间来提供压印模板以同时压印每个压印区域。 压印光刻设备具有第一阵列的模板保持器，第二阵列的模板保持器和布置成支撑待印刷的衬底的衬底台，其中模板保持器的第一阵列被布置成保持阵列 可用于将第一阵列图案印刷到基底上的印模模板，并且第二阵列的模板支架布置成保持可用于将第二阵列阵列印刷到基底上的压印模板阵列， 由第二阵列压印的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2010，JPO＆INPIT

    Imprint lithography
    5.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007227890A

    公开(公告)日：2007-09-06

    申请号：JP2006344038

    申请日：2006-12-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENK ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography device which solves the problem of the shortage of the space for forming imprint templates when imprinting each imprint area at the same time, since a template holder occupies space significantly.
    SOLUTION: The imprint lithography device comprises a first array of template holders, a second array of template holders, and a substrate table arranged for supporting a substrate to be imprinted. The first array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a first array of patterns onto the substrate. The second array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a second array of patterns onto the substrate. The patterns imprinted by the second array are interspersed between the patterns imprinted by the first array.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种压印光刻装置，其解决了当同时印刷每个压印区域时形成压印模板的空间不足的问题，因为模板保持器显着占据空间。 压印光刻设备包括模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的衬底的衬底台。 第一阵列的模板保持器布置成保持可用于将第一阵列图案压印到基板上的压印模板阵列。 第二阵列的模板支架布置成保持可用于将第二阵列阵列压印到基板上的压印模板阵列。 由第二阵列印制的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2007，JPO＆INPIT

    Imprint lithography
    10.
    发明专利
    Imprint lithography 审中-公开
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2010010708A

    公开(公告)日：2010-01-14

    申请号：JP2009234237

    申请日：2009-10-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SIMON KLAUS

    IPC: H01L21/027 ,  B41F16/00

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide lithography that enables high resolution imprint.
    SOLUTION: A method of imprint is disclosed. One embodiment of the method includes bringing a first and a second target region, which are made of imprintable media on a substrate and spaced apart from each other, into contact with a first and a second template, respectively, forming a first and a second imprint on the imprintable media, respectively, and removing the first and the second template from the already-imprinted media.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻。 解决方案：公开了一种压印方法。 该方法的一个实施例包括将由可压印介质制成的第一和第二目标区域分别与第一和第二模板相接触，形成第一和第二印记 分别在可压印媒体上，并从已经印刷的媒体中移除第一和第二模板。 版权所有（C）2010，JPO＆INPIT

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