公开(公告)号：JP2005051231A

公开(公告)日：2005-02-24

申请号：JP2004207959

申请日：2004-07-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce the distortion of an image due to the temperature gradient of a substrate and an immersion liquid, in a liquid immersed projection exposure apparatus.
SOLUTION: In an immersed lithographic apparatus including a temperature control unit for adjusting the temperature of a member in the final state of a projection exposure apparatus PL, a substrate, and an immersion liquid to a common target temperature T4, the temperature gradient is reduced, by adjusting the total temperature of these constituent components. By doing so, the matching properties of image formation and the total performance are improved. The means to be used includes a control of the flow rate of the immersion liquid and the temperature by a feedback circuit.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：在液浸式投影曝光装置中，为了减少由于基板和浸没液体的温度梯度引起的图像的变形。 解决方案：在包括用于将投影曝光装置PL，基板和浸入液体的最终状态下的部件的温度调节到共同目标温度T4的温度控制单元的浸没式光刻设备中，温度梯度 通过调节这些构成成分的总温度来减少。 通过这样做，提高了图像形成的匹配性能和总性能。 要使用的手段包括通过反馈电路控制浸液的流量和温度。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2010157766A

公开(公告)日：2010-07-15

申请号：JP2010078262

申请日：2010-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  SJOERD NICOLAAS LAMBERTUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  GERARDUS PETRUS MATTHIJS VAN NUNEN ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNELIS ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing a remaining liquid on a surface of a substrate after exposure by a projection system. SOLUTION: In this lithographic apparatus, a localized area of the substrate surface under a projection system PL is immersed in liquid. The height of a liquid supply system 310 above the surface of the substrate W can be varied using actuators 314. A control system uses feedforward or feedback control with input of the surface height of the substrate W to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在通过投影系统曝光之后还原衬底表面上的剩余液体的光刻设备。 解决方案：在该光刻设备中，将投影系统PL下面的衬底表面的局部区域浸入液体中。 可以使用致动器314来改变基板W表面上方的液体供应系统310的高度。控制系统使用前馈或反馈控制，输入基板W的表面高度，以将液体供应系统310保持在预定的 高度高于基板W的表面。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005005707A

公开(公告)日：2005-01-06

申请号：JP2004169275

申请日：2004-06-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The highlights of this invention are that the lithography apparatus is equipped with a radiation system Ex to provide the projection beams PB of radiation including a radioactive source LA, a primary object table (mask table) MT connected to a primary positioning means to correctly position a mask against IL and a member PL, a secondary object table (substrate table) WT connected to a secondary positioning means to correctly position a substrate against the member PL, and a projection system PL to form an image of the irradiated part of the mask MA on the target part of the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：本发明的亮点在于，光刻设备配备有辐射系统Ex以提供包括放射源LA的辐射投影束PB，连接到主要定位的主要物体台（掩模台）MT 用于将掩模正确地定位在IL和构件PL上的装置，连接到二次定位装置以将衬底正确地定位在构件PL上的第二对象台（衬底台）WT，以及用于形成照射的图像的投影系统PL 在基板W的目标部分上的掩模MA的一部分。版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004289127A

公开(公告)日：2004-10-14

申请号：JP2003417260

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To disclose a lithography projector in which a space between the final element of a projection system and a substrate is filled with liquid. SOLUTION: Hermetic edge sealing members 17 and 117 surround a substrate W on a substrate table WT or another object at least partially thus preventing the catastrophic loss of the liquid when the edge part of the substrate is imaged or illuminated. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：公开一种其中投影系统的最终元件和基板之间的空间被液体填充的光刻投影仪。 解决方案：密封边缘密封构件17和117围绕基板台WT或另一物体上的基板W，至少部分地防止当基板的边缘部分成像或照明时液体的灾难性损失。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012151489A

公开(公告)日：2012-08-09

申请号：JP2012061788

申请日：2012-03-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Imaging consistency and whole performance can be improved, by adjusting all of the temperatures of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

