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    Lithographic apparatus and device manufacturing method
    4.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009182337A

    公开(公告)日：2009-08-13

    申请号：JP2009099602

    申请日：2009-04-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  HENDRIK SMULDERS PATRICK J C ,  SMITS PETER ,  HAGE EDWARD ,  VAN DER TOORN JAN-GERARD CORNE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70716

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. SOLUTION: For example, a closing member is used to receive liquid in a liquid confinement structure while the substrate is replaced on a substrate table in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one or more pins, or a pressure source, is employed to move the closing member to or from the liquid confinement structure. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够在基板更换期间将投影系统的光学元件保持在湿润状态的光刻设备，并且提供一种器件制造方法。 解决方案：例如，当在浸没式光刻设备中的衬底台上更换衬底时，封闭构件用于接收液体限制结构中的液体。 例如，使用使用一个或多个板簧和一个或多个电磁体的组合的关闭构件移动机构，或者一个或多个致动器和一个或多个销的组合或压力源的组合来将关闭构件移动到 或从液体限制结构。 调整板用于补偿不同基底上不同深度的封闭构件容器中封闭构件的变化厚度。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and method of manufacturing device
    5.
    发明专利
    Lithography equipment and method of manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE

    公开(公告)号：JP2009152625A

    公开(公告)日：2009-07-09

    申请号：JP2009033893

    申请日：2009-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA ,  CORNELUS HENDRIK SMULDERS PATR ,  SMITS PETER

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment for efficiently sealing liquid between different substrate tables.
    SOLUTION: The substrate table includes a cover plate 100 on the upper plane of a substrate table body MB. The cover plate 100 includes a flat continuous upper plane, therefor applicable to a local region type liquid delivery system. The upper plane of the cover plate 100 includes almost the same plane with the upper plane of a substrate W, therefor a sealing protrusion member 200 is disposable to reduce or to prevent a liquid entering into a recess between a support SS and the substrate body MB. The sealing protrusion member 200 connects a bottom inner edge of the cover plate 100 and the upper plane of the substrate support SS.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于有效地密封不同基板台之间的液体的光刻设备。 解决方案：衬底台包括在衬底台体MB的上平面上的盖板100。 盖板100包括平坦的连续上平面，因此适用于局部区域型液体输送系统。 盖板100的上平面包括与基板W的上平面几乎相同的平面，因此密封突出构件200是一次性的，以减少或防止液体进入支撑体SS和基板主体MB之间的凹部 。 密封突起构件200连接盖板100的底部内边缘和基板支撑件SS的上平面。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus
    6.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2007129212A

    公开(公告)日：2007-05-24

    申请号：JP2006276276

    申请日：2006-10-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CORNELISSEN SEBASTIAAN MARIA J ,  CUIJPERS MARTINUS AGNES WILLEM ,  OTTENS CORNELIS CHRISTIAAN ,  SMITS PETER ,  VAN DE WAL JOHANNES ANTONIUS M

    IPC: H01L21/027

    CPC classification number: G03F7/707 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858

    Abstract: PROBLEM TO BE SOLVED: To prevent a center of a sensor from moving relative to a substrate table, even if the substrate table thermally expands and contracts. SOLUTION: A circular sensor is mounted to a substrate table WT equipped with three leaf springs that are spaced evenly around a thermal axis of the sensor. The leaf springs are provided in two parts that are mutually attachable and detachable. Although the leaf springs are elastic and allow some movements of the sensor, relative to the substrate table WT on thermal expansion and contraction, the center of the sensor will not move relative to the substrate table. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了防止传感器的中心相对于基板台移动，即使基板台热膨胀和收缩。 解决方案：将圆形传感器安装到衬底台WT上，该基板台WT配备有围绕传感器的热轴均匀间隔的三个板簧。 板簧设置在相互相连和可拆卸的两部分中。 虽然板簧是弹性的并且允许传感器相对于基板台WT在热膨胀和收缩时的某些运动，但传感器的中心将不会相对于基板移动。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus and seal structure
    7.
    发明专利
    Lithographic apparatus and seal structure 有权
    平面设备和密封结构

    公开(公告)号：JP2010177709A

    公开(公告)日：2010-08-12

    申请号：JP2010112063

    申请日：2010-05-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HENDRIK SMULDERS PATRICK JOHANNES CORNELUS ,  SMITS PETER

    IPC: H01L21/027

    CPC classification number: G03F7/70808 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device manufacturing method, seal structure, a method of removing an object and a method of sealing.
    SOLUTION: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed, and in an embodiment, reduces transmission of forces between the different parts.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供光刻设备，设备制造方法，密封结构，去除物体的方法和密封方法。 公开了一种用于浸没光刻的光刻设备，其中衬底台的不同部分之间的密封被布置成易于施加和移除，并且在一个实施例中，减小了不同部件之间的力传递。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    9.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2006140498A

    公开(公告)日：2006-06-01

    申请号：JP2005327405

    申请日：2005-11-11

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  HENDRIK SMULDERS PATRICK J C ,  SMITS PETER ,  HAGE EDWARD ,  VAN DER TOORN JAN-GERARD CORNE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70716

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. SOLUTION: For example, a closing member 30 is used to receive liquid in a liquid confinement structure 12 while the substrate is replaced on a substrate table WT2 in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one more pins, or a pressure source, is employed to move the member 30 to or from the structure 12. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种能够在基板更换期间将投影系统的光学元件保持在湿润状态的光刻设备，并提供一种器件制造方法。 解决方案：例如，封闭构件30用于在液体限制结构12中接收液体，同时在浸没式光刻设备中的衬底台WT2上更换衬底。 例如，采用使用一个或多个板簧和一个或多个电磁体的组合的闭合构件移动机构，或者一个或多个致动器和一个以上的销的组合或压力源的组合，以将构件30移动到 调节板用于补偿不同基底上不同深度的封闭构件容器中封闭构件的变化厚度。 版权所有（C）2006，JPO＆NCIPI

    Lithography apparatus, and device manufacturing method
    10.
    发明专利
    Lithography apparatus, and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2010212711A

    公开(公告)日：2010-09-24

    申请号：JP2010101340

    申请日：2010-04-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARIA HENNUS PIETER R ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  CORNELUS HENDRIK SMULDERS PATRICK J ,  SMITS PETER

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of efficiently sealing liquid between different regions on a substrate table. SOLUTION: The substrate table includes a cover plate 100 disposed on the top surface of a substrate table body MB. Having a flat and continuous top surface, the cover plate 100 can be applied to a local region-type liquid supply system. The top surface of the cover plate 100 is substantially coplanar with that of a substrate W. This makes it possible to install a seal projection portion 200 for reducing or preventing the entry of liquid into a recess between a substrate support SS and the substrate table body MB. The seal projection portion 200 connects between the bottom internal edge of the cover plate 100 and the top surface of the substrate support SS. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够有效地密封衬底台上的不同区域之间的液体的光刻设备。 解决方案：衬底台包括设置在衬底台体MB的顶表面上的盖板100。 具有平坦且连续的顶表面，盖板100可以应用于局部区域型液体供应系统。 盖板100的上表面与基板W基本共面。这样可以安装密封突出部分200，以减少或防止液体进入基板支撑件SS和基板台体之间的凹槽 MB。 密封突起部分200连接在盖板100的底部内部边缘和基板支撑件SS的顶表面之间。 版权所有（C）2010，JPO＆INPIT

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