公开(公告)号：JP2012114485A

公开(公告)日：2012-06-14

申请号：JP2012066781

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

公开(公告)号：JP2012054601A

公开(公告)日：2012-03-15

申请号：JP2011243513

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011071545A

公开(公告)日：2011-04-07

申请号：JP2010275375

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029658A

公开(公告)日：2011-02-10

申请号：JP2010220938

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示出为阻挡构件12）移动，并且被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台之上的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010206225A

公开(公告)日：2010-09-16

申请号：JP2010138208

申请日：2010-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CHRISTIAAN ALEXANDER HOOGENDAM ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  BIJLAART ERIK THEODORUS MARIA ,  KOLESNYCHENKO ALEKSEY YURIEVICH ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  SLAGHEKKE BERNARDUS ANTONIUS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027 ,  B05C11/00 ,  G03B27/42 ,  G03B27/52 ,  H01L21/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a liquid supply system minimized in liquid pressure fluctuation and/or temperature variation without unnecessary disturbance by mechanical vibration. SOLUTION: Liquid is supplied from an inlet 21 into a reservoir 10 disposed between a substrate and the final element of a projection system PS. A liquid above a given height is removed by an overflow. The overflow is held above the inlet so that the liquid is constantly refreshed and a liquid pressure is substantially kept constant. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为光刻设备提供在液压波动和/或温度变化下最小化的液体供应系统，而不会因机械振动而不必要的干扰。 解决方案：液体从入口21供应到设置在基板和投影系统PS的最终元件之间的储存器10中。 高于给定高度的液体被溢流除去。 溢流被保持在入口的上方，使得液体不断刷新并且液体压力基本保持恒定。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010187029A

公开(公告)日：2010-08-26

申请号：JP2010123442

申请日：2010-05-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSSEN HENDRICUS WILHELMUS A ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN DEN SCHOOR LEON JOSEPH MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system capable of supplying an immersion liquid in a space between a final element of a projection lens and a substrate at an extremely stable flow rate and with a minimum pressure variation in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of the liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液体供应系统，其能够以非常稳定的流速和浸没式光刻中的最小压力变化在投影透镜的最终元件和基板之间的空间中提供浸没液体 仪器。 解决方案：在浸没式光刻设备中，浸渍液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010183113A

公开(公告)日：2010-08-19

申请号：JP2010116482

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 解决方案：浸没式光刻投影装置被公开，其中浸没液被密封在投影系统的最终元件和基底之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入液体中之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010171455A

公开(公告)日：2010-08-05

申请号：JP2010096638

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography apparatus may further include an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液体中的气泡的存在对浸没式光刻设备中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻设备中，通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板，可以使浸没液中的气泡形成最小化或防止 弥补差距。 浸没式光刻设备还可以包括致动器，该致动器在物体与液体接触时横向移动物体在支撑台的孔中，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010050478A

公开(公告)日：2010-03-04

申请号：JP2009243837

申请日：2009-10-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LEENDERS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in an immersion liquid and evaporation of the liquid. SOLUTION: An immersion lithographic apparatus includes a liquid containment structure 12 provided for at least partially defining a space 10 structured to contain a liquid between a projection system PL and a substrate W. A sectional area of the space 10 in a plane parallel to the substrate W is minimized to reduce a traverse of a rim of the substrate W whose image is to be formed (which sometimes brings a content of bubbles in the immersion liquid). The theoretically minimum size is that of a target part TP whose image is to be formed by the projection system PL. In addition, in one embodiment, a shape of a final element of the projection system PL is modified to have a size and/or a shape similar to the target part TP on a cross section parallel to the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液体中气泡的产生和液体的蒸发。 浸没式光刻设备包括液体容纳结构12，其设置用于至少部分地限定被构造成在投影系统PL和衬底W之间容纳液体的空间10.平面中的空间10的截面积平行 使基板W最小化，以减少要形成图像的基板W的边缘（其有时在浸渍液体中引起气泡的含量）的横越。 理论上的最小尺寸是由投影系统PL形成其图像的目标部分TP的尺寸。 此外，在一个实施例中，投影系统PL的最终元件的形状被修改为具有与平行于基板W的横截面上的目标部件TP类似的尺寸和/或形状。版权所有： （C）2010，JPO＆INPIT

公开(公告)号：JP2009188421A

公开(公告)日：2009-08-20

申请号：JP2009093214

申请日：2009-04-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a liquid supply system, wherein a substrate can be moved in different directions without switching a direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate. SOLUTION: The immersion lithographic apparatus includes a liquid supply system which has an inlet configured to supply the liquid to a space between the projection system of the lithographic apparatus and the substrate and an outlet configured to remove at least a part of the liquid and is configured to rotate the inlet, the outlet, or both of them about an axis substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有液体供应系统的光刻设备，其中可以在不改变在光刻设备的投影系统和基板之间流动的液体的方向的不同方向上移动基板。 浸没式光刻设备包括液体供应系统，该液体供应系统具有入口，该入口构造成将液体供应到光刻设备的投影系统与基板之间的空间，以及出口，该出口构造成去除液体的至少一部分 并且被配置为使入口，出口或两者围绕基本上垂直于衬底的曝光平面的轴线旋转。 版权所有（C）2009，JPO＆INPIT