公开(公告)号：JP2010161421A

公开(公告)日：2010-07-22

申请号：JP2010097301

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009177134A

公开(公告)日：2009-08-06

申请号：JP2008275692

申请日：2008-10-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G01N21/00 ,  G01N21/21 ,  G01N21/49

CPC classification number: G03F7/7085 ,  G03F7/70566 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To provide a scatterometer with an ellipsometric function so as to measure a phase difference and amplitude of beams diffracted by a structure in a plurality of wavelength ranges without using an existing phase modulator and without integrating additional hardware. SOLUTION: A system is configured to measure two individually polarized beams upon diffraction from a substrate in order to determine properties of the substrate. In order to change the phase of one beam out of two orthogonally polarized radiation beams with respect to the other of the two beams, a circularly polarized light source or an elliptically polarized light source is transferred via a fixed phase retarder. By the relative phases of the two radiation beams and other features of beams measured by a detector, the properties of a substrate surface are obtained. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有椭偏功能的散射仪，以便测量由多个波长范围内的结构衍射的光束的相位差和振幅，而不使用现有的相位调制器，而不需要积分附加的硬件。 解决方案：系统被配置为在从基板衍射时测量两个单独的偏振光束，以便确定衬底的性质。 为了相对于两个光束中的另一个改变两个正交偏振辐射束中的一个光束的相位，经由固定相位延迟器传送圆偏振光源或椭圆偏振光源。 通过两个辐射束的相对相位和由检测器测量的光束的其他特征，可以获得基底表面的性质。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009009143A

公开(公告)日：2009-01-15

申请号：JP2008188601

申请日：2008-07-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FLAGELLO DONIS GEORGE ,  CUMMINGS KEVIN ,  STRAAIJER ALEXANDER ,  MARIE DIERICHS MARCEL MATHIJS

IPC: G02B5/30 ,  G02B27/28 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70566 ,  G02B5/3058

Abstract: PROBLEM TO BE SOLVED: To provide a radial transverse electric polarizer device that includes a first layer of a material having a first refractive index, a second layer of a material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. SOLUTION: The radial transverse electric polarizer device includes: a first layer of a material having a first refractive index; a second layer of a material having a second refractive index; and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. The plurality of elongated elements interacts with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. The polarizer device can be used in a lithographic projection apparatus to increase imaging resolution. A method of manufacturing a device includes polarizing a beam of radiation in a transverse electric polarization. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种径向横向电偏振器装置，其包括具有第一折射率的材料的第一层，具有第二折射率的材料的第二层和多个细长元件的方位角和 周期性间隔开并设置在第一层和第二层之间。 解决方案：径向横向电偏振器装置包括：具有第一折射率的材料的第一层; 具有第二折射率的材料的第二层; 以及多个细长元件，其方位角和周期性间隔开并设置在第一层和第二层之间。 多个细长元件与辐射的电磁波相互作用以传输辐射电磁波的横向电极化。 偏振器装置可用于光刻投影装置中以增加成像分辨率。 一种制造器件的方法包括使横向电极化中的辐射束偏振。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007142460A

公开(公告)日：2007-06-07

申请号：JP2007038065

申请日：2007-02-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which a space between the substrate and projection system is filled with a liquid while minimizing the volume of the liquid that must be accelerated during stage movements. SOLUTION: In the lithographic projection apparatus, a seal member surrounds a space between the final element of the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between the seal member and the surface of the substrate to contain the liquid in the space. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时最小化在阶段移动期间必须加速的液体的体积。 解决方案：在光刻投影装置中，密封构件围绕投影系统的最终元件与光刻投影装置的基板台之间的空间。 在密封构件和基板的表面之间形成气体密封，以在空间中容纳液体。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004289128A

公开(公告)日：2004-10-14

申请号：JP2003417261

申请日：2003-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ANTONIUS THEODORUS ANNA MARIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOF JOERI ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to take the place of the substrate in containing the liquid in the liquid supply system during substrate exchange. COPYRIGHT: (C)2005,JPO&NCIPI